SE348683B - - Google Patents
Info
- Publication number
- SE348683B SE348683B SE16720/66A SE1672066A SE348683B SE 348683 B SE348683 B SE 348683B SE 16720/66 A SE16720/66 A SE 16720/66A SE 1672066 A SE1672066 A SE 1672066A SE 348683 B SE348683 B SE 348683B
- Authority
- SE
- Sweden
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
- G03F7/704—Scanned exposure beam, e.g. raster-, rotary- and vector scanning
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
- H10P76/20—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials
- H10P76/204—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials of organic photoresist masks
- H10P76/2041—Photolithographic processes
- H10P76/2042—Photolithographic processes using lasers
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DES0100902 | 1965-12-06 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SE348683B true SE348683B (de) | 1972-09-11 |
Family
ID=7523360
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SE16720/66A SE348683B (de) | 1965-12-06 | 1966-12-06 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US3518083A (de) |
| AT (1) | AT263088B (de) |
| CH (1) | CH465243A (de) |
| DE (1) | DE1522525C3 (de) |
| FR (1) | FR1508408A (de) |
| GB (1) | GB1159570A (de) |
| NL (1) | NL6615154A (de) |
| SE (1) | SE348683B (de) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4946954B1 (de) * | 1970-12-25 | 1974-12-12 | ||
| NL7101522A (de) * | 1971-02-05 | 1972-08-08 | ||
| US3743842A (en) * | 1972-01-14 | 1973-07-03 | Massachusetts Inst Technology | Soft x-ray lithographic apparatus and process |
| DE2454750C3 (de) * | 1974-11-19 | 1982-03-18 | Philips Patentverwaltung Gmbh, 2000 Hamburg | Verfahren und Anordnung zur Herstellung von Bildmustern für Masken integrierter Schaltkreise mittels aberrationsfreier Bildpunkte von Punkthologrammen |
| US4473293A (en) * | 1979-04-03 | 1984-09-25 | Optimetrix Corporation | Step-and-repeat projection alignment and exposure system |
| US4573791A (en) * | 1979-04-03 | 1986-03-04 | Optimetrix Corporation | Step-and-repeat projection alignment and exposure system |
| EP0017759B1 (de) * | 1979-04-03 | 1985-09-04 | Eaton-Optimetrix Inc. | Verbessertes System der Ausrichtung und Belichtung durch schrittweise Projektion |
| US4414749A (en) | 1979-07-02 | 1983-11-15 | Optimetrix Corporation | Alignment and exposure system with an indicium of an axis of motion of the system |
| US4597664A (en) * | 1980-02-29 | 1986-07-01 | Optimetrix Corporation | Step-and-repeat projection alignment and exposure system with auxiliary optical unit |
| US4452526A (en) * | 1980-02-29 | 1984-06-05 | Optimetrix Corporation | Step-and-repeat projection alignment and exposure system with auxiliary optical unit |
| US4532427A (en) * | 1982-03-29 | 1985-07-30 | Fusion Systems Corp. | Method and apparatus for performing deep UV photolithography |
| US4577958A (en) * | 1982-06-18 | 1986-03-25 | Eaton Optimetrix, Inc. | Bore-sighted step-and-repeat projection alignment and exposure system |
| US4577957A (en) * | 1983-01-07 | 1986-03-25 | Eaton-Optimetrix, Inc. | Bore-sighted step-and-repeat projection alignment and exposure system |
-
1965
- 1965-12-06 DE DE1522525A patent/DE1522525C3/de not_active Expired
-
1966
- 1966-10-26 NL NL6615154A patent/NL6615154A/xx unknown
- 1966-12-05 GB GB54305/66A patent/GB1159570A/en not_active Expired
- 1966-12-05 CH CH1739066A patent/CH465243A/de unknown
- 1966-12-05 FR FR86137A patent/FR1508408A/fr not_active Expired
- 1966-12-05 AT AT1122066A patent/AT263088B/de active
- 1966-12-06 SE SE16720/66A patent/SE348683B/xx unknown
- 1966-12-06 US US599577A patent/US3518083A/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| AT263088B (de) | 1968-07-10 |
| DE1522525A1 (de) | 1969-09-11 |
| CH465243A (de) | 1968-11-15 |
| NL6615154A (de) | 1967-06-07 |
| US3518083A (en) | 1970-06-30 |
| GB1159570A (en) | 1969-07-30 |
| DE1522525C3 (de) | 1975-01-16 |
| DE1522525B2 (de) | 1974-06-06 |
| FR1508408A (fr) | 1968-01-05 |