SE317235B - - Google Patents

Info

Publication number
SE317235B
SE317235B SE11018/65A SE1101865A SE317235B SE 317235 B SE317235 B SE 317235B SE 11018/65 A SE11018/65 A SE 11018/65A SE 1101865 A SE1101865 A SE 1101865A SE 317235 B SE317235 B SE 317235B
Authority
SE
Sweden
Application number
SE11018/65A
Inventor
F Grasenick
Original Assignee
F Grasenick
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by F Grasenick filed Critical F Grasenick
Publication of SE317235B publication Critical patent/SE317235B/xx

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physical Vapour Deposition (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Chemical Vapour Deposition (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Silicon Compounds (AREA)
SE11018/65A 1964-08-25 1965-08-24 SE317235B (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
AT736264A AT258664B (de) 1964-08-25 1964-08-25 Vorrichtung zur Herstellung und bzw. oder zum Abbau von Schichten mittels elektrischer Gasentladungen

Publications (1)

Publication Number Publication Date
SE317235B true SE317235B (de) 1969-11-10

Family

ID=3595287

Family Applications (1)

Application Number Title Priority Date Filing Date
SE11018/65A SE317235B (de) 1964-08-25 1965-08-24

Country Status (6)

Country Link
US (1) US3736246A (de)
AT (1) AT258664B (de)
DE (1) DE1515297C3 (de)
GB (1) GB1125444A (de)
NL (1) NL6511079A (de)
SE (1) SE317235B (de)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3894926A (en) * 1973-02-09 1975-07-15 Lee Jau Yien In-out transporter for an enclosed chamber
US3956093A (en) * 1974-12-16 1976-05-11 Airco, Inc. Planar magnetron sputtering method and apparatus
FR2371524A1 (fr) * 1976-11-18 1978-06-16 Alsthom Atlantique Procede de depot d'une couche mince par decomposition d'un gaz dans un plasma
AU530905B2 (en) 1977-12-22 1983-08-04 Canon Kabushiki Kaisha Electrophotographic photosensitive member
US4151064A (en) * 1977-12-27 1979-04-24 Coulter Stork U.S.A., Inc. Apparatus for sputtering cylinders
DE3331707A1 (de) * 1983-09-02 1985-03-21 Leybold-Heraeus GmbH, 5000 Köln Verfahren und vorrichtung zum reaktiven aufstaeuben von verbindungen von metallen und halbleitern
DE3347036C2 (de) * 1983-12-24 1986-04-24 Fr. Kammerer GmbH, 7530 Pforzheim Verfahren zum Beschichten von Trägern mit Metallen

Also Published As

Publication number Publication date
DE1515297B2 (de) 1978-12-07
US3736246A (en) 1973-05-29
DE1515297A1 (de) 1969-06-12
AT258664B (de) 1967-12-11
NL6511079A (de) 1966-02-28
GB1125444A (en) 1968-08-28
DE1515297C3 (de) 1979-08-02

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