NL6511079A - - Google Patents
Info
- Publication number
- NL6511079A NL6511079A NL6511079A NL6511079A NL6511079A NL 6511079 A NL6511079 A NL 6511079A NL 6511079 A NL6511079 A NL 6511079A NL 6511079 A NL6511079 A NL 6511079A NL 6511079 A NL6511079 A NL 6511079A
- Authority
- NL
- Netherlands
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Analytical Chemistry (AREA)
- Plasma & Fusion (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Metallurgy (AREA)
- Mechanical Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physical Vapour Deposition (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Chemical Vapour Deposition (AREA)
- Photoreceptors In Electrophotography (AREA)
- Silicon Compounds (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
AT736264A AT258664B (de) | 1964-08-25 | 1964-08-25 | Vorrichtung zur Herstellung und bzw. oder zum Abbau von Schichten mittels elektrischer Gasentladungen |
Publications (1)
Publication Number | Publication Date |
---|---|
NL6511079A true NL6511079A (xx) | 1966-02-28 |
Family
ID=3595287
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NL6511079A NL6511079A (xx) | 1964-08-25 | 1965-08-25 |
Country Status (6)
Country | Link |
---|---|
US (1) | US3736246A (xx) |
AT (1) | AT258664B (xx) |
DE (1) | DE1515297C3 (xx) |
GB (1) | GB1125444A (xx) |
NL (1) | NL6511079A (xx) |
SE (1) | SE317235B (xx) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3894926A (en) * | 1973-02-09 | 1975-07-15 | Lee Jau Yien | In-out transporter for an enclosed chamber |
US3956093A (en) * | 1974-12-16 | 1976-05-11 | Airco, Inc. | Planar magnetron sputtering method and apparatus |
FR2371524A1 (fr) * | 1976-11-18 | 1978-06-16 | Alsthom Atlantique | Procede de depot d'une couche mince par decomposition d'un gaz dans un plasma |
AU530905B2 (en) | 1977-12-22 | 1983-08-04 | Canon Kabushiki Kaisha | Electrophotographic photosensitive member |
US4151064A (en) * | 1977-12-27 | 1979-04-24 | Coulter Stork U.S.A., Inc. | Apparatus for sputtering cylinders |
DE3331707A1 (de) * | 1983-09-02 | 1985-03-21 | Leybold-Heraeus GmbH, 5000 Köln | Verfahren und vorrichtung zum reaktiven aufstaeuben von verbindungen von metallen und halbleitern |
DE3347036C2 (de) * | 1983-12-24 | 1986-04-24 | Fr. Kammerer GmbH, 7530 Pforzheim | Verfahren zum Beschichten von Trägern mit Metallen |
-
1964
- 1964-08-25 AT AT736264A patent/AT258664B/de active
-
1965
- 1965-01-09 DE DE1515297A patent/DE1515297C3/de not_active Expired
- 1965-08-24 SE SE11018/65A patent/SE317235B/xx unknown
- 1965-08-25 NL NL6511079A patent/NL6511079A/xx unknown
- 1965-08-25 GB GB36586/65A patent/GB1125444A/en not_active Expired
-
1971
- 1971-11-04 US US00195792A patent/US3736246A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
DE1515297B2 (de) | 1978-12-07 |
US3736246A (en) | 1973-05-29 |
DE1515297A1 (de) | 1969-06-12 |
AT258664B (de) | 1967-12-11 |
SE317235B (xx) | 1969-11-10 |
GB1125444A (en) | 1968-08-28 |
DE1515297C3 (de) | 1979-08-02 |