SE317234B - - Google Patents

Info

Publication number
SE317234B
SE317234B SE6577/63A SE657763A SE317234B SE 317234 B SE317234 B SE 317234B SE 6577/63 A SE6577/63 A SE 6577/63A SE 657763 A SE657763 A SE 657763A SE 317234 B SE317234 B SE 317234B
Authority
SE
Sweden
Application number
SE6577/63A
Inventor
E Sirtl
J Nickl
Original Assignee
Siemens Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens Ag filed Critical Siemens Ag
Publication of SE317234B publication Critical patent/SE317234B/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
    • C30B25/02—Epitaxial-layer growth
    • C30B25/08—Reaction chambers; Selection of materials therefor
SE6577/63A 1962-06-14 1963-06-13 SE317234B (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DES79912A DE1255635B (de) 1962-06-14 1962-06-14 Verfahren zum Herstellen kristalliner, insbesondere einkristalliner Schichten aus halbleitenden Stoffen

Publications (1)

Publication Number Publication Date
SE317234B true SE317234B (de) 1969-11-10

Family

ID=7508533

Family Applications (1)

Application Number Title Priority Date Filing Date
SE6577/63A SE317234B (de) 1962-06-14 1963-06-13

Country Status (5)

Country Link
US (1) US3235418A (de)
CH (1) CH443838A (de)
DE (1) DE1255635B (de)
GB (1) GB1035499A (de)
SE (1) SE317234B (de)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1229986B (de) * 1964-07-21 1966-12-08 Siemens Ag Vorrichtung zur Gewinnung reinen Halbleiter-materials
US3610202A (en) * 1969-05-23 1971-10-05 Siemens Ag Epitactic apparatus
US3858548A (en) * 1972-08-16 1975-01-07 Corning Glass Works Vapor transport film deposition apparatus
DE3304060C2 (de) * 1983-02-07 1986-03-20 Kernforschungsanlage Jülich GmbH, 5170 Jülich Verfahren und Vorrichtung zur Herstellung von Einkristallen aus der Gasphase
US4777022A (en) * 1984-08-28 1988-10-11 Stephen I. Boldish Epitaxial heater apparatus and process
JP5017950B2 (ja) * 2005-09-21 2012-09-05 株式会社Ｓｕｍｃｏ エピタキシャル成長装置の温度管理方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE509317A (de) * 1951-03-07 1900-01-01
US2685124A (en) * 1951-04-30 1954-08-03 Ohio Commw Eng Co Method for hi-vac alloying and coated product
US2763581A (en) * 1952-11-25 1956-09-18 Raytheon Mfg Co Process of making p-n junction crystals
US2840494A (en) * 1952-12-31 1958-06-24 Henry W Parker Manufacture of transistors
US2815462A (en) * 1953-05-19 1957-12-03 Electronique Sa Soc Gen Method of forming a film supported a short distance from a surface and cathode-ray tube incorporating such film
NL218408A (de) * 1954-05-18 1900-01-01
DE1029941B (de) * 1955-07-13 1958-05-14 Siemens Ag Verfahren zur Herstellung von einkristallinen Halbleiterschichten
US2979386A (en) * 1956-08-02 1961-04-11 Shockley William Crystal growing apparatus
US3014791A (en) * 1958-10-01 1961-12-26 Merck & Co Inc Pyrolysis apparatus
US3113889A (en) * 1959-12-31 1963-12-10 Space Technology Lab Inc Method of vacuum depositing superconductive metal coatings
US3085913A (en) * 1960-10-03 1963-04-16 Ibm Vacuum evaporation method
US3152022A (en) * 1962-05-25 1964-10-06 Bell Telephone Labor Inc Epitaxial deposition on the surface of a freshly grown dendrite

Also Published As

Publication number Publication date
CH443838A (de) 1967-09-15
GB1035499A (en) 1966-07-06
DE1255635B (de) 1967-12-07
US3235418A (en) 1966-02-15

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