SE0200864D0 - Method and apparatus for printing large data flows - Google Patents

Method and apparatus for printing large data flows

Info

Publication number
SE0200864D0
SE0200864D0 SE0200864A SE0200864A SE0200864D0 SE 0200864 D0 SE0200864 D0 SE 0200864D0 SE 0200864 A SE0200864 A SE 0200864A SE 0200864 A SE0200864 A SE 0200864A SE 0200864 D0 SE0200864 D0 SE 0200864D0
Authority
SE
Sweden
Prior art keywords
workpiece
locations
data representation
field
stripe
Prior art date
Application number
SE0200864A
Other languages
English (en)
Swedish (sv)
Inventor
Anders Thuren
Karel Van Der Mast
Original Assignee
Micronic Laser Systems Ab
Asml Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Micronic Laser Systems Ab, Asml Nv filed Critical Micronic Laser Systems Ab
Priority to SE0200864A priority Critical patent/SE0200864D0/xx
Publication of SE0200864D0 publication Critical patent/SE0200864D0/xx
Priority to HK05108461.8A priority patent/HK1076513B/xx
Priority to JP2003579009A priority patent/JP2005521253A/ja
Priority to US10/508,463 priority patent/US7167231B2/en
Priority to EP03745053A priority patent/EP1485763B1/de
Priority to PCT/SE2003/000462 priority patent/WO2003081338A1/en
Priority to DE60335349T priority patent/DE60335349D1/de
Priority to CNB038066386A priority patent/CN100472325C/zh
Priority to AU2003216005A priority patent/AU2003216005A1/en
Priority to AT03745053T priority patent/ATE491972T1/de
Priority to KR1020047014867A priority patent/KR100879195B1/ko

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/435—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of radiation to a printing material or impression-transfer material
    • B41J2/447—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of radiation to a printing material or impression-transfer material using arrays of radiation sources
    • B41J2/455—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of radiation to a printing material or impression-transfer material using arrays of radiation sources using laser arrays, the laser array being smaller than the medium to be recorded
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/42—Projection printing apparatus, e.g. enlarger, copying camera for automatic sequential copying of the same original
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G03F7/704—Scanned exposure beam, e.g. raster-, rotary- and vector scanning
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/70508—Data handling in all parts of the microlithographic apparatus, e.g. handling pattern data for addressable masks or data transfer to or from different components within the exposure apparatus

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Printing Methods (AREA)
  • Dot-Matrix Printers And Others (AREA)
  • Recording Measured Values (AREA)
  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
  • Adornments (AREA)
SE0200864A 2002-03-21 2002-03-21 Method and apparatus for printing large data flows SE0200864D0 (sv)

Priority Applications (11)

Application Number Priority Date Filing Date Title
SE0200864A SE0200864D0 (sv) 2002-03-21 2002-03-21 Method and apparatus for printing large data flows
KR1020047014867A KR100879195B1 (ko) 2002-03-21 2003-03-19 대용량 데이터 흐름을 프린트하기 위한 방법 및 장치
EP03745053A EP1485763B1 (de) 2002-03-21 2003-03-19 Verfahren und vorrichtung zum drucken grosser datenströme
JP2003579009A JP2005521253A (ja) 2002-03-21 2003-03-19 大量データフローをプリントする方法と装置
US10/508,463 US7167231B2 (en) 2002-03-21 2003-03-19 Method and apparatus for printing large data flows
HK05108461.8A HK1076513B (en) 2002-03-21 2003-03-19 Apparatus and method for pattern a workpiece
PCT/SE2003/000462 WO2003081338A1 (en) 2002-03-21 2003-03-19 Method and apparatus for printing large data flows
DE60335349T DE60335349D1 (de) 2002-03-21 2003-03-19 Verfahren und vorrichtung zum drucken grosser datenströme
CNB038066386A CN100472325C (zh) 2002-03-21 2003-03-19 用于在工件上形成图案的方法和装置
AU2003216005A AU2003216005A1 (en) 2002-03-21 2003-03-19 Method and apparatus for printing large data flows
AT03745053T ATE491972T1 (de) 2002-03-21 2003-03-19 Verfahren und vorrichtung zum drucken grosser datenströme

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SE0200864A SE0200864D0 (sv) 2002-03-21 2002-03-21 Method and apparatus for printing large data flows

Publications (1)

Publication Number Publication Date
SE0200864D0 true SE0200864D0 (sv) 2002-03-21

Family

ID=20287344

Family Applications (1)

Application Number Title Priority Date Filing Date
SE0200864A SE0200864D0 (sv) 2002-03-21 2002-03-21 Method and apparatus for printing large data flows

Country Status (10)

Country Link
US (1) US7167231B2 (de)
EP (1) EP1485763B1 (de)
JP (1) JP2005521253A (de)
KR (1) KR100879195B1 (de)
CN (1) CN100472325C (de)
AT (1) ATE491972T1 (de)
AU (1) AU2003216005A1 (de)
DE (1) DE60335349D1 (de)
SE (1) SE0200864D0 (de)
WO (1) WO2003081338A1 (de)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7317510B2 (en) 2004-12-27 2008-01-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7965373B2 (en) * 2005-06-28 2011-06-21 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method utilizing a datapath having a balanced calculation load
WO2007035166A2 (en) * 2005-09-26 2007-03-29 Micronic Laser Systems Ab Methods and systems for pattern generation based on multiple forms of design data
TWI443472B (zh) * 2007-07-13 2014-07-01 尼康股份有限公司 Pattern forming method and apparatus, exposure method and apparatus, and component manufacturing method and element
JP5020745B2 (ja) * 2007-08-29 2012-09-05 株式会社ニューフレアテクノロジー 描画データの作成方法及び荷電粒子ビーム描画装置
US8893061B2 (en) * 2009-01-30 2014-11-18 Synopsys, Inc. Incremental concurrent processing for efficient computation of high-volume layout data
US8065638B2 (en) * 2009-01-30 2011-11-22 Synopsys, Inc. Incremental concurrent processing for efficient computation of high-volume layout data
CN102109614A (zh) * 2010-11-30 2011-06-29 中国石油集团川庆钻探工程有限公司 一种将地震资料绘制成图件的方法
CN102043166A (zh) * 2010-12-15 2011-05-04 中国石油集团川庆钻探工程有限公司 一种地震数据的处理方法
US8507159B2 (en) 2011-03-16 2013-08-13 Taiwan Semiconductor Manufacturing Company, Ltd. Electron beam data storage system and method for high volume manufacturing
US8473877B2 (en) * 2011-09-06 2013-06-25 Taiwan Semiconductor Manufacturing Company, Ltd. Striping methodology for maskless lithography
NL2009797A (en) * 2011-11-29 2013-05-30 Asml Netherlands Bv Apparatus and method for converting a vector-based representation of a desired device pattern for a lithography apparatus, apparatus and method for providing data to a programmable patterning device, a lithography apparatus and a device manufacturing method.
US8609308B1 (en) * 2012-05-31 2013-12-17 Taiwan Semicondcutor Manufacturing Company, Ltd. Smart subfield method for E-beam lithography

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU5410294A (en) * 1992-11-02 1994-05-24 Etec Systems, Inc. Rasterizer for a pattern generation apparatus
US5488571A (en) * 1993-11-22 1996-01-30 Timex Corporation Method and apparatus for downloading information from a controllable light source to a portable information device
US5631721A (en) * 1995-05-24 1997-05-20 Svg Lithography Systems, Inc. Hybrid illumination system for use in photolithography
SE9800665D0 (sv) * 1998-03-02 1998-03-02 Micronic Laser Systems Ab Improved method for projection printing using a micromirror SLM
SE516914C2 (sv) * 1999-09-09 2002-03-19 Micronic Laser Systems Ab Metoder och rastrerare för högpresterande mönstergenerering
SE517550C2 (sv) * 2000-04-17 2002-06-18 Micronic Laser Systems Ab Mönstergenereringssystem användande en spatialljusmodulator

Also Published As

Publication number Publication date
HK1076513A1 (zh) 2006-01-20
ATE491972T1 (de) 2011-01-15
EP1485763A1 (de) 2004-12-15
US20060055903A1 (en) 2006-03-16
EP1485763B1 (de) 2010-12-15
KR20040094830A (ko) 2004-11-10
DE60335349D1 (de) 2011-01-27
JP2005521253A (ja) 2005-07-14
AU2003216005A1 (en) 2003-10-08
KR100879195B1 (ko) 2009-01-16
US7167231B2 (en) 2007-01-23
CN1643453A (zh) 2005-07-20
WO2003081338A1 (en) 2003-10-02
CN100472325C (zh) 2009-03-25

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