RU2642852C1 - Device for stationary generation of ion beam - Google Patents

Abstract

FIELD: electricity.

SUBSTANCE: device for stationary generation of ion beam contains body with removable upper flange with high-voltage bushing for power and cooling supply with gas discharge chamber, electrodes of ion-optical system, and insulators located in it. The device contains a reference platform, mounted on the upper flange, with vertical supporting insulators mounted on it, on which gas discharge chamber is installed, and an adjuster with grounded and intermediate electrodes of ion-optical system mounted on it.

EFFECT: increasing the reliability of stationary operation of the ion source during long-term operation under the conditions of inevitable presence of impact loads.

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Description

Technical field

The invention relates to the field of creating ion sources intended for the operation of injectors of fast hydrogen atoms in a stationary mode (high-power atomic beams up to 2 megawatts), which can be used to heat plasma in magnetic traps.

State of the art

A device is known for stationary generation of a high-power ion beam, consisting of a gas discharge chamber, an insulating high-voltage structure and a multi-electrode ion-optical system, the electrodes of which are equipped with cooling channels and supply and drain collectors for cooling water (patent for PM No. 145256, op. 10.09. fourteen).

A device is known for generating a stationary beam of hydrogen ions of multi-megawatt power (ITER Final Design Report, Design Description Document (DDD5.3) "Neutral Beam Heating and Current Drive (NBH & CD) System", July 2001). The device comprises a vacuum housing with a removable upper flange, with a high-voltage input placed on it for supplying power and cooling to the ion source nodes - gas discharge chamber and electrodes of the ion-optical system (IOS), also located inside the vacuum volume. IOS consists of 6 electrodes - emission (plasma), grounded and 4 intermediate - accelerating electrodes. The device contains a vertical support flange mounted on the side wall of the housing, on which IOS electrodes and a gas discharge chamber are fixed through horizontal ceramic insulators. Horizontal ceramic insulators perceive the weight load from the nodes of the ion source. The disadvantage of this design is the increased sensitivity to destruction, since horizontal ceramic insulators work in bending and brittle destruction may occur in the presence of weight and shock loads in the tokamak (disruption of the plasma current). In addition, these shock loads can lead to small (tens of microns) vertical displacements of the electrodes of the ion-optical system relative to each other, which with prolonged operation of a stationary ion source will lead to a defocus of the generated ion beam and an increase in power loads on the elements of the beam path.

Disclosure of invention

The technical result of the claimed invention is to increase the reliability of the stationary operation of the ion source during long-term operation in conditions of the inevitable presence of shock loads.

To achieve this result, a device for stationary generation of an ion beam is proposed, comprising a vacuum housing with a removable upper flange equipped with a high-voltage input for supplying power and cooling, with a gas discharge chamber (GDR) located therein, electrodes of the ion-optical system and insulators, while the device contains a supporting platform mounted on the upper flange, with vertical supporting insulators fixed on it, on which the GRK is installed, and an adjustment device, with a lock captured on it by grounded and intermediate electrodes of IOS.

In FIG. 1 shows a schematic diagram of a device, where:

1 - vacuum housing

2 - upper flange

3 - input power and cooling

4 - gas discharge chamber

5 - emission electrode

6 - horizontal insulators

7 - intermediate electrode

8 - grounded electrode

9 - node assembly of the intermediate and grounded electrodes

10 - group of supporting insulators

11 - support platform

12 - thrust

13 - quotation device

A device for generating a stationary beam of hydrogen ions consists of a vacuum housing 1 with a removable upper flange 2, equipped with a high-voltage insulator input 3, designed for an accelerating voltage of up to 100 kV, through which the power supply and cooling of the ion source units are supplied. A stainless steel support platform 11 is attached to the upper flange 2 using rods 12, on which support insulators 10, designed for full accelerating voltage, are mounted on which a cooled copper gas discharge chamber 4 with a mass of more than 100 kg is mounted. The number of ceramic support insulators for such a gas discharge chamber is 3, the diameter and height are 100 and 200 mm, respectively. Compared with the prototype, this method of attaching a gas discharge chamber avoids the lateral weight load on the insulators, which increases the reliability of the entire device. Discharge chamber provides at a discharge power of about 150 kW for receiving the plasma emission surface area of about 1000 cm ² hydrogen ion current density to 0.25 A / cm ^2.

Multi-aperture electrodes of IOS, emission 5, intermediate (accelerating) 7 and grounded 8, are made of oxygen-free copper. The electrodes are cooled by water along the channels laid in them, which are connected to pressure and drain manifolds (not shown in Fig. 1). The emission electrode 5 is connected to the gas discharge chamber through an insulating frame, an accelerating voltage is applied to it and the gas discharge chamber. Intermediate 7 and grounded 8 electrodes are installed on a separate assembly unit 9, where they are mutually aligned and the intermediate electrode is fixed on the flange of the assembly 9 using small-sized 60 mm high ceramic insulators 6 rated for voltage up to 10 kV.

For accurate mutual installation of the assembly of the electrodes 9 and the emission electrode 5 of the ion-optical system of the ion source, a quotation device 13 is used, which is mounted on the supporting platform 11 and ensures the adjustment of the relative position of the electrodes with an accuracy of no worse than 30 μm.

Thus, the proposed design of the device will ensure its long-term performance during operation in a tokamak injection system.

Claims (1)

A device for stationary generation of an ion beam, comprising a housing with a removable upper flange equipped with a high-voltage input for supplying power and cooling, with a gas discharge chamber located therein, electrodes of the ion-optical system and insulators, characterized in that the device comprises a support platform mounted on the upper flange, with vertical supporting insulators fixed to it, on which a gas discharge chamber is mounted, and an alignment device, with grounded mounted on it, etc. intermediate electrodes of the ion-optical system.

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