RU2640369C1 - Meter-mixer - Google Patents

Abstract

FIELD: machine engineering.

SUBSTANCE: meter-mixer contains a body, evaporators and heaters, that maintain a predetermined temperature for evaporation of the reactants, and two evaporators installed one above the other and closed through gaskets with covers with holes for supplying the carrier gas. The evaporators are made with spiral partitions forming spiral channels into which the reagent is loaded to saturate the carrier gas, coaxially installed nozzle inserts forming channels for feeding the saturated vapor-gas mixture through the nozzle channels to the reaction chamber and the buffer zone located between the two mentioned evaporators, the cavity which is sealed from the adjacent evaporation areas of the evaporators, to supply the vapor-gas mixture prepared outside the reactor into it, and with the possibility of supplying the vapor-gas mixture from it through the nozzle channel into the reaction chamber.

EFFECT: ensuring the accuracy of regulation of the composition of compounds obtained as a result of interaction of reagents, the simplicity and compactness of the structure.

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Description

The invention relates to the field of dosing of reagents into a carrier gas stream with a separate supply of reagents to the reaction chamber, which provides steam-gas mixtures at the outlet of the device with a concentration of reactant vapors close to the partial vapor pressures of the reactants at a temperature of temperature control, provides the possibility of mixing the vapor-gas mixture flows and can be used in the chemical industry, semiconductor manufacturing and other industries.

Known dispenser-mixer containing sequentially connected along the gas flow evaporators (RU No. 2384652, published March 20, 2010, IPC С23С 16/448). However, the present invention does not provide for a separate supply of reagents to the reaction chamber; as the saturation path increases, the design of the evaporator increases.

A known method of saturation of gas with vapor of a liquid reagent and a device for its implementation (SU No. 407409, published 11/21/1973, IPC H01L 7/68), where the evaporation takes place in a channel made in the form of an Archimedes spiral, which rotates by a worm mechanism.

The closest analogue is a dispenser-mixer (RU No. 2439196, published January 10, 2012, IPC С23С 16/448) containing a housing, evaporators and heaters that maintain a predetermined temperature for evaporation of the reactants. The known dispenser-mixer is used for separate supply of reagents, but the prototype throughput is limited by the inability to ensure complete saturation of the carrier gas with reagent vapors due to the small contact surface of the reagent with the carrier gas, which is determined by the design features of the device.

The task to which the present invention is directed is to provide a metering evaporator, which makes it possible to ensure close to equilibrium and constant concentration of reactant vapors in the outlet gas-vapor mixture with separate supply of gas mixtures to the reaction space with varying gas flow rates (load on the evaporators).

The technical result of the proposed solution is the accuracy of the regulation of the composition of the compounds resulting from the interaction of the reagents, the simplicity and compactness of the design.

This technical result is achieved by the fact that the dispenser-mixer contains two evaporators mounted on top of each other and closed through gaskets with lids with openings for supplying carrier gas, while the evaporators are made with spiral baffles forming spiral channels into which the reagent for gas saturation is loaded - carriers, coaxially mounted nozzle inserts forming channels for supplying a saturated vapor-gas mixture through nozzle channels to the reaction chamber, and a buffer zone located between and two evaporators, the sealed cavity which is formed by adjacent zones evaporation evaporators for supplying the gas mixture therein, prepared outside the reactor, and to supply a gas mixture therefrom through the nozzle channel into the reaction chamber.

Evaporators can be installed in such a way that a buffer zone is formed between some of them.

The drawing shows the proposed device, where:

1 - device housing

2 - evaporators

3 - reagent

4, 14, 17, 21 - gaskets

5, 23 - covers

6 - holes for the supply of carrier gas

7 - bypass holes

8, 9 - nozzle inserts

10 - furnaces

11 - thermocouples

12 - buffer cavity

13 - nozzle

15, 18 - sleeve

16, 19, 20 - flange

22 - nozzles

24 - collector

25 - channel

The casing of the device is made of pipe 1, into which evaporators 2 are enclosed. The spiral channels of the cross-section are milled in the evaporators. AA to ensure the maximum saturation path of the carrier gas over the reagent 3 loaded on the bottom of the channel. To increase the saturation path one above the other, two evaporators are installed with the corresponding organization of the input-output of the gas mixture. Evaporators 2 are closed through gaskets 4 with covers 5 with openings 6 for supplying carrier gas. Gas is evacuated from the upper level through the bypass holes 7 to the lower level, from the lower level through the nozzle inserts 8, 9 is separately supplied to the reactor. Furnaces 10 maintain a predetermined temperature in the zones of reagent evaporation 3, control is carried out by thermocouples 11. To exclude the influence of temperature between evaporators 2 of different reagents, a buffer cavity 12 is organized, into which a gas-vapor mixture prepared outside the reactor is supplied. The mixture from the buffer cavity through the nozzle 13 is fed into the reactor without mixing with the reagents 3. The cavity of the buffer zone 12 is sealed from neighboring evaporation zones by gaskets 14, which seal in the axial direction and in diameter. The distance between the evaporators 2 is determined by the height of the sleeve 15. The upper evaporator is closed by a flange 16, which through the gasket 17 of the sleeve 18 creates axial forces for the gaskets 4, 14. The flange 16 is pulled to the flange 19. The gasket 21, sandwiched between the flanges 20 and 19, provides tightness along the sleeve 15 and the flange 19. Gas is supplied through the nozzles 22 through the holes in the sleeves 15 and 18 into the upper evaporator and the buffer zone. Gas is supplied to the lower evaporator through a cover 23 with a collector 24 and a channel 25, through which saturable gas is supplied to the center of the upper bank of the lower evaporator.

The dispenser-mixer operates as follows.

Evaporative reagents are placed in evaporators 2. 3. Through the nozzles 22 (Fig. 1), the carrier gas enters the channels 6, 25 and the buffer cavity 12. Coming from the channels 6 and 25 to the evaporators 2, the carrier gas is saturated with vapor of the vaporized substance, the vapor-gas mixture enters the channels 8, 9 and also into channel 13 from the buffer cavity 12. Concentrations of vaporized substances in the carrier gas are set by the temperatures of the furnaces 10, which are controlled by temperature sensors 11. The flows are mixed at the exit of the nozzle channels 8, 9, 13.

The advantages of the claimed device in comparison with the known are:

1. Increased accuracy in setting vapor concentration of vaporized substances in the carrier gas stream.

2. Independence of vapor concentration of vaporized substances in the carrier gas flows from changes in the carrier gas flow rates.

3. The simplicity and compactness of the design will contribute to its widespread use.

Claims (1)

A dispenser-mixer comprising a housing, evaporators and heaters maintaining a predetermined temperature for the evaporation of reagents, characterized in that it contains two evaporators mounted on top of each other and closed through gaskets with lids with openings for supplying carrier gas, while the evaporators are made with spiral baffles forming spiral channels into which the reagent is loaded to saturate the carrier gas, coaxially mounted nozzle inserts forming channels for supplying a saturated vapor-gas mixture through nozzles channels to the reaction chamber, and a buffer zone located between the two evaporators, the cavity of which is sealed from neighboring evaporation zones of evaporators, for supplying a gas-vapor mixture prepared outside the reactor, and with the possibility of supplying a gas-vapor mixture from it through a nozzle channel into the reaction the camera.

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