RU2312424C1 - Device for checking semiconductor items for charge stability using corona discharge - Google Patents

Abstract

FIELD: microelectronics.

SUBSTANCE: proposed device that can be used for manufacturing semiconductor items and for analyzing causes of their failure at user's enabling action on open chip with ion stream formed at corona discharge upon their opening while saving contacts has base for mounting semiconductor item plate, enclosed chamber, corona discharge source, high-voltage power supply, regulating member, reference voltage supply, current take-off resistor (100 kΩ), voltmeter, semiconductor item technical data meter, probe handler, probe handler-to-probe coupling unit, pressure gage, and pump.

EFFECT: enhanced precision of diagnostics, enlarged functional capabilities.

1 cl, 1 dwg

Description

The invention relates to the field of microelectronics and can be used in the manufacturing technology of semiconductor products (PPI) (diodes, transistors, integrated circuits), as well as for the analysis of products that have failed at the consumer, which, after opening them with preservation of contacts, affect an open crystal (without protection compounds, enamels) a stream of ions formed during the corona discharge.

A device for controlling the charge stability of semiconductor structures [1]. Its disadvantage is that the change in the current strength of the corona discharge and, as a consequence, the measurement of the voltage drop across the collector resistor occurs in air.

The closest in technical essence is a device for controlling the charge stability of semiconductor structures [1]. A strong dependence of the corona discharge current on air pressure is known from [2]. By changing the air pressure and acting by corona discharge, it is possible to separate the PPI according to the level of charge stability.

The technical result of the proposed invention is as follows: the production technology of semiconductor devices and integrated circuits includes processes at high and low atmospheric pressure, such as etching, diffusion, and the proposed installation makes it possible to combine the manufacturing processes of PPI with their diagnostics on the plate, which will lead to greater stability and controllability of technological processes and, as a consequence, to an increase in the yield coefficient of suitable products. The use of low or high pressure leads to an increase in the reliability of known diagnostic methods (methods) (low-frequency noise, m-factor, critical supply voltage, etc.), because pressure acts as an external destabilizing factor and accelerates the diagnosis of PPI.

In this case, air pressure (lowered or increased) is selected from the requirements of resistance to climatic factors according to GOST 18725-83. PPI must maintain their parameters during and after exposure to the following climatic factors:

- relative humidity not more than 98% at T = 35 ° C;

- atmospheric reduced pressure 26664 Pa;

- atmospheric high pressure 294199 Pa.

In this case, it is possible to reduce the cost of electrothermal testing of PPI, which is carried out after the assembly of PPI, and not during the process.

The essence of the proposed invention lies in the fact that a plate with PPI and a corona discharge source is placed in a closed chamber, a pump and a manometer are used to change and measure the air pressure in the chamber. The scheme of the device, consisting of a base for fixing a plate with PPI 1, a closed chamber, a corona source 2, a high voltage power supply 3, a regulating element 4, a reference voltage source 5, a collector resistor (100 kOhm) 6, a voltmeter 7, a PPI characteristics meter 8, a probe manipulator 9, a device for interfacing a probe manipulator with probes 10, a pressure gauge 11 and a pump 12 are shown in the drawing.

The device operates as follows: a base with PPI 1, a corona source 2 and a device for interfacing the manipulator of probes with probes 10 are placed in a closed chamber and the pressure is changed using pump 12. The pressure in the chamber is controlled using a pressure gauge 11.

Using the source of the reference voltage 12, the regulating element 11, the high-voltage source of electric power 3, the voltage at the source of the corona discharge 2 is set so that the required surface charge density is provided on the plate with PPI 1. The magnitude of the charge on the plate with PPI is estimated by the magnitude of the voltage drop across the collector resistor 6.

Using the probes, the probe manipulator 9 and the device for interfacing the probe manipulator with the probes 10, select a specific PPI on the plate and using the meter 8 measure the characteristics of the PPI, for example, volt-ampere (I – V) or capacitance-voltage (CV) characteristics. By measuring these characteristics at various air pressures and at different surface charge densities in a closed chamber, it is possible to investigate the dependences of the I – V characteristics or CV characteristics on atmospheric pressure and to separate PPI by the level of stability.

Information sources

1. Copyright certificate No. 1499631 H01L 21/66 dated 04/23/91.

2. Prezhentsev M.D., Reznikov G.Z. The use of corona discharge for rejection of unreliable IET // Electronic Industry 1995 Issue 27. S.25-26

Claims (1)

A device for controlling the charge stability of semiconductor products (PPI) using a corona discharge, containing a base for securing plates with PPI, a structure parameter meter, probes for connecting PPI electrodes to the meter, a corona discharge source, a high voltage electric power source, one output of which is connected to a corona discharge an electrode, and the other is grounded, a control element whose output is connected to a high-voltage power supply, a reference voltage source, the output of which is connected with a regulating element, and the other is grounded, a collector resistor and a voltmeter for determining the crown voltage, characterized in that it further comprises a probe manipulator, a device for interfacing a probe manipulator with probes, a closed chamber, a pump and a manometer, and the base for fixing the plate with PPI, probes , the device for interfacing the manipulator of probes with probes and a corona source is placed in a closed chamber, while the output of the manipulator of probes is connected to the input of the device for interfacing the manipulator of probes with ondami whose output is connected to the probes.