RU2075163C1 - DEVICE FOR PROCESSING A LIQUID BY RADIATION IN A THIN LAYER - Google Patents
DEVICE FOR PROCESSING A LIQUID BY RADIATION IN A THIN LAYER Download PDFInfo
- Publication number
- RU2075163C1 RU2075163C1 RU94032923/13A RU94032923A RU2075163C1 RU 2075163 C1 RU2075163 C1 RU 2075163C1 RU 94032923/13 A RU94032923/13 A RU 94032923/13A RU 94032923 A RU94032923 A RU 94032923A RU 2075163 C1 RU2075163 C1 RU 2075163C1
- Authority
- RU
- Russia
- Prior art keywords
- working cylinder
- pipe
- product
- cylinder
- coaxially
- Prior art date
Links
Abstract
1. Устройство для обработки жидкости излучением в тонком слое, включающее вертикальный рабочий цилиндр, смонтированный внутри него источник излучения, патрубок для подвода жидкости, сообщенную с ним и полостью цилиндра приемную камеру с формирователем тонкого слоя, расположенную соосно с рабочим цилиндром, и патрубок для отвода продукта, отличающееся тем, что устройство снабжено расположенным коаксиально рабочему цилиндру приемным баком, соединенным с патрубком для подвода жидкости в приемную камеру, теплообменником, расположенным внутри приемного бака коаксиально рабочему цилиндру, и компенсационной камерой, корпус которой выполнен в виде цилиндра, переходящего в усеченный конус, установленной между рабочим цилиндром и патрубком для отвода продукта.2. Устройство по п. 1, отличающееся тем, что диаметр корпуса компенсационной камеры превышает диаметр рабочего цилиндра.3. Устройство по пп. 1 и 2, отличающееся тем, что оно дополнительно снабжено автоматической системой управления, обеспечивающей непрерывность регулирования мощности источника излучения в зависимости от расхода и температуры продукта посредством установленного на патрубке для отвода продукта термодатчика.4. Устройство по п. 3, отличающееся тем, что автоматическая система управления снабжена датчиком нижнего уровня, обеспечивающим регулирование технологического процесса при переходе от продукта к заменяющей его жидкости и наоборот.1. A device for processing liquid by radiation in a thin layer, including a vertical working cylinder, a radiation source mounted inside it, a pipe for supplying liquid, a receiving chamber communicated with it and a cylinder cavity with a thin former, coaxially with the working cylinder, and a pipe for removal product, characterized in that the device is equipped with a receiving tank located coaxially to the working cylinder, connected to a pipe for supplying liquid to the receiving chamber, a heat exchanger located in three receiving tank coaxially to the working cylinder and the compensation chamber, wherein the housing is configured as a cylinder, a truncated cone rolling installed between the working cylinder and the nozzle for discharging produkta.2. The device according to claim 1, characterized in that the diameter of the housing of the compensation chamber exceeds the diameter of the working cylinder. The device according to PP. 1 and 2, characterized in that it is additionally equipped with an automatic control system that provides continuous control of the power of the radiation source depending on the flow rate and temperature of the product by means of a temperature sensor installed on the pipe for product discharge. 4. The device according to p. 3, characterized in that the automatic control system is equipped with a lower level sensor that provides process control during the transition from the product to its replacement fluid and vice versa.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| RU94032923/13A RU2075163C1 (en) | 1994-09-20 | 1994-09-20 | DEVICE FOR PROCESSING A LIQUID BY RADIATION IN A THIN LAYER |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| RU94032923/13A RU2075163C1 (en) | 1994-09-20 | 1994-09-20 | DEVICE FOR PROCESSING A LIQUID BY RADIATION IN A THIN LAYER |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| RU94032923A RU94032923A (en) | 1996-04-20 |
| RU2075163C1 true RU2075163C1 (en) | 1997-03-10 |
Family
ID=48434510
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| RU94032923/13A RU2075163C1 (en) | 1994-09-20 | 1994-09-20 | DEVICE FOR PROCESSING A LIQUID BY RADIATION IN A THIN LAYER |
Country Status (1)
| Country | Link |
|---|---|
| RU (1) | RU2075163C1 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| ES2552388T3 (en) * | 2010-05-20 | 2015-11-27 | Miteco Ag | Installation and procedure for the pasteurization of at least one liquid |
-
1994
- 1994-09-20 RU RU94032923/13A patent/RU2075163C1/en active
Also Published As
| Publication number | Publication date |
|---|---|
| RU94032923A (en) | 1996-04-20 |
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