RU2074575C1 - MAGNETRON OF THE CYLINDRICAL TYPE FOR SPRAYING OF THE INTERNAL SURFACE OF BODIES - Google Patents

MAGNETRON OF THE CYLINDRICAL TYPE FOR SPRAYING OF THE INTERNAL SURFACE OF BODIES Download PDF

Info

Publication number
RU2074575C1
RU2074575C1 RU94039365/02A RU94039365A RU2074575C1 RU 2074575 C1 RU2074575 C1 RU 2074575C1 RU 94039365/02 A RU94039365/02 A RU 94039365/02A RU 94039365 A RU94039365 A RU 94039365A RU 2074575 C1 RU2074575 C1 RU 2074575C1
Authority
RU
Russia
Prior art keywords
thickness
spraying
magnetron
bodies
internal surface
Prior art date
Application number
RU94039365/02A
Other languages
Russian (ru)
Other versions
RU94039365A (en
Inventor
Н.И. Балалыкин
Original Assignee
Объединенный Институт Ядерных Исследований
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Объединенный Институт Ядерных Исследований filed Critical Объединенный Институт Ядерных Исследований
Priority to RU94039365/02A priority Critical patent/RU2074575C1/en
Application granted granted Critical
Publication of RU94039365A publication Critical patent/RU94039365A/en
Publication of RU2074575C1 publication Critical patent/RU2074575C1/en

Links

Landscapes

  • Physical Vapour Deposition (AREA)

Abstract

Магнетрон цилиндрического типа для напыления внутренней поверхности тела, состоящий из вакуумной камеры, проходного высоковольтного изолятора, катода-мишени, элементов магнитной системы и источников питания, отличающийся тем, что каждый элемент магнитной системы выполнен из набора кольцевых постоянных магнитов со встречными полюсами с соотношением толщины магнитов 1:4: 1, состыкованных через шайбы-концентраторы магнитного поля, выполненные из ферромагнитного материала и толщиной, определяемой из соотношения6 < h/h< 7,где h- толщина шайбы-концентратора магнитного поля;h- толщина единичного кольцевого магнита,а на концах каждого элемента магнитной системы установлены шайбы-полюсные наконечники толщиной hиз ферромагнитного материала.A cylindrical magnetron for spraying the inner surface of the body, consisting of a vacuum chamber, a high-voltage bushing, a target cathode, elements of a magnetic system and power sources, characterized in that each element of the magnetic system is made of a set of ring permanent magnets with opposing poles with a ratio of the thickness of the magnets 1: 4: 1, joined through washers-concentrators of the magnetic field, made of ferromagnetic material and the thickness determined from the ratio 6 <h / h <7, where h is the thickness of the washer-k the center of the magnetic field; h is the thickness of a single ring magnet, and at the ends of each element of the magnetic system washers and pole pieces are installed with a thickness h of ferromagnetic material.

RU94039365/02A 1994-10-20 1994-10-20 MAGNETRON OF THE CYLINDRICAL TYPE FOR SPRAYING OF THE INTERNAL SURFACE OF BODIES RU2074575C1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
RU94039365/02A RU2074575C1 (en) 1994-10-20 1994-10-20 MAGNETRON OF THE CYLINDRICAL TYPE FOR SPRAYING OF THE INTERNAL SURFACE OF BODIES

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
RU94039365/02A RU2074575C1 (en) 1994-10-20 1994-10-20 MAGNETRON OF THE CYLINDRICAL TYPE FOR SPRAYING OF THE INTERNAL SURFACE OF BODIES

Publications (2)

Publication Number Publication Date
RU94039365A RU94039365A (en) 1997-02-27
RU2074575C1 true RU2074575C1 (en) 1997-02-27

Family

ID=48432665

Family Applications (1)

Application Number Title Priority Date Filing Date
RU94039365/02A RU2074575C1 (en) 1994-10-20 1994-10-20 MAGNETRON OF THE CYLINDRICAL TYPE FOR SPRAYING OF THE INTERNAL SURFACE OF BODIES

Country Status (1)

Country Link
RU (1) RU2074575C1 (en)

Also Published As

Publication number Publication date
RU94039365A (en) 1997-02-27

Similar Documents

Publication Publication Date Title
ES2122024T3 (en) SET OF SPARKLING MAGNETS WITH IMPROVED FLAT MAGNETRON.
RU95107039A (en) Plasma engine of shorter length with closed electron drift
KR950006224A (en) Combustion Efficiency Enhancement Device
KR920007113A (en) Plasma processing apparatus using plasma generated by microwaves
ATE173130T1 (en) PLASMA ACCELERATOR WITH CLOSED ELECTRON TRACK
KR890014782A (en) Magnetron Sputtering Device
KR880005832A (en) Microwave Magnetron
GB1454754A (en) Permanent magnet structure
RU2074575C1 (en) MAGNETRON OF THE CYLINDRICAL TYPE FOR SPRAYING OF THE INTERNAL SURFACE OF BODIES
SE9504639D0 (en) solenoid
JPS5562164A (en) Sputtering unit
CN85100096B (en) Planar magnetron sputtering target and coating method thereof
JPS6142903Y2 (en)
JPS5616671A (en) Sputtering apparatus
KR850005724A (en) magnetron
JPS648624A (en) Plasma apparatus
CN1004495B (en) Combined magnetic-controlled sputter target and its plating method
SU943868A1 (en) Inductor for permanent magnet magnetization
JPS6427038A (en) Voice coil type actuator
WO2002041356A3 (en) Sputter cathode with magnetic shunt
KR970067407A (en) Principle of generating high frequency magnetic field with frequency
JPS5593641A (en) Electromagnetic focussing cathode ray tube
JPS5779170A (en) Target for magnetron sputtering
Baran Design of a Permanent Magnet System for an ECR-Type Ion Source
Wolfram Application of Cobalt--REPM in Focusing of Traveling Wave Tubes.(TWT's)