RU2017115737A - PHOTOPOLYMER COMPOSITION FOR THE PRODUCTION OF HEAT-RESISTANT OBJECTS BY THE METHOD OF LASER STEREOLITOGRAPHY - Google Patents

PHOTOPOLYMER COMPOSITION FOR THE PRODUCTION OF HEAT-RESISTANT OBJECTS BY THE METHOD OF LASER STEREOLITOGRAPHY Download PDF

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Publication number
RU2017115737A
RU2017115737A RU2017115737A RU2017115737A RU2017115737A RU 2017115737 A RU2017115737 A RU 2017115737A RU 2017115737 A RU2017115737 A RU 2017115737A RU 2017115737 A RU2017115737 A RU 2017115737A RU 2017115737 A RU2017115737 A RU 2017115737A
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RU
Russia
Prior art keywords
laser
heat
stereolitography
production
diacrylamide
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RU2017115737A
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Russian (ru)
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RU2017115737A3 (en
RU2684387C2 (en
Inventor
Виталий Федорович Бурдуковский
Бато Чингисович Холхоев
Елена Николаевна Горенская
Борис Дамбаевич Очиров
Петр Сергеевич Тимашев
Никита Владимирович Минаев
Дарья Сергеевна Дудова
Ксения Николаевна Бардакова
Original Assignee
Федеральное государственное бюджетное учреждение науки Байкальский институт природопользования Сибирского отделения Российской академии наук (БИП СО РАН)
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Application filed by Федеральное государственное бюджетное учреждение науки Байкальский институт природопользования Сибирского отделения Российской академии наук (БИП СО РАН) filed Critical Федеральное государственное бюджетное учреждение науки Байкальский институт природопользования Сибирского отделения Российской академии наук (БИП СО РАН)
Priority to RU2017115737A priority Critical patent/RU2684387C2/en
Publication of RU2017115737A3 publication Critical patent/RU2017115737A3/ru
Publication of RU2017115737A publication Critical patent/RU2017115737A/en
Application granted granted Critical
Publication of RU2684387C2 publication Critical patent/RU2684387C2/en

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/16—Nitrogen-containing compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L77/00—Compositions of polyamides obtained by reactions forming a carboxylic amide link in the main chain; Compositions of derivatives of such polymers
    • C08L77/06—Polyamides derived from polyamines and polycarboxylic acids
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/005—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein
    • G03C1/04—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein with macromolecular additives; with layer-forming substances
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders

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  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Polymerisation Methods In General (AREA)

Claims (5)

Фотополимеризующаяся композиция для изготовления термостойких материалов лазерной стериолитографией с использованием излучения λ=405 нм следующего массового состава:Photopolymerizable composition for the manufacture of heat-resistant materials by laser sterolithography using radiation λ = 405 nm of the following mass composition: 1. поли-м-фениленизофталамид - 20%;1. poly-m-phenyleneisophthalamide - 20%; 2. в качестве акриламидного компонента могут выступать 4,4'-дифенилфталиддиакриламид, 4,4'-оксидифенилдиакриламид, диакриламид [ди(4,4'-дифенилоксидизофталоиламидо)]-фенил-4'-фенилоксид, диакриламид [пента(4,4'-дифенилоксидизофталоиламидо)]-фенил-4'-фенилоксид - 2%;2. The acrylamide component may be 4,4'-diphenylphthalide diacrylamide, 4,4'-oxydiphenyl diacrylamide, diacrylamide [di (4,4'-diphenyloxyisophthaloylamide)] - phenyl-4'-phenyl oxide, diacrylamide [penta (4,4 ' -diphenyloxyisophthaloylamido)] - phenyl-4'-phenyl oxide - 2%; 3. N,N'-диметилакриламид - 76%;3. N, N'-dimethylacrylamide - 76%; 4. 2-бензил-2-диметиламино-1-(4-морфолинофенил)-бутанон - 2%.4. 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) butanone - 2%.
RU2017115737A 2017-05-03 2017-05-03 Photopolymer composition for the production of thermal-resistant objects by the method of laser stereolithography RU2684387C2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
RU2017115737A RU2684387C2 (en) 2017-05-03 2017-05-03 Photopolymer composition for the production of thermal-resistant objects by the method of laser stereolithography

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
RU2017115737A RU2684387C2 (en) 2017-05-03 2017-05-03 Photopolymer composition for the production of thermal-resistant objects by the method of laser stereolithography

Publications (3)

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RU2017115737A3 RU2017115737A3 (en) 2018-11-06
RU2017115737A true RU2017115737A (en) 2018-11-06
RU2684387C2 RU2684387C2 (en) 2019-04-08

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RU2017115737A RU2684387C2 (en) 2017-05-03 2017-05-03 Photopolymer composition for the production of thermal-resistant objects by the method of laser stereolithography

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Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
RU2760736C1 (en) * 2021-04-19 2021-11-30 Федеральное государственное бюджетное учреждение науки Байкальский институт природопользования Сибирского отделения Российской академии наук (БИП СО РАН) Curable resins for making heat-resistant 3d objects using dlp 3d printing

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6439518A (en) * 1987-08-06 1989-02-09 Tokyo Keiki Kk Rectilinear propagation extent measurement system for pile member
RU2091385C1 (en) * 1991-09-23 1997-09-27 Циба-Гейги АГ Bisacylphosphine oxides, composition and method of application of coatings
SG53043A1 (en) * 1996-08-28 1998-09-28 Ciba Geigy Ag Molecular complex compounds as photoinitiators
US6569602B1 (en) * 1998-10-05 2003-05-27 E. I. Du Pont De Nemours And Company Ionization radiation imageable photopolymer compositions
US20030229163A1 (en) * 2002-03-28 2003-12-11 Fuji Photo Film Co., Ltd. Dye-containing curable composition, color filter prepared using the same, and process of preparing color filter

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RU2017115737A3 (en) 2018-11-06
RU2684387C2 (en) 2019-04-08

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MM4A The patent is invalid due to non-payment of fees

Effective date: 20190504