RU2015155194A - Способ нанесения идентификационной отметки, подтверждающей подлинность изделия - Google Patents
Способ нанесения идентификационной отметки, подтверждающей подлинность изделия Download PDFInfo
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- RU2015155194A RU2015155194A RU2015155194A RU2015155194A RU2015155194A RU 2015155194 A RU2015155194 A RU 2015155194A RU 2015155194 A RU2015155194 A RU 2015155194A RU 2015155194 A RU2015155194 A RU 2015155194A RU 2015155194 A RU2015155194 A RU 2015155194A
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06Q—INFORMATION AND COMMUNICATION TECHNOLOGY [ICT] SPECIALLY ADAPTED FOR ADMINISTRATIVE, COMMERCIAL, FINANCIAL, MANAGERIAL OR SUPERVISORY PURPOSES; SYSTEMS OR METHODS SPECIALLY ADAPTED FOR ADMINISTRATIVE, COMMERCIAL, FINANCIAL, MANAGERIAL OR SUPERVISORY PURPOSES, NOT OTHERWISE PROVIDED FOR
- G06Q30/00—Commerce
- G06Q30/018—Certifying business or products
- G06Q30/0185—Product, service or business identity fraud
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45523—Pulsed gas flow or change of composition over time
- C23C16/45525—Atomic layer deposition [ALD]
- C23C16/45555—Atomic layer deposition [ALD] applied in non-semiconductor technology
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- D—TEXTILES; PAPER
- D21—PAPER-MAKING; PRODUCTION OF CELLULOSE
- D21H—PULP COMPOSITIONS; PREPARATION THEREOF NOT COVERED BY SUBCLASSES D21C OR D21D; IMPREGNATING OR COATING OF PAPER; TREATMENT OF FINISHED PAPER NOT COVERED BY CLASS B31 OR SUBCLASS D21G; PAPER NOT OTHERWISE PROVIDED FOR
- D21H21/00—Non-fibrous material added to the pulp, characterised by its function, form or properties; Paper-impregnating or coating material, characterised by its function, form or properties
- D21H21/14—Non-fibrous material added to the pulp, characterised by its function, form or properties; Paper-impregnating or coating material, characterised by its function, form or properties characterised by function or properties in or on the paper
- D21H21/40—Agents facilitating proof of genuineness or preventing fraudulent alteration, e.g. for security paper
- D21H21/44—Latent security elements, i.e. detectable or becoming apparent only by use of special verification or tampering devices or methods
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- G—PHYSICS
- G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
- G09F—DISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
- G09F3/00—Labels, tag tickets, or similar identification or indication means; Seals; Postage or like stamps
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Business, Economics & Management (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Theoretical Computer Science (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Finance (AREA)
- Accounting & Taxation (AREA)
- Development Economics (AREA)
- Economics (AREA)
- Entrepreneurship & Innovation (AREA)
- Marketing (AREA)
- Strategic Management (AREA)
- General Business, Economics & Management (AREA)
- Credit Cards Or The Like (AREA)
- Chemical Vapour Deposition (AREA)
- Printing Methods (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Claims (18)
1. Способ нанесения на продукт идентификационной отметки для подтверждения подлинности, включающий:
выбор подложки и типа идентификационной отметки и
формирование на подложке методом атомно-слоевого осаждения (АСО) идентификационной отметки выбранного типа, причем
формирование идентификационной отметки включает нанесение методом АСО по меньшей мере одного слоя, имеющего заданное свойство, пригодное для его детектирования на подложке соответствующим аналитическим методом.
2. Способ по п. 1, в котором формирование идентификационной отметки включает нанесение на подложку методом АСО ламинатной структуры из нескольких слоев, каждый из которых обладает свойством, пригодным для его детектирования соответствующим аналитическим методом.
3. Способ по п. 2, в котором нанесение ламинатной структуры из нескольких слоев включает нанесение нескольких слоев, имеющих различные заданные свойства.
4. Способ по п. 2, в котором нанесение ламинатной структуры из нескольких слоев включает нанесение нескольких слоев, содержащих различные материалы.
5. Способ по п. 1, в котором выбор подложки включает выбор нанесения идентификационной отметки непосредственно на продукт или на отдельную подложку.
6. Способ по п. 5, дополнительно включающий, в случае выбора нанесения на отдельную подложку, прикрепление идентификационной отметки к продукту.
7. Способ по п. 6, дополнительно включающий покрывание подложки слоем, конфигурируемым с обеспечением возможности удаления подложки с продукта.
8. Способ по п. 5, в котором отдельная подложка содержит по меньшей мере зерно, сферу, частицу, нить или нанотрубку.
9. Способ по п. 1, в котором заданным свойством является толщина слоя, изотопное отношение материала слоя, относительное содержание компонентов материала слоя, оптическое свойство слоя, электрическое свойство слоя или магнитное свойство слоя.
10. Способ по п. 1, в котором аналитический метод включает по меньшей мере один из следующих методов: трансмиссионную спектроскопию, отражательную спектроскопию, флуоресцентную спектроскопию, оптическую спектроскопию, атомно-силовую микроскопию, сканирующую туннельную микроскопию, компьютерную микротомографию, сфокусированный ионный пучок, времяпролетную методику анализа методом детектирования атомов отдачи и спектроскопию диффузного отражения.
11. Способ по п. 1, дополнительно включающий удаление части нанесенного слоя или слоев для формирования трехмерной структуры.
12. Идентификационная отметка для подтверждения подлинности, нанесенная посредством способа согласно любому из предыдущих пунктов.
13. Реактор атомно-слоевого осаждения для нанесения идентификационной отметки для подтверждения подлинности по п. 12.
14. Компьютерная программа, содержащая код для осуществления, при ее запуске на процессоре, способа по любому из пп. 1-11.
15. Запоминающая среда, содержащая компьютерную программу по п. 14.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/FI2013/050714 WO2014207290A1 (en) | 2013-06-27 | 2013-06-27 | Anti-counterfeit signature |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| RU2015155194A true RU2015155194A (ru) | 2017-08-01 |
Family
ID=52141144
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| RU2015155194A RU2015155194A (ru) | 2013-06-27 | 2013-06-27 | Способ нанесения идентификационной отметки, подтверждающей подлинность изделия |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US10600058B2 (ru) |
| EP (1) | EP3014533A4 (ru) |
| JP (1) | JP6411484B2 (ru) |
| KR (1) | KR20160024872A (ru) |
| CN (1) | CN105339523B (ru) |
| RU (1) | RU2015155194A (ru) |
| SG (1) | SG11201509725WA (ru) |
| TW (1) | TWI643088B (ru) |
| WO (1) | WO2014207290A1 (ru) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6732202B2 (ja) | 2016-05-19 | 2020-07-29 | Smc株式会社 | 電磁弁 |
| CA3039748A1 (en) * | 2016-09-15 | 2018-03-22 | Arylla Inc. | System and method of product authentication |
| CN107643269B (zh) * | 2017-08-31 | 2020-02-04 | 深圳市中达瑞和科技有限公司 | 交叉字迹时序鉴别方法、系统及计算装置 |
| US10618340B2 (en) | 2018-05-16 | 2020-04-14 | Viavi Solutions Inc. | Security feature based on a single axis alignment of mirrors in a structured surface that forms a micro mirror array |
Family Cites Families (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4864281A (en) * | 1986-02-12 | 1989-09-05 | E.A.S. Technologies, Inc. | Ferromagnetic label for use in anti-theft surveillance system |
| US6216949B1 (en) * | 1996-06-28 | 2001-04-17 | Bundesdruckerei Gmbh | Process for protecting products against forgery by means of machine-readable distinctive safety features |
| JP3329234B2 (ja) | 1997-06-20 | 2002-09-30 | 凸版印刷株式会社 | 偽造防止用フィルム及び偽造防止用転写箔 |
| JP3707280B2 (ja) | 1999-01-19 | 2005-10-19 | 東陶機器株式会社 | 衛生洗浄装置 |
| GB0015873D0 (en) * | 2000-06-28 | 2000-08-23 | Rue De Int Ltd | Optically variable security device |
| KR100400246B1 (ko) * | 2000-12-29 | 2003-10-01 | 주식회사 하이닉스반도체 | 고집적 디램용 셀 커패시터의 제조방법 |
| US7085616B2 (en) * | 2001-07-27 | 2006-08-01 | Applied Materials, Inc. | Atomic layer deposition apparatus |
| US7629017B2 (en) | 2001-10-05 | 2009-12-08 | Cabot Corporation | Methods for the deposition of conductive electronic features |
| JP2006186331A (ja) * | 2004-11-30 | 2006-07-13 | Semiconductor Energy Lab Co Ltd | 半導体装置の作製方法 |
| US7517791B2 (en) | 2004-11-30 | 2009-04-14 | Semiconductor Energy Laboratory Co., Ltd. | Method for manufacturing semiconductor device |
| US8069782B2 (en) * | 2004-12-20 | 2011-12-06 | Nanoink, Inc. | Stamps with micrometer- and nanometer-scale features and methods of fabrication thereof |
| FI121750B (fi) | 2005-11-17 | 2011-03-31 | Beneq Oy | ALD-reaktori |
| WO2007148768A1 (en) | 2006-06-23 | 2007-12-27 | Semiconductor Energy Laboratory Co., Ltd. | Personal data management system and nonvolatile memory card |
| US20080264563A1 (en) * | 2007-04-26 | 2008-10-30 | Joseph Kuczynski | Apparatus and Method to Enable Easy Removal of One Substrate from Another for Enhanced Reworkability and Recyclability |
| AT509792A1 (de) * | 2010-05-04 | 2011-11-15 | Hueck Folien Gmbh | Sicherheitselemente mit metallischen magnetschichten |
| IN2014DN04032A (ru) * | 2011-11-22 | 2015-05-15 | Picosun Oy | |
| EP2688011A1 (de) * | 2012-07-19 | 2014-01-22 | 3S Simons Security Systems GmbH | Mikropartikel, insbesondere Mikropartikel zur fälschungssicheren Kennzeichnung von Produkten |
| US8791023B2 (en) * | 2012-08-31 | 2014-07-29 | Eastman Kodak Company | Patterned thin film dielectric layer formation |
-
2013
- 2013-06-27 US US14/899,871 patent/US10600058B2/en not_active Expired - Fee Related
- 2013-06-27 RU RU2015155194A patent/RU2015155194A/ru unknown
- 2013-06-27 JP JP2016522674A patent/JP6411484B2/ja not_active Expired - Fee Related
- 2013-06-27 KR KR1020157036048A patent/KR20160024872A/ko not_active Application Discontinuation
- 2013-06-27 EP EP13888319.4A patent/EP3014533A4/en not_active Withdrawn
- 2013-06-27 WO PCT/FI2013/050714 patent/WO2014207290A1/en active Application Filing
- 2013-06-27 SG SG11201509725WA patent/SG11201509725WA/en unknown
- 2013-06-27 CN CN201380077763.XA patent/CN105339523B/zh not_active Expired - Fee Related
-
2014
- 2014-05-22 TW TW103117911A patent/TWI643088B/zh not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| WO2014207290A1 (en) | 2014-12-31 |
| KR20160024872A (ko) | 2016-03-07 |
| CN105339523A (zh) | 2016-02-17 |
| TWI643088B (zh) | 2018-12-01 |
| EP3014533A4 (en) | 2016-11-09 |
| EP3014533A1 (en) | 2016-05-04 |
| US10600058B2 (en) | 2020-03-24 |
| CN105339523B (zh) | 2020-04-14 |
| US20160140573A1 (en) | 2016-05-19 |
| JP6411484B2 (ja) | 2018-10-24 |
| TW201506672A (zh) | 2015-02-16 |
| JP2016535685A (ja) | 2016-11-17 |
| SG11201509725WA (en) | 2015-12-30 |
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