RU2008142152A - EJECTOR NOZZLE FOR GAS CHLORIDE HYDROGEN, REACTION DEVICE FOR PRODUCING TRICHLORESILANE AND METHOD FOR PRODUCING TRICHLOROSILANE - Google Patents
EJECTOR NOZZLE FOR GAS CHLORIDE HYDROGEN, REACTION DEVICE FOR PRODUCING TRICHLORESILANE AND METHOD FOR PRODUCING TRICHLOROSILANE Download PDFInfo
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- RU2008142152A RU2008142152A RU2008142152/15A RU2008142152A RU2008142152A RU 2008142152 A RU2008142152 A RU 2008142152A RU 2008142152/15 A RU2008142152/15 A RU 2008142152/15A RU 2008142152 A RU2008142152 A RU 2008142152A RU 2008142152 A RU2008142152 A RU 2008142152A
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- hydrogen chloride
- chloride gas
- ejector
- rod
- gas
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Abstract
1. Эжекторная форсунка для газа хлористого водорода, используемая в реакционном устройстве для получения трихлорсилана, в котором порошок металлического кремния взаимодействует с газом хлористого водорода для образования трихлорсилана, содержит: ! стержень, проходящий в продольном направлении; и ! головку, которая выполнена на одном конце стержня и проходит в направлении, пересекающем продольное направление стержня; ! при этом канал подачи, проходящий в продольном направлении, выполнен в стержне, ! множество эжекторных каналов выполнены в головке, и ! каждый из эжекторных каналов соединен с возможностью сообщения с каналом подачи и открыт на наружной поверхности головки к направлению, пересекающему направление, в котором проходит канал подачи. ! 2. Эжекторная форсунка для газа хлористого водорода по п.1, в которой резьба выполнена на стержне. ! 3. Эжекторная форсунка для газа хлористого водорода по п.1, в которой множество эжекторных каналов выполнены таким образом, чтобы проходить в радиальном направлении от канала подачи. ! 4. Реакционное устройство для получения трихлорсилана, в котором порошок металлического кремния взаимодействует с газом хлористого водорода для образования трихлорсилана, включающее в себя: ! основной корпус устройства, к которому подают порошок металлического кремния; ! нижнюю пластину, выполненную на нижнем конце основного корпуса устройства; и ! устройство ввода газа, которое вводит газ хлористого водорода в основной корпус устройства через нижнюю пластину, ! при этом устройство ввода газа содержит множество эжекторных форсунок для газа хлористого водорода по п.1, проходящих с во 1. An ejector nozzle for a hydrogen chloride gas used in a reaction device for producing trichlorosilane, in which a silicon metal powder interacts with a hydrogen chloride gas to form trichlorosilane, contains:! a rod extending in the longitudinal direction; and! a head that is made at one end of the rod and extends in a direction intersecting the longitudinal direction of the rod; ! wherein the feed channel extending in the longitudinal direction is made in the shaft,! many ejector channels are made in the head, and! each of the ejector channels is connected with the possibility of communication with the feed channel and is open on the outer surface of the head to a direction crossing the direction in which the feed channel passes. ! 2. The ejector nozzle for a gas of hydrogen chloride according to claim 1, in which the thread is made on the rod. ! 3. An ejector nozzle for a hydrogen chloride gas according to claim 1, wherein the plurality of ejector channels are configured to extend radially from the feed channel. ! 4. A reaction device for producing trichlorosilane, in which a metal silicon powder is reacted with a hydrogen chloride gas to form trichlorosilane, including:! the main body of the device to which silicon metal powder is supplied; ! a lower plate made at the lower end of the main body of the device; and! a gas input device that introduces hydrogen chloride gas into the main body of the device through the bottom plate,! wherein the gas input device comprises a plurality of ejector nozzles for hydrogen chloride gas according to claim 1, passing through
Claims (5)
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007277788 | 2007-10-25 | ||
JP2007277788 | 2007-10-25 | ||
JP2008197072 | 2008-07-30 | ||
JP2008197072A JP5343437B2 (en) | 2007-10-25 | 2008-07-30 | Hydrogen chloride gas ejection member, reactor for producing trichlorosilane, and method for producing trichlorosilane |
Publications (2)
Publication Number | Publication Date |
---|---|
RU2008142152A true RU2008142152A (en) | 2010-04-27 |
RU2486954C2 RU2486954C2 (en) | 2013-07-10 |
Family
ID=40628834
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
RU2008142152/05A RU2486954C2 (en) | 2007-10-25 | 2008-10-23 | Ejector atomiser for hydrogen chloride gas, reactor for production of trichlorosilane and method of its production |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP5343437B2 (en) |
CN (2) | CN104211069B (en) |
RU (1) | RU2486954C2 (en) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101962189A (en) * | 2010-10-13 | 2011-02-02 | 宁夏阳光硅业有限公司 | Member for spouting hydrogen chloride gas for trichlorosilane synthesizing tower and trichlorosilane synthesizing method |
US11071961B2 (en) | 2017-11-20 | 2021-07-27 | Tokuyama Corporation | Fluidized bed reaction container and method for producing trichlorosilane |
US20200339427A1 (en) * | 2017-11-20 | 2020-10-29 | Tokuyama Corporation | Method for producing trichlorosilane and device for producing trichlorosilane |
WO2019201439A1 (en) * | 2018-04-18 | 2019-10-24 | Wacker Chemie Ag | Method for producing chlorosilanes |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2841476A (en) * | 1953-07-16 | 1958-07-01 | Dorr Oliver Inc | Apparatus for contacting solids with gases |
US3040439A (en) * | 1959-07-21 | 1962-06-26 | Gen Am Transport | Solids fluidizing vessel and gas diffuser plate and nozzle elements therefor |
JP2519094B2 (en) * | 1988-11-29 | 1996-07-31 | 高純度シリコン株式会社 | Flow reactor for trichlorosilane production |
RU2060836C1 (en) * | 1992-05-28 | 1996-05-27 | Евгений Валентинович Кузьмин | Sprayer |
KR100411180B1 (en) * | 2001-01-03 | 2003-12-18 | 한국화학연구원 | Method for preparing polycrystalline silicon |
KR100725001B1 (en) * | 2003-06-30 | 2007-06-04 | 현대중공업 주식회사 | Fluidizing gas Nozzle assembly in a fluidized bed reactor |
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2008
- 2008-07-30 JP JP2008197072A patent/JP5343437B2/en active Active
- 2008-10-23 RU RU2008142152/05A patent/RU2486954C2/en active
- 2008-10-23 CN CN201410434126.XA patent/CN104211069B/en active Active
- 2008-10-23 CN CNA2008101705998A patent/CN101417805A/en active Pending
Also Published As
Publication number | Publication date |
---|---|
JP5343437B2 (en) | 2013-11-13 |
RU2486954C2 (en) | 2013-07-10 |
JP2009120468A (en) | 2009-06-04 |
CN104211069A (en) | 2014-12-17 |
CN101417805A (en) | 2009-04-29 |
CN104211069B (en) | 2016-08-31 |
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