RU2002119440A - A method of producing carbon nanotubes - Google Patents

A method of producing carbon nanotubes

Info

Publication number
RU2002119440A
RU2002119440A RU2002119440/02A RU2002119440A RU2002119440A RU 2002119440 A RU2002119440 A RU 2002119440A RU 2002119440/02 A RU2002119440/02 A RU 2002119440/02A RU 2002119440 A RU2002119440 A RU 2002119440A RU 2002119440 A RU2002119440 A RU 2002119440A
Authority
RU
Russia
Prior art keywords
carbon nanotubes
producing carbon
deposition
direct current
inert gas
Prior art date
Application number
RU2002119440/02A
Other languages
Russian (ru)
Other versions
RU2218299C1 (en
Inventor
Сергей Васильевич Антоненко
Сергей Николаевич Мальцев
Original Assignee
Московский инженерно-физический институт (государственный университет)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Московский инженерно-физический институт (государственный университет) filed Critical Московский инженерно-физический институт (государственный университет)
Priority to RU2002119440A priority Critical patent/RU2218299C1/en
Application granted granted Critical
Publication of RU2218299C1 publication Critical patent/RU2218299C1/en
Publication of RU2002119440A publication Critical patent/RU2002119440A/en

Links

Claims (1)

Способ получения углеродных нанотрубок, включающий напыление углеродных пленок в вакуумной камере в атмосфере инертного газа, отличающийся тем, что напыление углеродных пленок, содержащих нанотрубки, производится путем магнетронного распыления на постоянном токе, при этом процесс распыления проводят при давлении инертного газа в камере (1-5)·10-2 Торр и силе постоянного тока питания мишени 40-100 мА.A method of producing carbon nanotubes, including the deposition of carbon films in a vacuum chamber in an inert gas atmosphere, characterized in that the deposition of carbon films containing nanotubes is carried out by direct current magnetron sputtering, while the spraying process is carried out at an inert gas pressure in the chamber (1- 5) · 10 -2 Torr and the direct current power of the target is 40-100 mA.
RU2002119440A 2002-07-17 2002-07-17 A method to production of carbon nanopipes RU2218299C1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
RU2002119440A RU2218299C1 (en) 2002-07-17 2002-07-17 A method to production of carbon nanopipes

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
RU2002119440A RU2218299C1 (en) 2002-07-17 2002-07-17 A method to production of carbon nanopipes

Publications (2)

Publication Number Publication Date
RU2218299C1 RU2218299C1 (en) 2003-12-10
RU2002119440A true RU2002119440A (en) 2004-02-20

Family

ID=32066935

Family Applications (1)

Application Number Title Priority Date Filing Date
RU2002119440A RU2218299C1 (en) 2002-07-17 2002-07-17 A method to production of carbon nanopipes

Country Status (1)

Country Link
RU (1) RU2218299C1 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
RU2561616C2 (en) * 2014-01-09 2015-08-27 Федеральное государственное бюджетное учреждение науки Институт неорганической химии им. А.В. Николаева Сибирского отделения Российской академии наук Method to produce arrays of aligned carbon nanotubes on substrate surface

Also Published As

Publication number Publication date
RU2218299C1 (en) 2003-12-10

Similar Documents

Publication Publication Date Title
JP3778294B2 (en) Method and apparatus for generating a discharge in the vapor of the RF electrode itself for sustained self-sputtering and evaporation of the electrode
WO2005026409A3 (en) Replaceable plate expanded thermal plasma apparatus and method
SG149680A1 (en) Film formation apparatus and film formation method and cleaning method
WO2005103321A3 (en) Ionized physical vapor deposition (ipvd) process
EP1067578A3 (en) Methods and apparatus for ionized metal plasma copper deposition with enhanced in-film particle performance
WO2003095702A3 (en) Method for curing low dielectric constant film by electron beam
TW200505280A (en) Manufacturing method and manufacturing apparatus of organic thin film
AU2001283323A1 (en) Field emission devices having carbon containing tips
EP0844313A3 (en) Method and apparatus for sputtering in a chamber having an inductively coupled plasma
US20050136656A1 (en) Process for depositing composite coating on a surface
WO2008009619A9 (en) Method for depositing electrically insulating layers
KR970003431A (en) Continuous method for forming an improved titanium nitride containing barrier layer
JPH09170080A (en) Apparatus for coating substrate
CA2145570A1 (en) Magnetron atomization source and method of use thereof
RU2002119440A (en) A method of producing carbon nanotubes
CN217230943U (en) Coating equipment
JP2002105618A (en) Surface structure for vacuum treatment chamber
JP2002500278A5 (en)
EP1681367A4 (en) Film-forming apparatus and film-forming method
JPS5457477A (en) Throw away tip of coated tool steel
JP2007510311A5 (en)
RU97112300A (en) METHOD FOR FORMING WEAR-RESISTANT COATING ON THE SURFACE OF PRODUCTS FROM STRUCTURAL STEEL
JPH05275050A (en) Sputter ion pump
JP2007186772A (en) Film-forming method by gas-flow sputtering
RU2003135833A (en) METHOD FOR APPLICATION OF COMPOSITE COATINGS IN VACUUM

Legal Events

Date Code Title Description
MM4A The patent is invalid due to non-payment of fees

Effective date: 20090718