PT3761348T - Sistema para transportar um substrato entre estações de processamento de um aparelho de processamento, aparelho de processamento e métodos de manusear um substrato - Google Patents
Sistema para transportar um substrato entre estações de processamento de um aparelho de processamento, aparelho de processamento e métodos de manusear um substratoInfo
- Publication number
- PT3761348T PT3761348T PT191847219T PT19184721T PT3761348T PT 3761348 T PT3761348 T PT 3761348T PT 191847219 T PT191847219 T PT 191847219T PT 19184721 T PT19184721 T PT 19184721T PT 3761348 T PT3761348 T PT 3761348T
- Authority
- PT
- Portugal
- Prior art keywords
- substrate
- processing apparatus
- processing
- conveying
- handling
- Prior art date
Links
- 239000000758 substrate Substances 0.000 title 2
- 238000000034 method Methods 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67063—Apparatus for fluid treatment for etching
- H01L21/67075—Apparatus for fluid treatment for etching for wet etching
- H01L21/67086—Apparatus for fluid treatment for etching for wet etching with the semiconductor substrates being dipped in baths or vessels
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/67757—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber vertical transfer of a batch of workpieces
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP19184721.9A EP3761348B1 (en) | 2019-07-05 | 2019-07-05 | System for conveying a substrate between processing stations of a processing apparatus, processing apparatus and methods of handling a substrate |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| PT3761348T true PT3761348T (pt) | 2024-07-02 |
Family
ID=67437605
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PT191847219T PT3761348T (pt) | 2019-07-05 | 2019-07-05 | Sistema para transportar um substrato entre estações de processamento de um aparelho de processamento, aparelho de processamento e métodos de manusear um substrato |
Country Status (2)
| Country | Link |
|---|---|
| EP (1) | EP3761348B1 (pt) |
| PT (1) | PT3761348T (pt) |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6077886B2 (ja) * | 2013-03-04 | 2017-02-08 | 株式会社荏原製作所 | めっき装置 |
| US9388504B2 (en) * | 2013-03-26 | 2016-07-12 | Ebara Corporation | Plating apparatus and plating method |
| TW201502315A (zh) * | 2013-07-10 | 2015-01-16 | Ebara Corp | 濕式處理裝置及鍍覆裝置 |
| EP3176288A1 (en) | 2015-12-03 | 2017-06-07 | ATOTECH Deutschland GmbH | Method for galvanic metal deposition |
| JP6878056B2 (ja) * | 2017-03-14 | 2021-05-26 | 株式会社荏原製作所 | めっき方法 |
-
2019
- 2019-07-05 EP EP19184721.9A patent/EP3761348B1/en active Active
- 2019-07-05 PT PT191847219T patent/PT3761348T/pt unknown
Also Published As
| Publication number | Publication date |
|---|---|
| EP3761348B1 (en) | 2024-03-27 |
| EP3761348A1 (en) | 2021-01-06 |
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