PL4298417T3 - Wbudowany układ do pomiaru próżni szczątkowej i sposób diagnozowania próżni wtórnej na linii do osadzania cienkich warstw - Google Patents

Wbudowany układ do pomiaru próżni szczątkowej i sposób diagnozowania próżni wtórnej na linii do osadzania cienkich warstw

Info

Publication number
PL4298417T3
PL4298417T3 PL22707439.0T PL22707439T PL4298417T3 PL 4298417 T3 PL4298417 T3 PL 4298417T3 PL 22707439 T PL22707439 T PL 22707439T PL 4298417 T3 PL4298417 T3 PL 4298417T3
Authority
PL
Poland
Prior art keywords
thin
measuring
film deposition
board system
deposition line
Prior art date
Application number
PL22707439.0T
Other languages
English (en)
Inventor
Andriy Kharchenko
Original Assignee
Saint-Gobain Glass France
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Saint-Gobain Glass France filed Critical Saint-Gobain Glass France
Publication of PL4298417T3 publication Critical patent/PL4298417T3/pl

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
    • G01L21/00—Vacuum gauges
    • G01L21/30—Vacuum gauges by making use of ionisation effects
    • G01L21/34—Vacuum gauges by making use of ionisation effects using electric discharge tubes with cold cathodes
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/568—Transferring the substrates through a series of coating stations
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J41/00—Discharge tubes for measuring pressure of introduced gas or for detecting presence of gas; Discharge tubes for evacuation by diffusion of ions
    • H01J41/02—Discharge tubes for measuring pressure of introduced gas or for detecting presence of gas
    • H01J41/06—Discharge tubes for measuring pressure of introduced gas or for detecting presence of gas with ionisation by means of cold cathodes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Measuring Fluid Pressure (AREA)
PL22707439.0T 2021-02-25 2022-02-23 Wbudowany układ do pomiaru próżni szczątkowej i sposób diagnozowania próżni wtórnej na linii do osadzania cienkich warstw PL4298417T3 (pl)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR2101859A FR3120125B1 (fr) 2021-02-25 2021-02-25 Dispositif de mesure de pression vide secondaire et système embarqué pour mesure de pression de vide résiduel
PCT/EP2022/054505 WO2022180085A1 (fr) 2021-02-25 2022-02-23 Dispositif de mesure de pression vide secondaire et système embarqué pour mesure de pression de vide résiduel

Publications (1)

Publication Number Publication Date
PL4298417T3 true PL4298417T3 (pl) 2025-10-06

Family

ID=75539557

Family Applications (1)

Application Number Title Priority Date Filing Date
PL22707439.0T PL4298417T3 (pl) 2021-02-25 2022-02-23 Wbudowany układ do pomiaru próżni szczątkowej i sposób diagnozowania próżni wtórnej na linii do osadzania cienkich warstw

Country Status (7)

Country Link
EP (1) EP4298417B1 (pl)
CN (1) CN116940820A (pl)
CO (1) CO2023010992A2 (pl)
FR (1) FR3120125B1 (pl)
MX (1) MX2023009944A (pl)
PL (1) PL4298417T3 (pl)
WO (1) WO2022180085A1 (pl)

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL49158C (pl) 1936-05-29
US2643342A (en) * 1947-01-17 1953-06-23 Atomic Energy Commission Ionization gauge
FR1485659A (fr) 1966-05-09 1967-06-23 Alcatel Sa Manomètre à cathode froide à plasmas multiples
US4166018A (en) 1974-01-31 1979-08-28 Airco, Inc. Sputtering process and apparatus
US4009090A (en) 1975-12-03 1977-02-22 Shatterproof Glass Corporation Sputter-coating of glass sheets or other substrates
CZ278295B6 (en) * 1989-08-14 1993-11-17 Fyzikalni Ustav Avcr Process of sputtering layers and apparatus for making the same
EP0822996B1 (en) 1995-04-25 2003-07-02 VON ARDENNE ANLAGENTECHNIK GmbH Sputtering system using cylindrical rotating magnetron electrically powered using alternating current
AU2002230639A1 (en) 2000-11-09 2002-05-21 Viratec Thin Films, Inc. Alternating current rotatable sputter cathode
DE102004020466A1 (de) 2004-04-26 2005-11-17 Applied Films Gmbh & Co. Kg Verfahren zum Beschichten von Substraten in Inline-Anlagen
FR3074906B1 (fr) * 2017-12-07 2024-01-19 Saint Gobain Procede et dispositif de determination automatique de valeurs d'ajustement de parametres de fonctionnement d'une ligne de depot

Also Published As

Publication number Publication date
EP4298417A1 (fr) 2024-01-03
EP4298417C0 (fr) 2025-07-30
WO2022180085A1 (fr) 2022-09-01
EP4298417B1 (fr) 2025-07-30
FR3120125B1 (fr) 2023-09-08
MX2023009944A (es) 2023-09-07
CO2023010992A2 (es) 2023-11-20
CN116940820A (zh) 2023-10-24
FR3120125A1 (fr) 2022-08-26

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