AU2002230639A1 - Alternating current rotatable sputter cathode - Google Patents

Alternating current rotatable sputter cathode

Info

Publication number
AU2002230639A1
AU2002230639A1 AU2002230639A AU3063902A AU2002230639A1 AU 2002230639 A1 AU2002230639 A1 AU 2002230639A1 AU 2002230639 A AU2002230639 A AU 2002230639A AU 3063902 A AU3063902 A AU 3063902A AU 2002230639 A1 AU2002230639 A1 AU 2002230639A1
Authority
AU
Australia
Prior art keywords
alternating current
sputter cathode
rotatable sputter
current rotatable
cathode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2002230639A
Inventor
Daniel T. Crowley
John R. German
Brian P. Meinke
Roger L. Peterson
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Viratec Thin Films Inc
Original Assignee
Viratec Thin Films Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US09/881,555 external-priority patent/US20020189939A1/en
Application filed by Viratec Thin Films Inc filed Critical Viratec Thin Films Inc
Publication of AU2002230639A1 publication Critical patent/AU2002230639A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32577—Electrical connecting means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H01J37/3405—Magnetron sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/16—Vessels
    • H01J2237/166—Sealing means
AU2002230639A 2000-11-09 2001-11-08 Alternating current rotatable sputter cathode Abandoned AU2002230639A1 (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US71041800A 2000-11-09 2000-11-09
US09/710,418 2000-11-09
US09/881,555 2001-06-14
US09/881,555 US20020189939A1 (en) 2001-06-14 2001-06-14 Alternating current rotatable sputter cathode
PCT/US2001/046829 WO2002038826A1 (en) 2000-11-09 2001-11-08 Alternating current rotatable sputter cathode

Publications (1)

Publication Number Publication Date
AU2002230639A1 true AU2002230639A1 (en) 2002-05-21

Family

ID=27108444

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2002230639A Abandoned AU2002230639A1 (en) 2000-11-09 2001-11-08 Alternating current rotatable sputter cathode

Country Status (2)

Country Link
AU (1) AU2002230639A1 (en)
WO (1) WO2002038826A1 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060049043A1 (en) * 2004-08-17 2006-03-09 Matuska Neal W Magnetron assembly
SI1799876T1 (en) 2004-10-18 2009-06-30 Bekaert Advanced Coatings Flat end-block for carrying a rotatable sputtering target
DE102007049735B4 (en) * 2006-10-17 2012-03-29 Von Ardenne Anlagentechnik Gmbh Supply end block for a tubular magnetron
FR3120125B1 (en) 2021-02-25 2023-09-08 Saint Gobain Secondary vacuum pressure measuring device and on-board system for residual vacuum pressure measurement

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1601427A (en) * 1977-06-20 1981-10-28 Siemens Ag Deposition of a layer of electrically-conductive material on a graphite body
US5047131A (en) * 1989-11-08 1991-09-10 The Boc Group, Inc. Method for coating substrates with silicon based compounds
EP0822996B1 (en) * 1995-04-25 2003-07-02 VON ARDENNE ANLAGENTECHNIK GmbH Sputtering system using cylindrical rotating magnetron electrically powered using alternating current

Also Published As

Publication number Publication date
WO2002038826A9 (en) 2003-04-17
WO2002038826A1 (en) 2002-05-16

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