PL425253A1 - Method for producing carbon nanolayers on surfaces at the time of micro-smoothing them with abrasive films - Google Patents

Method for producing carbon nanolayers on surfaces at the time of micro-smoothing them with abrasive films

Info

Publication number
PL425253A1
PL425253A1 PL425253A PL42525318A PL425253A1 PL 425253 A1 PL425253 A1 PL 425253A1 PL 425253 A PL425253 A PL 425253A PL 42525318 A PL42525318 A PL 42525318A PL 425253 A1 PL425253 A1 PL 425253A1
Authority
PL
Poland
Prior art keywords
smoothing
micro
producing carbon
time
abrasive films
Prior art date
Application number
PL425253A
Other languages
Polish (pl)
Other versions
PL240472B1 (en
Inventor
Wojciech Kacalak
Katarzyna Tandecka
Błażej Bałasz
Krzysztof Rokosz
Original Assignee
Politechnika Koszalińska
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Politechnika Koszalińska filed Critical Politechnika Koszalińska
Priority to PL425253A priority Critical patent/PL240472B1/en
Publication of PL425253A1 publication Critical patent/PL425253A1/en
Publication of PL240472B1 publication Critical patent/PL240472B1/en

Links

Landscapes

  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Carbon And Carbon Compounds (AREA)

Abstract

Sposób wytwarzania nanowarstw węglowych o grubości 10 - 50 nanometrów wytwarzanych w procesie mikrowygładzania powierzchni z zastosowaniem diamentowych folii ściernych (2) o wymiarach ziaren 0,5 - 3 µm.The method of producing carbon nanolayers with a thickness of 10 - 50 nanometers, produced in the process of surface micro-smoothing with the use of diamond abrasive films (2) with grain sizes of 0.5 - 3 µm.

PL425253A 2018-04-17 2018-04-17 Method for producing carbon nanolayers on surfaces at the time of micro-smoothing them with abrasive films PL240472B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
PL425253A PL240472B1 (en) 2018-04-17 2018-04-17 Method for producing carbon nanolayers on surfaces at the time of micro-smoothing them with abrasive films

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PL425253A PL240472B1 (en) 2018-04-17 2018-04-17 Method for producing carbon nanolayers on surfaces at the time of micro-smoothing them with abrasive films

Publications (2)

Publication Number Publication Date
PL425253A1 true PL425253A1 (en) 2019-10-21
PL240472B1 PL240472B1 (en) 2022-04-11

Family

ID=68238644

Family Applications (1)

Application Number Title Priority Date Filing Date
PL425253A PL240472B1 (en) 2018-04-17 2018-04-17 Method for producing carbon nanolayers on surfaces at the time of micro-smoothing them with abrasive films

Country Status (1)

Country Link
PL (1) PL240472B1 (en)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5702811A (en) * 1995-10-20 1997-12-30 Ho; Kwok-Lun High performance abrasive articles containing abrasive grains and nonabrasive composite grains
US20020003664A1 (en) * 2000-05-25 2002-01-10 Atomic Telecom Optical filter construction by atomic layer control for next generation dense wavelength division multiplexer
US20050032469A1 (en) * 2003-04-16 2005-02-10 Duescher Wayne O. Raised island abrasive, lapping apparatus and method of use
US20100003904A1 (en) * 2000-11-17 2010-01-07 Duescher Wayne O High speed flat lapping platen, raised islands and abrasive beads
US20100107509A1 (en) * 2008-11-04 2010-05-06 Guiselin Olivier L Coated abrasive article for polishing or lapping applications and system and method for producing the same.

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5702811A (en) * 1995-10-20 1997-12-30 Ho; Kwok-Lun High performance abrasive articles containing abrasive grains and nonabrasive composite grains
US20020003664A1 (en) * 2000-05-25 2002-01-10 Atomic Telecom Optical filter construction by atomic layer control for next generation dense wavelength division multiplexer
US20100003904A1 (en) * 2000-11-17 2010-01-07 Duescher Wayne O High speed flat lapping platen, raised islands and abrasive beads
US20050032469A1 (en) * 2003-04-16 2005-02-10 Duescher Wayne O. Raised island abrasive, lapping apparatus and method of use
US20100107509A1 (en) * 2008-11-04 2010-05-06 Guiselin Olivier L Coated abrasive article for polishing or lapping applications and system and method for producing the same.

Also Published As

Publication number Publication date
PL240472B1 (en) 2022-04-11

Similar Documents

Publication Publication Date Title
TW201614811A (en) Nanocrystalline diamond carbon film for 3D NAND hardmask application
PH12017500284A1 (en) Protective coating-forming sheet and method for manufacturing semiconductor chip provided with protective coating
BRPI0604244A (en) method of forming a workpiece, shaped article, and apparatus for processing a workpiece
DE502005003522D1 (en) Block piece for holding an optical workpiece, in particular a spectacle lens, for its processing
MX2016003928A (en) Flexible abrasive article and method of using the same.
SG11201806511XA (en) Device and method for bonding substrates
MX2009010035A (en) Abrasive articles, rotationally reciprocating tools, and methods.
EP3151064A3 (en) Euv pellicle film and manufacturing method thereof
MX2009010119A (en) Methods of removing defects in surfaces.
HK1073516A1 (en) Abrasive articles and methods for the manufacture and use of same
DE502005005570D1 (en) DEVICE FOR GRINDING HARD SURFACES, IN PARTICULAR GLASS SURFACES
ATE490053T1 (en) METHOD FOR RELEASING LENSES
EP3848328C0 (en) Carbon nanotube oriented thin film, manufacturing method therefor and application thereof
GB201814192D0 (en) A semiconductor on diamond substrate, percursor for use in preparing a semiconductor on diamond substrate, and methods of making the same
WO2015186076A3 (en) Abrasive tool for machining surfaces
EP3517656A3 (en) Method and device for plating a recess in a substrate
SG10201806123RA (en) Method of manufacturing substrate for acoustic wave device
TW200640639A (en) Method of making a structured surface article
PL425253A1 (en) Method for producing carbon nanolayers on surfaces at the time of micro-smoothing them with abrasive films
DE602004031609D1 (en) S A HYDROGENATED AMORPHOUS CARBON, AND METHOD FOR SEPARATING SUCH A COATING
ATE507932T1 (en) METHOD FOR SATIN FINISHING A HARD MATERIAL
MX2018003931A (en) Drywall sanding block and method of using.
MX2020009963A (en) Photocurable compositions and method of forming topographical features on a membrane surface using photocurable compositions.
TW200629392A (en) Flattening method and flattening apparatus
SG11201809596PA (en) Film structure and method for manufacturing the same