PL2666544T3 - Proces osadzania i charakterystyka powłoki - Google Patents
Proces osadzania i charakterystyka powłokiInfo
- Publication number
- PL2666544T3 PL2666544T3 PL12198840T PL12198840T PL2666544T3 PL 2666544 T3 PL2666544 T3 PL 2666544T3 PL 12198840 T PL12198840 T PL 12198840T PL 12198840 T PL12198840 T PL 12198840T PL 2666544 T3 PL2666544 T3 PL 2666544T3
- Authority
- PL
- Poland
- Prior art keywords
- characterization
- deposition
- coating
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/62—Plasma-deposition of organic layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
- B05D7/02—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials to macromolecular substances, e.g. rubber
- B05D7/04—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials to macromolecular substances, e.g. rubber to surfaces of films or sheets
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/006—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterized by the colour of the layer
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
- C23C16/4486—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by producing an aerosol and subsequent evaporation of the droplets or particles
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/52—Controlling or regulating the coating process
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/54—Apparatus specially adapted for continuous coating
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32917—Plasma diagnostics
- H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32917—Plasma diagnostics
- H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
- H01J37/32972—Spectral analysis
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D2252/00—Sheets
- B05D2252/02—Sheets of indefinite length
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D5/00—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
- B05D5/06—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures to obtain multicolour or other optical effects
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Analytical Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Inorganic Chemistry (AREA)
- Dispersion Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Wood Science & Technology (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
- Laminated Bodies (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP12169317 | 2012-05-24 | ||
EP12198840.6A EP2666544B1 (en) | 2012-05-24 | 2012-12-21 | Process for deposition and characterization of a coating |
Publications (1)
Publication Number | Publication Date |
---|---|
PL2666544T3 true PL2666544T3 (pl) | 2018-03-30 |
Family
ID=47563089
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PL12198840T PL2666544T3 (pl) | 2012-05-24 | 2012-12-21 | Proces osadzania i charakterystyka powłoki |
Country Status (4)
Country | Link |
---|---|
US (1) | US8927052B2 (pl) |
EP (1) | EP2666544B1 (pl) |
DK (1) | DK2666544T3 (pl) |
PL (1) | PL2666544T3 (pl) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2010146438A1 (en) | 2009-06-16 | 2010-12-23 | Plasmedica Technologies Limited | Wound healing device |
US20140370251A1 (en) * | 2013-06-18 | 2014-12-18 | Junius, LLC | Flame Retardant Identification System |
EP2960358A1 (en) * | 2014-06-25 | 2015-12-30 | Nederlandse Organisatie voor toegepast- natuurwetenschappelijk onderzoek TNO | Plasma source and surface treatment method |
US9859088B2 (en) * | 2015-04-30 | 2018-01-02 | Lam Research Corporation | Inter-electrode gap variation methods for compensating deposition non-uniformity |
US9702689B2 (en) * | 2015-06-18 | 2017-07-11 | Xerox Corporation | Use of a full width array imaging sensor to measure real time film thicknesses on film manufacturing equipment |
DE102015213975A1 (de) * | 2015-07-23 | 2017-01-26 | Terraplasma Gmbh | Elektrodenanordnung und Plasmaquelle zur Erzeugung eines nicht-thermischen Plasmas sowie ein Verfahren zum Betreiben einer Plasmaquelle |
JP6974353B2 (ja) * | 2016-02-01 | 2021-12-01 | セラデップ テクノロジーズ インコーポレイテッド | 治療薬を送達するシステム及び方法 |
EP3336141B1 (en) | 2016-12-19 | 2019-08-14 | The Goodyear Tire & Rubber Company | Atmospheric plasma treatment of reinforcement cords and use in rubber articles |
EP3336140B1 (en) | 2016-12-19 | 2019-07-24 | The Goodyear Tire & Rubber Company | Atmospheric plasma treatment of reinforcement cords and use in rubber articles |
EP3568689A1 (en) * | 2017-01-10 | 2019-11-20 | Sun Chemical Corporation | In-line coating weight and radiant energy exposure measurement |
US11690998B2 (en) | 2017-10-31 | 2023-07-04 | Theradep Technologies, Inc. | Methods of treating bacterial infections |
FR3091875B1 (fr) * | 2019-01-17 | 2021-09-24 | Innovative Systems Et Tech Isytech | Procédé et dispositif de traitement pour le dépôt d’un revêtement à effet barrière |
US11543354B2 (en) | 2019-04-15 | 2023-01-03 | Tarkett Usa Inc. | Quantitative detection of non-fluorine anti-soil using a fluorescent trace indicator |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5270116A (en) | 1986-07-10 | 1993-12-14 | Minnesota Mining And Manufacturing Company | Process for fluorimetric monitoring of functional coatings and compositions and fluorescent agents therefor |
FI894010A (fi) * | 1989-08-25 | 1991-02-26 | Micronas Oy | Foerfarande foer kontrollering av en tillvaextprocess foer en med fosfor dopad kiseldioxidfilm. |
CA2039396A1 (en) * | 1990-03-30 | 1991-10-01 | William F. Beach | Process for the creation of selective fluorescent sites or regions in parylene films and coatings |
DE10306357B4 (de) * | 2003-02-15 | 2006-01-12 | Basf Coatings Ag | Verfahren zur Herstellung einer Mehrschichtbeschichtung und dessen Verwendung |
US7271894B2 (en) * | 2003-10-01 | 2007-09-18 | General Electric Company | Imaging system for robotically inspecting gas turbine combustion components |
EP1582270A1 (en) | 2004-03-31 | 2005-10-05 | Vlaamse Instelling voor Technologisch Onderzoek | Method and apparatus for coating a substrate using dielectric barrier discharge |
EP1643005A3 (de) | 2004-09-01 | 2008-03-19 | EMPA Eidgenössische Materialprüfungs- und Forschungsanstalt | Abscheiden von organischen und/oder anorganischen Nanoschichten mittels Plasmaentladung |
EP1785198A1 (en) * | 2005-11-14 | 2007-05-16 | Vlaamse Instelling voor Technologisch Onderzoek | A method for atmospheric plasma deposition of conjugated polymer coatings |
JP5016831B2 (ja) * | 2006-03-17 | 2012-09-05 | キヤノン株式会社 | 酸化物半導体薄膜トランジスタを用いた発光素子及びこれを用いた画像表示装置 |
WO2008079322A1 (en) * | 2006-12-22 | 2008-07-03 | Beckman Coulter, Inc. | Methods, kits and materials for diagnosing disease states by measuring isoforms or proforms of myeloperoxidase |
WO2009037331A1 (en) | 2007-09-19 | 2009-03-26 | Vlaamse Instelling Voor Technologisch Onderzoek (Vito) | A method for stable hydrophilicity enhancement of a substrate by atmospheric pressure plasma deposition |
US20090162644A1 (en) | 2007-12-19 | 2009-06-25 | Ricks Michele L | Organic element for low voltage electroluminescent devices |
US20090162561A1 (en) | 2007-12-19 | 2009-06-25 | Glen Harold Kirby | Methods for making barrier coatings comprising taggants and components having the same |
US20090162533A1 (en) * | 2007-12-19 | 2009-06-25 | Glen Harold Kirby | Methods allowing for improved inspection of components having a barrier coating |
EP2590802B1 (en) | 2010-07-09 | 2014-07-02 | Vito NV | Method and device for atmospheric pressure plasma treatment |
DE102011007349B4 (de) * | 2011-04-14 | 2013-03-28 | Innovent E.V. | Verfahren zur Kennzeichnung eines Substrates |
-
2012
- 2012-12-21 DK DK12198840.6T patent/DK2666544T3/en active
- 2012-12-21 EP EP12198840.6A patent/EP2666544B1/en active Active
- 2012-12-21 PL PL12198840T patent/PL2666544T3/pl unknown
-
2013
- 2013-05-24 US US13/902,064 patent/US8927052B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
EP2666544B1 (en) | 2017-11-01 |
EP2666544A1 (en) | 2013-11-27 |
US8927052B2 (en) | 2015-01-06 |
US20130313480A1 (en) | 2013-11-28 |
DK2666544T3 (en) | 2018-01-02 |
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