PL2879999T3 - Sposób osadzania powłoki z zastosowaniem aparatu do powlekania - Google Patents

Sposób osadzania powłoki z zastosowaniem aparatu do powlekania

Info

Publication number
PL2879999T3
PL2879999T3 PL13742040T PL13742040T PL2879999T3 PL 2879999 T3 PL2879999 T3 PL 2879999T3 PL 13742040 T PL13742040 T PL 13742040T PL 13742040 T PL13742040 T PL 13742040T PL 2879999 T3 PL2879999 T3 PL 2879999T3
Authority
PL
Poland
Prior art keywords
coating
depositing
utilizing
coating apparatus
coating utilizing
Prior art date
Application number
PL13742040T
Other languages
English (en)
Inventor
Michael Martin RADTKE
Steven Edward PHILLIPS
Original Assignee
Pilkington Group Limited
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Pilkington Group Limited filed Critical Pilkington Group Limited
Publication of PL2879999T3 publication Critical patent/PL2879999T3/pl

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23—Oxides
    • C03C17/245—Oxides by deposition from the vapour phase
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/401—Oxides containing silicon
    • C23C16/402—Silicon dioxide
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/213—SiO2
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase
    • C03C2218/152—Deposition methods from the vapour phase by cvd

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Inorganic Chemistry (AREA)
  • Surface Treatment Of Glass (AREA)
  • Chemical Vapour Deposition (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
PL13742040T 2012-07-30 2013-07-16 Sposób osadzania powłoki z zastosowaniem aparatu do powlekania PL2879999T3 (pl)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201261677277P 2012-07-30 2012-07-30
PCT/GB2013/051899 WO2014020310A2 (en) 2012-07-30 2013-07-16 A method of depositing a coating utilizing a coating apparatus
EP13742040.2A EP2879999B1 (en) 2012-07-30 2013-07-16 A method of depositing a coating utilizing a coating apparatus

Publications (1)

Publication Number Publication Date
PL2879999T3 true PL2879999T3 (pl) 2020-01-31

Family

ID=48875696

Family Applications (1)

Application Number Title Priority Date Filing Date
PL13742040T PL2879999T3 (pl) 2012-07-30 2013-07-16 Sposób osadzania powłoki z zastosowaniem aparatu do powlekania

Country Status (4)

Country Link
US (2) US20160016847A1 (pl)
EP (1) EP2879999B1 (pl)
PL (1) PL2879999T3 (pl)
WO (1) WO2014020310A2 (pl)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN116096592B (zh) 2020-09-04 2025-04-01 Ａｇｃ株式会社 玻璃物品

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4922853A (en) 1989-05-16 1990-05-08 Libbey-Owens-Ford Co. Stripe coating on glass by chemical vapor deposition
US6022414A (en) * 1994-07-18 2000-02-08 Semiconductor Equipment Group, Llc Single body injector and method for delivering gases to a surface
CA2159296C (en) * 1994-10-14 2007-01-30 Michel J. Soubeyrand Glass coating method and glass coated thereby
GB9616983D0 (en) * 1996-08-13 1996-09-25 Pilkington Plc Method for depositing tin oxide and titanium oxide coatings on flat glass and the resulting coated glass
US6857433B2 (en) 2002-07-22 2005-02-22 Air Products And Chemicals, Inc. Process for cleaning a glass-coating reactor using a reactive gas
US9404179B2 (en) * 2012-02-23 2016-08-02 Pilkington Group Limited Chemical vapor deposition process for depositing a silica coating on a glass substrate

Also Published As

Publication number Publication date
EP2879999A2 (en) 2015-06-10
US20160016847A1 (en) 2016-01-21
WO2014020310A2 (en) 2014-02-06
US20210101827A1 (en) 2021-04-08
WO2014020310A3 (en) 2014-10-02
US11820700B2 (en) 2023-11-21
EP2879999B1 (en) 2019-09-11

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