PL2453226T3 - System i sposób obrazowania promieniowaniem rentgenowskim w ciemnym polu - Google Patents

System i sposób obrazowania promieniowaniem rentgenowskim w ciemnym polu

Info

Publication number
PL2453226T3
PL2453226T3 PL10796655T PL10796655T PL2453226T3 PL 2453226 T3 PL2453226 T3 PL 2453226T3 PL 10796655 T PL10796655 T PL 10796655T PL 10796655 T PL10796655 T PL 10796655T PL 2453226 T3 PL2453226 T3 PL 2453226T3
Authority
PL
Poland
Prior art keywords
imaging system
field imaging
ray dark
dark
ray
Prior art date
Application number
PL10796655T
Other languages
English (en)
Inventor
Zhifeng Huang
Zhiqiang Chen
Li Zhang
Zhentian Wang
Yuxiang Xing
Ziran Zhao
Yongshun Xiao
Original Assignee
Tsinghua University
Nuctech Company Limited
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tsinghua University, Nuctech Company Limited filed Critical Tsinghua University
Publication of PL2453226T3 publication Critical patent/PL2453226T3/pl

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/02—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material
    • G01N23/04—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material and forming images of the material
    • G01N23/041—Phase-contrast imaging, e.g. using grating interferometers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G01N23/20075—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials by measuring interferences of X-rays, e.g. Borrmann effect
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/061—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements characterised by a multilayer structure
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2207/00—Particular details of imaging devices or methods using ionizing electromagnetic radiation such as X-rays or gamma rays
    • G21K2207/005—Methods and devices obtaining contrast from non-absorbing interaction of the radiation with matter, e.g. phase contrast

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analytical Chemistry (AREA)
  • Nanotechnology (AREA)
  • Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Radiology & Medical Imaging (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
PL10796655T 2009-07-07 2010-07-06 System i sposób obrazowania promieniowaniem rentgenowskim w ciemnym polu PL2453226T3 (pl)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN2009100886628A CN101943668B (zh) 2009-07-07 2009-07-07 X射线暗场成像系统和方法
EP10796655.8A EP2453226B1 (en) 2009-07-07 2010-07-06 X-ray dark-field imaging system and method

Publications (1)

Publication Number Publication Date
PL2453226T3 true PL2453226T3 (pl) 2017-06-30

Family

ID=43428751

Family Applications (1)

Application Number Title Priority Date Filing Date
PL10796655T PL2453226T3 (pl) 2009-07-07 2010-07-06 System i sposób obrazowania promieniowaniem rentgenowskim w ciemnym polu

Country Status (5)

Country Link
US (1) US8515002B2 (pl)
EP (1) EP2453226B1 (pl)
CN (1) CN101943668B (pl)
PL (1) PL2453226T3 (pl)
WO (1) WO2011003278A1 (pl)

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JP2015166676A (ja) * 2014-03-03 2015-09-24 キヤノン株式会社 Ｘ線撮像システム
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CN105606633B (zh) 2014-11-04 2019-03-19 清华大学 X射线相衬成像系统与成像方法
CN105628718A (zh) 2014-11-04 2016-06-01 同方威视技术股份有限公司 多能谱x射线光栅成像系统与成像方法
JP6451400B2 (ja) * 2015-02-26 2019-01-16 コニカミノルタ株式会社 画像処理システム及び画像処理装置
CN106153646B (zh) 2015-04-08 2022-06-24 清华大学 X射线成像系统和方法
US11116465B2 (en) 2015-09-16 2021-09-14 Koninklijke Philips N.V. Dark-field enhanced virtual x-ray colonoscopy
JP6613988B2 (ja) * 2016-03-30 2019-12-04 コニカミノルタ株式会社 放射線撮影システム
CN105852895B (zh) * 2016-04-29 2018-07-31 合肥工业大学 单次曝光的硬x射线光栅干涉仪的信息提取方法
CN107481914B (zh) * 2016-06-08 2023-06-06 清华大学 一种透射型低能量电子显微系统
CN107473179B (zh) * 2016-06-08 2019-04-23 清华大学 一种表征二维纳米材料的方法
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CN110049725B (zh) * 2016-11-22 2023-03-28 株式会社岛津制作所 X射线相位成像装置
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JP6753342B2 (ja) * 2017-03-15 2020-09-09 株式会社島津製作所 放射線格子検出器およびｘ線検査装置
JP6844461B2 (ja) * 2017-07-20 2021-03-17 株式会社島津製作所 Ｘ線位相イメージング装置および情報取得手法
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JP6943090B2 (ja) * 2017-09-05 2021-09-29 株式会社島津製作所 Ｘ線イメージング装置
CN107607560B (zh) * 2017-09-22 2021-06-25 上海联影医疗科技股份有限公司 一种光学相位衬度成像系统、方法及计算机可读媒质
WO2019087605A1 (ja) * 2017-10-31 2019-05-09 株式会社島津製作所 Ｘ線位相差撮像システム
EP3494885A1 (en) * 2017-12-07 2019-06-12 Koninklijke Philips N.V. Apparatus for presentation of dark field x-ray image information
EP3496109A1 (en) * 2017-12-08 2019-06-12 Koninklijke Philips N.V. Oscillatory dark-field imaging
CN108169258A (zh) * 2017-12-14 2018-06-15 上海海洋大学 一种用于含骨鱼肉片的检测器移动型检测设备及方法
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CN108680589B (zh) * 2018-05-31 2021-07-16 北京航空航天大学 基于横向错位光栅的三维锥束计算机层析成像方法及装置
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EP3603515A1 (en) * 2018-08-01 2020-02-05 Koninklijke Philips N.V. Apparatus for generating x-ray imaging data
CN113171116A (zh) * 2021-01-18 2021-07-27 深圳市第二人民医院(深圳市转化医学研究院) 一种用于检测软组织异物的多模态x射线成像设备及其方法
CN113866195B (zh) * 2021-11-23 2023-07-18 合肥工业大学 一种x射线光栅干涉仪成像的多衬度信号提取方法
CN115412689B (zh) * 2022-07-26 2023-04-25 瀚湄信息科技(上海)有限公司 一种基于动态标定的暗场噪音处理方法、装置和电子设备

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Also Published As

Publication number Publication date
EP2453226A1 (en) 2012-05-16
US20110293064A1 (en) 2011-12-01
EP2453226B1 (en) 2016-10-26
CN101943668B (zh) 2013-03-27
WO2011003278A1 (zh) 2011-01-13
EP2453226A4 (en) 2014-10-29
US8515002B2 (en) 2013-08-20
CN101943668A (zh) 2011-01-12

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