PL2103574T3 - Osadzanie ze spalaniem przy użyciu roztworów wodnych prekursorów do osadzania powłok z dwutlenku tytanu - Google Patents

Osadzanie ze spalaniem przy użyciu roztworów wodnych prekursorów do osadzania powłok z dwutlenku tytanu

Info

Publication number
PL2103574T3
PL2103574T3 PL08017397T PL08017397T PL2103574T3 PL 2103574 T3 PL2103574 T3 PL 2103574T3 PL 08017397 T PL08017397 T PL 08017397T PL 08017397 T PL08017397 T PL 08017397T PL 2103574 T3 PL2103574 T3 PL 2103574T3
Authority
PL
Poland
Prior art keywords
titanium dioxide
precursor solutions
aqueous precursor
deposit titanium
dioxide coatings
Prior art date
Application number
PL08017397T
Other languages
English (en)
Other versions
PL2103574T5 (pl
Inventor
Michael P Remington
Original Assignee
Guardian Glass Llc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=40588324&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=PL2103574(T3) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Guardian Glass Llc filed Critical Guardian Glass Llc
Publication of PL2103574T3 publication Critical patent/PL2103574T3/pl
Publication of PL2103574T5 publication Critical patent/PL2103574T5/pl

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/453—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating passing the reaction gases through burners or torches, e.g. atmospheric pressure CVD
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23—Oxides
    • C03C17/245—Oxides by deposition from the vapour phase
    • C03C17/2456—Coating containing TiO2
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
    • C03C17/3417—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials all coatings being oxide coatings
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/405—Oxides of refractory metals or yttrium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/212—TiO2
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/70—Properties of coatings
    • C03C2217/73—Anti-reflective coatings with specific characteristics
    • C03C2217/734—Anti-reflective coatings with specific characteristics comprising an alternation of high and low refractive indexes
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Surface Treatment Of Glass (AREA)
  • Chemical Vapour Deposition (AREA)
  • Catalysts (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
PL08017397T 2007-11-05 2008-10-02 Osadzanie ze spalaniem przy użyciu roztworów wodnych prekursorów do osadzania powłok z dwutlenku tytanu PL2103574T5 (pl)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/979,543 US7655274B2 (en) 2007-11-05 2007-11-05 Combustion deposition using aqueous precursor solutions to deposit titanium dioxide coatings
EP08017397.4A EP2103574B2 (en) 2007-11-05 2008-10-02 Combustion deposition using aqueous precursor solutions to deposit titanium dioxide coatings

Publications (2)

Publication Number Publication Date
PL2103574T3 true PL2103574T3 (pl) 2012-01-31
PL2103574T5 PL2103574T5 (pl) 2018-09-28

Family

ID=40588324

Family Applications (1)

Application Number Title Priority Date Filing Date
PL08017397T PL2103574T5 (pl) 2007-11-05 2008-10-02 Osadzanie ze spalaniem przy użyciu roztworów wodnych prekursorów do osadzania powłok z dwutlenku tytanu

Country Status (4)

Country Link
US (1) US7655274B2 (pl)
EP (1) EP2103574B2 (pl)
ES (1) ES2373129T5 (pl)
PL (1) PL2103574T5 (pl)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2979910B1 (fr) * 2011-09-13 2014-01-03 Saint Gobain Materiau photocatalytique et vitrage ou cellule photovoltaique comprenant ce materiau
US10007039B2 (en) 2012-09-26 2018-06-26 8797625 Canada Inc. Multilayer optical interference filter
US10828400B2 (en) 2014-06-10 2020-11-10 The Research Foundation For The State University Of New York Low temperature, nanostructured ceramic coatings

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3519406B2 (ja) 1993-03-24 2004-04-12 ジョージア テック リサーチ コーポレイション フィルム及びコーティングの燃焼化学蒸着の方法
US5858465A (en) 1993-03-24 1999-01-12 Georgia Tech Research Corporation Combustion chemical vapor deposition of phosphate films and coatings
GB9600210D0 (en) † 1996-01-05 1996-03-06 Vanderstraeten E Bvba Improved sputtering targets and method for the preparation thereof
US6169119B1 (en) * 1997-02-14 2001-01-02 Reliance Electric Technologies, Llc Metal oxide sols and process for making the same
US6193911B1 (en) * 1998-04-29 2001-02-27 Morton International Incorporated Precursor solution compositions for electronic devices using CCVD
JP2001240977A (ja) * 2000-02-29 2001-09-04 Nippon Paint Co Ltd 金属表面処理方法
EP1205243A1 (en) † 2000-11-09 2002-05-15 Neomat S.A. Preparation of firmly-anchored photocatalitically-active titanium dioxide coating films with non-gelled organic-doped precursors
DE10206330A1 (de) 2002-02-14 2003-08-28 Dirk Rueter Verfahren zur Aufbringung von Keramikschichten auf ein Substrat
US7281580B2 (en) * 2004-09-09 2007-10-16 Halliburton Energy Services, Inc. High porosity fractures and methods of creating high porosity fractures
US20070113881A1 (en) * 2005-11-22 2007-05-24 Guardian Industries Corp. Method of making solar cell with antireflective coating using combustion chemical vapor deposition (CCVD) and corresponding product
US7744951B2 (en) † 2006-04-13 2010-06-29 Guardian Industries Corp. Coated glass substrate with infrared and ultraviolet blocking characteristics

Also Published As

Publication number Publication date
PL2103574T5 (pl) 2018-09-28
EP2103574A2 (en) 2009-09-23
US20090117273A1 (en) 2009-05-07
US7655274B2 (en) 2010-02-02
ES2373129T5 (es) 2018-04-20
EP2103574B2 (en) 2017-09-13
ES2373129T3 (es) 2012-01-31
EP2103574A3 (en) 2009-09-30
EP2103574B1 (en) 2011-09-07

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