PL201265A1 - - Google Patents

Info

Publication number
PL201265A1
PL201265A1 PL20126577A PL20126577A PL201265A1 PL 201265 A1 PL201265 A1 PL 201265A1 PL 20126577 A PL20126577 A PL 20126577A PL 20126577 A PL20126577 A PL 20126577A PL 201265 A1 PL201265 A1 PL 201265A1
Authority
PL
Poland
Application number
PL20126577A
Inventor
Edward P Harbulak
Original Assignee
M & T Chemicals Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US05/729,074 external-priority patent/US4069112A/en
Application filed by M & T Chemicals Inc filed Critical M & T Chemicals Inc
Publication of PL201265A1 publication Critical patent/PL201265A1/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
    • C25D3/14—Electroplating: Baths therefor from solutions of nickel or cobalt from baths containing acetylenic or heterocyclic compounds
    • C25D3/18—Heterocyclic compounds
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/56—Electroplating: Baths therefor from solutions of alloys
    • C25D3/562—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of iron or nickel or cobalt

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Electrolytic Production Of Metals (AREA)
  • Electroplating Methods And Accessories (AREA)
PL20126577A 1976-10-04 1977-10-03 PL201265A1 (en:Method)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/729,074 US4069112A (en) 1976-06-18 1976-10-04 Electroplating of nickel, cobalt, mutual alloys thereof or ternary alloys thereof with iron

Publications (1)

Publication Number Publication Date
PL201265A1 true PL201265A1 (en:Method) 1978-06-05

Family

ID=24929474

Family Applications (1)

Application Number Title Priority Date Filing Date
PL20126577A PL201265A1 (en:Method) 1976-10-04 1977-10-03

Country Status (19)

Country Link
JP (1) JPS6025513B2 (en:Method)
AR (1) AR218268A1 (en:Method)
AU (1) AU508254B2 (en:Method)
BE (1) BE858817A (en:Method)
BR (1) BR7706445A (en:Method)
CA (1) CA1086679A (en:Method)
DE (1) DE2743847A1 (en:Method)
DK (1) DK152593C (en:Method)
ES (1) ES462745A1 (en:Method)
FR (1) FR2366381A1 (en:Method)
GB (1) GB1583216A (en:Method)
IT (1) IT1090776B (en:Method)
MX (1) MX4671E (en:Method)
NL (1) NL7710872A (en:Method)
NO (1) NO150214C (en:Method)
NZ (1) NZ185277A (en:Method)
PL (1) PL201265A1 (en:Method)
SE (1) SE7711034L (en:Method)
ZA (1) ZA775315B (en:Method)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6372118B1 (en) 1999-04-12 2002-04-16 Wen Hua Hui Ni-Fe-Co electroplating bath
RU2175690C2 (ru) * 1999-07-02 2001-11-10 Калининградский государственный университет Электролит блестящего никелирования
US6736954B2 (en) * 2001-10-02 2004-05-18 Shipley Company, L.L.C. Plating bath and method for depositing a metal layer on a substrate
WO2019013761A1 (en) 2017-07-11 2019-01-17 Atotech Deutschland Gmbh AQUEOUS COMPOSITION FOR DEPOSITION OF COBALT DEPOSITION AND METHOD FOR ELECTROLYTIC DEPOSITION OF SUCH A DEPOSITION
WO2019013762A1 (en) 2017-07-11 2019-01-17 Atotech Deutschland Gmbh AQUEOUS COMPOSITION FOR DEPOSITION OF COBALT DEPOSITION AND METHOD FOR ELECTROLYTIC DEPOSITION OF SUCH DEPOSIT
CN116356389A (zh) * 2023-06-01 2023-06-30 中石油深圳新能源研究院有限公司 合金镀层的制备方法、合金镀层、电池和电池组件

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SE205781C1 (en:Method) *
US3376207A (en) * 1965-05-17 1968-04-02 Patent Serm Ag Electrodeposition of nickel and electrolytes therefor
US3697392A (en) * 1970-07-02 1972-10-10 Allied Res Prod Inc Electrodeposition of nickel
US3709798A (en) * 1971-10-13 1973-01-09 Richardson Chemical Co Electrodeposition of nickel
US3804726A (en) * 1973-04-23 1974-04-16 M & T Chemicals Inc Electroplating processes and compositions

Also Published As

Publication number Publication date
CA1086679A (en) 1980-09-30
FR2366381A1 (fr) 1978-04-28
GB1583216A (en) 1981-01-21
JPS6025513B2 (ja) 1985-06-18
DE2743847A1 (de) 1978-04-06
BE858817A (fr) 1978-01-16
NO150214B (no) 1984-05-28
ZA775315B (en) 1978-07-26
NZ185277A (en) 1980-02-21
JPS5345634A (en) 1978-04-24
AU508254B2 (en) 1980-03-13
NO150214C (no) 1984-09-05
DK152593C (da) 1988-09-05
MX4671E (es) 1982-07-23
AR218268A1 (es) 1980-05-30
NL7710872A (nl) 1978-04-06
DK152593B (da) 1988-03-21
DK437077A (da) 1978-04-05
IT1090776B (it) 1985-06-26
DE2743847C2 (en:Method) 1987-07-30
BR7706445A (pt) 1978-07-18
SE7711034L (sv) 1978-04-05
AU2825377A (en) 1979-03-01
NO773316L (no) 1978-04-05
ES462745A1 (es) 1978-05-16

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