PL107556B1 - METHOD OF HEATING THE SOLVENT IN THE DEGREASING APPARATUS - Google Patents

METHOD OF HEATING THE SOLVENT IN THE DEGREASING APPARATUS Download PDF

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Publication number
PL107556B1
PL107556B1 PL1976190058A PL19005876A PL107556B1 PL 107556 B1 PL107556 B1 PL 107556B1 PL 1976190058 A PL1976190058 A PL 1976190058A PL 19005876 A PL19005876 A PL 19005876A PL 107556 B1 PL107556 B1 PL 107556B1
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Poland
Prior art keywords
solvent
heat
degreasing
condensation
heating
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Application number
PL1976190058A
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Polish (pl)
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Publication date
Priority claimed from SE7506251A external-priority patent/SE387969B/en
Priority claimed from SE7514109A external-priority patent/SE389347B/en
Application filed filed Critical
Publication of PL107556B1 publication Critical patent/PL107556B1/en

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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23GCLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G5/00Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents
    • C23G5/02Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents
    • C23G5/04Apparatus
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D3/00Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping
    • B01D3/007Energy recuperation; Heat pumps
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02BCLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO BUILDINGS, e.g. HOUSING, HOUSE APPLIANCES OR RELATED END-USER APPLICATIONS
    • Y02B30/00Energy efficient heating, ventilation or air conditioning [HVAC]
    • Y02B30/52Heat recovery pumps, i.e. heat pump based systems or units able to transfer the thermal energy from one area of the premises or part of the facilities to a different one, improving the overall efficiency

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
  • Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
  • Detergent Compositions (AREA)

Description

Przedmiotem wynalazku jest sposób ogrzewania rozpuszczalnika w aparaturze. do odtluszczania, polegajacy na tym, ze kapiel utrzymuje sie w sta¬ nie ciaglego wrzenia i wytwarza strefe oparów rozpuszczalnika nad kapiela. Opary z tej strefy ^wykorzystuje sie do odtluszczania detali w fazie gazowej. W górnej czesci tej strefy umieszczona jest wezownica chlodzaca do skraplania oparów, które po skropleniu zawracane sa do kapieli od¬ tluszczajacej w fazie cieklej.Celem wynalazku jest znaczne zmniejszenie ko¬ sztów eksploatacji aparatu do odtluszczania bez komplikowania dzialania aparatu lub wzrostu kosztów na dodatkowe wyposazenie.Zgodnie z wynalazkiem, cieplo kondensacji par rozpuszczalnika dostarcza sie do krazacego nosnika ciepla pompy cieplnej, w której nosnik odparo¬ wuje. Nastepnie pary spreza sie i dostarcza do ogrzewania kapieli odtluszczajacej.Przedmiot wynalazku bedzie dokladniej wyjas¬ niony na zalaczonym rysunku, na którym fig. 1 przedstawia schemta dzialania konwencjonalnej aparatury do odtluszczania, a fig. 2 — schemat dzialania aparatury do odtluszczania, wedlug wy¬ nalazku.W konwencjonalnym sposobie odtluszczania zgo¬ dnie z fig. 1 aparat sklada sie z dwóch komór 1 i 2; do których doprowadza sie kapiel rozpusz¬ czalnika odtluszczajacego 3 i 4. Dno_ komory 1 jest wyposazone w grzejnik 5, który ogrzewa sie 10 15 20 2S 30 para lub pradem elektrycznym tak, ze rozpusz¬ czalnik 3 jest w stanie ciaglego wrzenia. Wytwo¬ rzone pary rozpuszczalnika wypelniaja przestrzen ponad kapielami 3 i 4 tworzac strefe 6. W górnej czesci tej strefy znajduje sie wezownica 7 chlod¬ nicy, umieszczona przy wewnetrznych scianach aparatu odtluszczajacego. Gdy nasycone pary roz¬ puszczalnika docieraja do chlodnicy 7, nastepuje kondensacja i kondensat zbiera sie w kanale & otaczajacym wewnetrzne sciany aparatu, skad od¬ prowadzany jest do komory 2 przewodem 9. Nad¬ miar cieczy splywa w dól do komory 1. Odtlusz¬ czanie odbywa sie w komorze 1. Z aparatu do od¬ tluszczania czesc par rozpuszczalnika miesza sie z powietrzem ponad strefa 6. Zawartosc rozpusz¬ czalnika w powietrzu zalezy od cisnienia par roz¬ puszczalnika i od temperatury chlodnicy. Zatem, przy nizszej temperaturze chlodnicy, straty roz¬ puszczalnika sa mniejsze.Zazwyczaj stosuje sie chlodzenie woda, czasem jednak stosuje sie system analogiczny do dziala¬ jacego w chlodziarkach, a to umozliwia osiag¬ niecie nizszej temperatury chlodnicy i zmniej¬ szenie strat rozpuszczalnika.Ilosc ciepla niezbedna do prowadzenia procesu odtluszczenia jest rózna dla róznych aparatów. Za¬ lezy na ogól od ilosci detali odtluszczanych w jed¬ nostce czasu, ilosci tluszczu na powierzchni detali i stosowanego rozpuszczalnika.Zapotrzebowanie na energie elektryczna waha 107 556107 3 sie w granicach 10—100 kW. Ilosc wody chlodza¬ cej, potrzebnej do kondensacji par rozpuszczalnika, waha. sie w granicach 1—10 m3/godzine.Pary rozpuszczalnika, które dochodza do chlod¬ nicy 7, ogrzewaja ja i jak to ma miejsce podczas - stosowania aparatury konwencjonalnej, cieplo opuszcza uklad wraz z ogrzana woda chlodzaca.' Natomiast zgodnie z wynalazkiem cieplo kon¬ densacji par rozpuszczalnika na chlodnicy, jest wykorzystane do ogrzewania kapieli rozpuszczal- 10 nika, co bedzie opisane bardziej szczególowo w nawiazaniu do fig. 2.Uklad chlodzienia (fig. 2) jest tak skonstruowa¬ ny, ze przeplyw czynnika chlodzacego odbywa sie badz bezposrednio przez wezownice grzejna umie- 15 ¦szezona w dnie aparatu, do chlodnicy umieszczo¬ nej przy wierzcholku, badz posrednio tak, ze na¬ stepuje wymiana ciepla z drugim czynnikiem.Instalacja chlodzaca ma takie wymiary aby uzy¬ skana, wzglednie niska temperatura chlodnicy da- 20 wala niskie straty, rozpuszczalnika.. W sklad instalacji chlodzacej wchodzi pompa 10, -do której dostarcza sie cieplo pochodzace z chlod¬ nicy 7', przewodem 11. Mozna tego dokonac w ten sposób, ze chlodnica 7' oddaje cieplo bezposrednio 25 czynnikowi grzejnemu pompy, który to czynnik sklada sie z' latwo parujacej cieczy, krazacej w zamknietym obiegu pompy.Mozliwe jest równiez ogrzewanie cieplem po¬ chodzacym z wymiany ciepla miedzy chlodnica 7', 30 a czynnikiem krazacym. Na skutek ogrzania czyn¬ nik ten odparowuje. Pary spreza sie poprzez wy¬ konanie pracy mechanicznej, sprezarka elektrycz¬ na lub strumieniowa pom;a parowa pracujaca na parze wysokocisnieniowej. Sprezone pary, które 35 obecnie maja podwyzszona temperature nasyce¬ nia, zasilaja komore 1', przewodem 12, albo bez¬ posrednio, albo przez wymiennik ciepla, w któ¬ rym nastepuje kondensacja par.Przez Umieszczenie zaworu 14 regulujacego cis- 40 nienie, na przewodzie laczacym przewód 9' i chlod¬ nice 7'j mozna wykorzystac rozpuszczalnik jako czynnik chlodzacy, przez odparowanie go na stro¬ nie ssawnej pompy. Korzystnie, czynnik przeno¬ szacy cieplo moze krazyc w ukladzie -zamknietym, 45 w którym parowanie odbywa sie w chlodnicy 7', a skraplanie zachodzi podczas wymiany -ciepla 2* rozpuszczalnikiem w komorze 1'.Dla wykonania tej pracy pompa wymaga pew¬ nej dodatkowej energii dostarczanej z zewnatrz, 50 a pewna itósc energii oznaczona strzalka 13 ulega rozproszeniu poza aparatem do chlodzenia. Gdy w aparacie zhajttuja sie detale do odtluszczenia, po¬ chlaniaja one równiez pewne ilosci ciepla. Podczas jalowej pracy aparatury, wydzielone cieplo mozna 55 stosowac do innych celów niz odtluszczanie, np. dto ogrzewania pomieszczen.Wydajnosc pompy, to znaczy zaleznosc miedzy energia przenoszona, a energia dostarczona do pompy w duzej mierze zalezy od róznicy tempe- 60 ratUr miedzy chlodnym miejscem skad energie po¬ biera sie, a goracym miejscem, do którego do- 556 4 starcza sie ja. Aby uzyskac najlepsza mozliwa wydajnosc zaleca sie stosowanie niskowrzacego rozpuszczalnika, np. o temperaturze wrzenia po¬ nizej 50°C, przy którym mozna uzyc najprostsze¬ go typu pompy. Takim rozpuszczalnikiem jest chlorek metylenu lub inne np. fluoroweglowodoro- oraz fluoro-biromo-wodorochlorki. W Szwecji za¬ zwyczaj stosuje sie trójchloroetylen, w USA równie czesto trój chloroetan. Te dwa rozpuszczalniki maja temperature wrzenia odpowiednio 87°C i 74°C.Oszczednosci, mozliwe do osiagniecia podanym sposobem ilustruje ponizszy przyklad.Przyklad. Zalozono, ze aparat z grzejnikiem 100 kW, trójchloroetylenem jako rozpuszczalnikiem do odtluszczania, pracuje 16 godzin dziennie, 200 dni w roku.Zapotrzebo¬ wanie na energie dostarczana Zapotrzebo¬ wanie na wo¬ de chlodza¬ ca Trójchlo¬ roetylen metoda konwen¬ cjonalna 100 kW 1,8 m3/h Trójchlo¬ roetan metoda konwen¬ cjonalna 80 kW , 1,8 m3/h Chlorek metylenu metoda konwen¬ cjonalna 30 kW 3 m3/h Chlorek metylenu zgodnie z wyna¬ lazkiem 10 kW 0 Zastrzezenia patentowe 1. Sposób ogrzewania rozpuszczalnika w apara¬ turze -do odtluszczania tak, aby rozpuszczalnik znajdowal sie w stanie ciaglego wrzenia wytwa¬ rzajac strefe oparów rozpuszczalnika nad kapiela, wykorzystywana w fazie gazowej do odtluszczania detali ,przy czym w górnej czesci tej strefy umie¬ szczona jest wezownica chlodzaca do skraplania oparów, które po skropleniu zawracane sa do ka¬ pieli odtluszczajacej w fazie cieklej, znamienny tym, ze cieplo kondensacji par rozpuszczalnika do¬ starcza sie do krazacego nosnika ciepla pompy cieplnej, w której nosnik odparowuje, a nastepnie paty spreza sie i dostarcza do ogrzewania kapieli odtluszczajacej. 2. Sposób wedlug zastrz. 1, znamienny tym, ze jako nosnik ciepla stosuje sie jeden lub kilka niskowrzacych rozpuszczalników, korzystnie chlo¬ rek metylenu lub inne alkilowane weglowodory i/lub inne mieszaniny takich rozpuszczalników. 3. Sposób wedlug zastrz. 2, znamienny tym, ze nosnik ciepla krazy w oddzielnym obwodzie. 4. Sposób wedlug zastrz. 1, znamienny tym, ze nosnik ciepla krazy w ukladzie zamknietym, a skraplanie zachodzi podczas wymiany ciepla w ka¬ pieli rozpuszczalnikowej.107 556 Figi J Fig.2 ^J PLThe invention relates to a method of heating a solvent in an apparatus. for degreasing, in which the bath is kept in a constant boiling state and creates a zone of solvent vapor above the bath. The vapors from this zone are used to degrease parts in the gas phase. In the upper part of this zone there is a cooling coil to condense the vapors which, after condensation, are returned to the liquid phase degreasing bath. The aim of the invention is to significantly reduce the operating costs of the degreasing apparatus without complicating the operation of the apparatus or increasing the cost of additional equipment. According to the invention, the heat of condensation of the solvent vapors is supplied to the heat pump that circulates the heat of the medium, in which the medium evaporates. The steam is then compressed and fed to the heating of the degreasing bath. The subject matter of the invention will be explained in more detail in the accompanying drawing, in which Fig. 1 shows a diagram of the operation of a conventional degreasing apparatus, and Fig. 2 shows a diagram of the operation of a degreasing apparatus according to the invention. In the conventional degreasing process according to FIG. 1, the apparatus comprises two chambers 1 and 2; to which the degreasing solvent bath 3 and 4 are fed. The bottom of the chamber 1 is provided with a heater 5 which is heated by steam or electric current so that the solvent 3 is in a continuous boiling state. The generated vapors of the solvent fill the space above the baths 3 and 4, forming zone 6. In the upper part of this zone there is a cooler coil 7, placed at the inner walls of the degreasing apparatus. As the saturated solvent vapors reach the cooler 7, condensation occurs and the condensate collects in the duct & surrounding the inner walls of the apparatus, from which it is drained into chamber 2 through duct 9. Excess liquid flows down to chamber 1. Degreasing takes place in chamber 1. From the degreasing apparatus, part of the solvent vapors mixes with the air above zone 6. The solvent content in the air depends on the pressure of the solvent vapors and the temperature of the cooler. Thus, at a lower radiator temperature, the loss of solvent is lower. Water cooling is usually used, but sometimes a system similar to that used in chillers is used, and this allows for a lower radiator temperature and reduced solvent losses. the heat necessary to carry out the degreasing process is different for different apparatuses. It generally depends on the number of parts degreased per unit time, the amount of grease on the surface of the parts and the solvent used. The electrical energy consumption is 10-100 kW. The amount of cooling water required to condense the solvent vapors varies. 1 to 10 m3 / hour. The solvent vapors which reach the cooler 7 heat it up and, as is the case when using conventional apparatus, the heat leaves the system together with the heated cooling water. In contrast, according to the invention, the heat of condensation of the solvent vapors on the cooler is used to heat the solvent bath, as will be described in more detail with reference to Fig. 2. The cooling system (Fig. 2) is so constructed that the flow is the cooling medium is carried out either directly through the heating coil located in the bottom of the apparatus, to the cooler located at the top, or indirectly so that heat is exchanged with the second medium. The cooling installation is dimensioned so as to obtain, the relatively low temperature of the radiator gives a low loss of solvent. The cooling system comprises a pump 10, to which the heat from the radiator 7 'is supplied through the pipe 11. This can be done with the radiator 7' it gives off heat directly to the pump heating medium, which medium consists of a liquid that easily evaporates in a closed circuit of the pump. Heating by heat is also possible. using heat exchange between the radiator 7 ', 30 and the circulating medium. On heating, this medium evaporates. The vapors are compressed by mechanical work, by an electric compressor or by a jet pump, and by high pressure steam. Compressed vapors, which currently have an elevated saturation temperature, feed chamber 1 'through line 12, either directly or through a heat exchanger in which the vapor condenses. By placing the pressure control valve 14 on the line connecting the line 9 'and the cooler 7', the solvent may be used as a coolant by evaporating it at the suction side of the pump. Advantageously, the heat transfer medium may circulate in a closed system where evaporation takes place in the cooler 7 'and condensation takes place during the replacement of the heat with a solvent in chamber 1'. The pump requires some additional externally supplied energy 50 and some of the energy indicated by the arrow 13 is dissipated outside the cooling apparatus. When parts to degrease get into the apparatus, they also absorb some heat. During idle operation of the apparatus, the generated heat can be used for other purposes than degreasing, e.g. for heating rooms. The efficiency of the pump, i.e. the relationship between the energy transferred and the energy delivered to the pump, largely depends on the temperature difference between the cold place where it draws energy from, and a hot place where it feeds itself. In order to obtain the best possible efficiency, it is advisable to use a solvent of low boiling point, for example with a boiling point below 50 ° C, at which the simplest type of pump may be used. Such a solvent is methylene chloride or other, e.g. In Sweden, trichlorethylene is usually used, and in the USA, trichlorethane is also often used. These two solvents have a boiling point of 87 ° C and 74 ° C, respectively. The savings that can be achieved with this method are illustrated in the following example. It was assumed that the apparatus with a 100 kW heater, trichlorethylene as solvent for degreasing, was working 16 hours a day, 200 days a year. Energy demand Delivered Water demand for cooling Trichlorethylene conventional method 100 kW 1.8 m3 / h Trichloroethane conventional method 80 kW, 1.8 m3 / h Methylene chloride Conventional method 30 kW 3 m3 / h Methylene chloride according to the invention 10 kW 0 Patent claims 1. Heating method solvent in an apparatus for degreasing so that the solvent is in a continuous boiling state, creating a zone of solvent vapor above the drip, used in the vapor phase to degrease parts, with a cooling coil for condensation at the top of this zone the vapor which, after condensation, is returned to the degreasing bath in the liquid phase, characterized in that the heat of condensation of the solvent vapors is supplied to the circulating heat carrier of the pump heat, in which the medium evaporates, and then the patches are compressed and provided for heating the degreasing bath. 2. The method according to claim A process as claimed in claim 1, characterized in that one or more low-boiling solvents, preferably methylene chloride or other alkylated hydrocarbons and / or other mixtures of such solvents, are used as the heat carrier. 3. The method according to p. The method of claim 2, characterized in that the heat carrier circulates in a separate circuit. 4. The method according to p. A method according to claim 1, characterized in that the heat carrier circulates in a closed system and condensation takes place during heat exchange in a solvent bath. 107 556 Fig. J Fig. 2 J PL

Claims (4)

Zastrzezenia patentowe 1. Sposób ogrzewania rozpuszczalnika w apara¬ turze -do odtluszczania tak, aby rozpuszczalnik znajdowal sie w stanie ciaglego wrzenia wytwa¬ rzajac strefe oparów rozpuszczalnika nad kapiela, wykorzystywana w fazie gazowej do odtluszczania detali ,przy czym w górnej czesci tej strefy umie¬ szczona jest wezownica chlodzaca do skraplania oparów, które po skropleniu zawracane sa do ka¬ pieli odtluszczajacej w fazie cieklej, znamienny tym, ze cieplo kondensacji par rozpuszczalnika do¬ starcza sie do krazacego nosnika ciepla pompy cieplnej, w której nosnik odparowuje, a nastepnie paty spreza sie i dostarcza do ogrzewania kapieli odtluszczajacej.Claims 1. A method of heating the solvent in a degreasing apparatus so that the solvent is in a continuous boiling state creating a zone of solvent vapor above the drip, used in the gas phase for degreasing parts, with the upper part of this zone being placed a cooling coil is provided for the condensation of vapors, which, after condensation, are returned to the degreasing bath in the liquid phase, characterized in that the heat of condensation of the solvent vapors is supplied to the heat-circulating medium of the heat pump, in which the medium is evaporated, and then the patches are compressed. on and supplied to the heating of the degreasing bath. 2. Sposób wedlug zastrz. 1, znamienny tym, ze jako nosnik ciepla stosuje sie jeden lub kilka niskowrzacych rozpuszczalników, korzystnie chlo¬ rek metylenu lub inne alkilowane weglowodory i/lub inne mieszaniny takich rozpuszczalników.2. The method according to claim A process as claimed in claim 1, characterized in that one or more low-boiling solvents, preferably methylene chloride or other alkylated hydrocarbons and / or other mixtures of such solvents, are used as the heat carrier. 3. Sposób wedlug zastrz. 2, znamienny tym, ze nosnik ciepla krazy w oddzielnym obwodzie.3. The method according to p. The method of claim 2, characterized in that the heat carrier circulates in a separate circuit. 4. Sposób wedlug zastrz. 1, znamienny tym, ze nosnik ciepla krazy w ukladzie zamknietym, a skraplanie zachodzi podczas wymiany ciepla w ka¬ pieli rozpuszczalnikowej.107 556 Figi J Fig.2 ^J PL4. The method according to p. A method according to claim 1, characterized in that the heat carrier circulates in a closed system and condensation takes place during heat exchange in a solvent bath. 107 556 Fig. J Fig. 2 J PL
PL1976190058A 1975-06-02 1976-06-02 METHOD OF HEATING THE SOLVENT IN THE DEGREASING APPARATUS PL107556B1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
SE7506251A SE387969B (en) 1975-06-02 1975-06-02 PROCEDURE FOR A DEFETER TO PROVIDE ITS SOLVENT BATH WITH HEAT
SE7514109A SE389347B (en) 1975-12-15 1975-12-15 PROCEDURE FOR A DEGREATER TO PROVIDE ITS SOLVENT BATH WITH HEAT.

Publications (1)

Publication Number Publication Date
PL107556B1 true PL107556B1 (en) 1980-02-29

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JP (1) JPS5220672A (en)
AR (1) AR209964A1 (en)
AT (1) AT341854B (en)
BR (1) BR7603508A (en)
CH (1) CH613767A5 (en)
DD (1) DD125001A5 (en)
DE (1) DE2624345C2 (en)
DK (1) DK239576A (en)
ES (1) ES448446A1 (en)
FI (1) FI761551A (en)
FR (1) FR2313136A1 (en)
GB (1) GB1536605A (en)
IT (1) IT1062318B (en)
NL (1) NL7605826A (en)
NO (1) NO137456C (en)
PL (1) PL107556B1 (en)

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DE2203991A1 (en) * 1972-01-25 1973-08-02 Hans Poweleit Metal degreasing plant - using trichlorofluoro-methane trichlorotrifluoro ethane solvents

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Publication number Publication date
DD125001A5 (en) 1977-03-23
AT341854B (en) 1978-03-10
NL7605826A (en) 1976-12-06
ATA403476A (en) 1977-06-15
FR2313136B1 (en) 1980-04-18
NO137456C (en) 1978-03-01
JPS5220672A (en) 1977-02-16
DE2624345C2 (en) 1984-08-23
CH613767A5 (en) 1979-10-15
AR209964A1 (en) 1977-06-15
NO761875L (en) 1976-12-03
GB1536605A (en) 1978-12-20
FR2313136A1 (en) 1976-12-31
FI761551A (en) 1976-12-03
DK239576A (en) 1976-12-03
ES448446A1 (en) 1977-07-01
IT1062318B (en) 1984-10-10
BR7603508A (en) 1977-01-04
NO137456B (en) 1977-11-21
DE2624345A1 (en) 1976-12-23

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