NO986107L - Polymerisering av urea/ureido funksjonelle monomerer - Google Patents
Polymerisering av urea/ureido funksjonelle monomererInfo
- Publication number
- NO986107L NO986107L NO986107A NO986107A NO986107L NO 986107 L NO986107 L NO 986107L NO 986107 A NO986107 A NO 986107A NO 986107 A NO986107 A NO 986107A NO 986107 L NO986107 L NO 986107L
- Authority
- NO
- Norway
- Prior art keywords
- urea
- polymerization
- functional monomers
- ureido functional
- ureido
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D207/00—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom
- C07D207/02—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom
- C07D207/30—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having two double bonds between ring members or between ring members and non-ring members
- C07D207/34—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having two double bonds between ring members or between ring members and non-ring members with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
- C07D207/36—Oxygen or sulfur atoms
- C07D207/40—2,5-Pyrrolidine-diones
- C07D207/404—2,5-Pyrrolidine-diones with only hydrogen atoms or radicals containing only hydrogen and carbon atoms directly attached to other ring carbon atoms, e.g. succinimide
- C07D207/408—Radicals containing only hydrogen and carbon atoms attached to ring carbon atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C275/00—Derivatives of urea, i.e. compounds containing any of the groups, the nitrogen atoms not being part of nitro or nitroso groups
- C07C275/46—Derivatives of urea, i.e. compounds containing any of the groups, the nitrogen atoms not being part of nitro or nitroso groups containing any of the groups, X being a hetero atom, Y being any atom, e.g. acylureas
- C07C275/48—Y being a hydrogen or a carbon atom
- C07C275/50—Y being a hydrogen or an acyclic carbon atom
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C275/00—Derivatives of urea, i.e. compounds containing any of the groups, the nitrogen atoms not being part of nitro or nitroso groups
- C07C275/46—Derivatives of urea, i.e. compounds containing any of the groups, the nitrogen atoms not being part of nitro or nitroso groups containing any of the groups, X being a hetero atom, Y being any atom, e.g. acylureas
- C07C275/48—Y being a hydrogen or a carbon atom
- C07C275/52—Y being a carbon atom of a ring other than a six-membered aromatic ring
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D207/00—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom
- C07D207/02—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom
- C07D207/44—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having three double bonds between ring members or between ring members and non-ring members
- C07D207/444—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having three double bonds between ring members or between ring members and non-ring members having two doubly-bound oxygen atoms directly attached in positions 2 and 5
- C07D207/456—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having three double bonds between ring members or between ring members and non-ring members having two doubly-bound oxygen atoms directly attached in positions 2 and 5 with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to other ring carbon atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D233/00—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings
- C07D233/04—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having one double bond between ring members or between a ring member and a non-ring member
- C07D233/28—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having one double bond between ring members or between a ring member and a non-ring member with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
- C07D233/30—Oxygen or sulfur atoms
- C07D233/32—One oxygen atom
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F22/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides or nitriles thereof
- C08F22/36—Amides or imides
- C08F22/38—Amides
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
- C08F222/10—Esters
- C08F222/12—Esters of phenols or saturated alcohols
- C08F222/22—Esters containing nitrogen
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D135/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical, and containing at least another carboxyl radical in the molecule, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Coating compositions based on derivatives of such polymers
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
- C09D5/02—Emulsion paints including aerosols
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C2601/00—Systems containing only non-condensed rings
- C07C2601/12—Systems containing only non-condensed rings with a six-membered ring
- C07C2601/16—Systems containing only non-condensed rings with a six-membered ring the ring being unsaturated
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C2602/00—Systems containing two condensed rings
- C07C2602/36—Systems containing two condensed rings the rings having more than two atoms in common
- C07C2602/42—Systems containing two condensed rings the rings having more than two atoms in common the bicyclo ring system containing seven carbon atoms
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Wood Science & Technology (AREA)
- Engineering & Computer Science (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Life Sciences & Earth Sciences (AREA)
- Materials Engineering (AREA)
- Dispersion Chemistry (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Paints Or Removers (AREA)
Abstract
Det er beskrevet nye klasser urea/ureido-funksjonelle forbindelser og blandinger inneholdende disse, som er spesielt egnet for anvendelse som mono- merer for å gi polymerer våtadhesjons- og/eller selv-tverrbindingsegenskaper, spesielt i vandige emulsjonssystemer som anvendes til fremstilling av lateksma- linger. Blandinger inneholdende samme, samt ytterligere anvendelser av disse, er også beskrevet.
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US2033396P | 1996-06-24 | 1996-06-24 | |
US2035496P | 1996-06-24 | 1996-06-24 | |
US3889697P | 1997-02-21 | 1997-02-21 | |
PCT/US1997/011197 WO1997049676A1 (en) | 1996-06-24 | 1997-06-24 | Urea/ureido functional polymerizable monomers |
Publications (2)
Publication Number | Publication Date |
---|---|
NO986107D0 NO986107D0 (no) | 1998-12-23 |
NO986107L true NO986107L (no) | 1998-12-28 |
Family
ID=27361418
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NO986107A NO986107L (no) | 1996-06-24 | 1998-12-23 | Polymerisering av urea/ureido funksjonelle monomerer |
Country Status (8)
Country | Link |
---|---|
EP (1) | EP0918749A1 (no) |
JP (1) | JP2000515129A (no) |
KR (1) | KR20000022101A (no) |
AU (1) | AU3581297A (no) |
BR (1) | BR9709981A (no) |
CA (1) | CA2258874A1 (no) |
NO (1) | NO986107L (no) |
WO (1) | WO1997049676A1 (no) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0928820A3 (en) * | 1998-01-06 | 2001-11-07 | Cytec Technology Corp. | Wet adhesion promoter |
US7812079B2 (en) | 2001-02-22 | 2010-10-12 | Valspar Sourcing, Inc. | Coating compositions containing low VOC compounds |
KR100890762B1 (ko) * | 2005-11-12 | 2009-03-31 | 주식회사 엘지화학 | 종이 코팅용 스티렌-부타디엔계 라텍스 및 그를 포함하는종이 코팅용 조성물 |
FR2955105B1 (fr) | 2010-01-11 | 2012-04-20 | Arkema France | Procede de preparation d'aminoethyl imidazolidone ou de son thiocarbonyle |
JP2018077464A (ja) * | 2016-11-01 | 2018-05-17 | 住友化学株式会社 | 化合物、液晶組成物、光学フィルム、偏光板および光学ディスプレイ |
JP7177249B2 (ja) * | 2019-03-27 | 2022-11-22 | 富士フイルム株式会社 | 硬化性樹脂組成物、硬化膜、積層体、硬化膜の製造方法、及び、半導体デバイス |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2809190A (en) * | 1953-11-30 | 1957-10-08 | Us Rubber Co | Process of preparing esters of n-car-bamylfumaramic acid |
BE533384A (no) * | 1953-11-30 | |||
US2854438A (en) * | 1953-11-30 | 1958-09-30 | Us Rubber Co | Esters of n-carbamylamic acids from alpha olefinic alkene dioic acid anhydrides |
US2776987A (en) * | 1954-03-10 | 1957-01-08 | Us Rubber Co | Metal salts of sulfo-nu-carbamylsuccinamic acid esters |
US2860157A (en) * | 1956-10-10 | 1958-11-11 | Us Rubber Co | Making trans n-carbamylamic esters |
ATE74349T1 (de) * | 1984-07-03 | 1992-04-15 | Nippon Paint Co Ltd | Acrylamid-derivate. |
US4766221A (en) * | 1986-04-04 | 1988-08-23 | Sequa Chemicals, Inc. | N-acyl substituted cyclic ureas |
CA2125808C (en) * | 1993-06-17 | 1999-02-09 | Rajeev Farwaha | Polymerizable imidazolidinones as wet adhesion promoters in aqueous paints |
-
1997
- 1997-06-24 WO PCT/US1997/011197 patent/WO1997049676A1/en not_active Application Discontinuation
- 1997-06-24 EP EP97932324A patent/EP0918749A1/en not_active Withdrawn
- 1997-06-24 BR BR9709981A patent/BR9709981A/pt not_active Application Discontinuation
- 1997-06-24 JP JP10503548A patent/JP2000515129A/ja active Pending
- 1997-06-24 CA CA002258874A patent/CA2258874A1/en not_active Abandoned
- 1997-06-24 KR KR1019980710511A patent/KR20000022101A/ko not_active Application Discontinuation
- 1997-06-24 AU AU35812/97A patent/AU3581297A/en not_active Abandoned
-
1998
- 1998-12-23 NO NO986107A patent/NO986107L/no not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
WO1997049676A1 (en) | 1997-12-31 |
BR9709981A (pt) | 1999-08-10 |
EP0918749A1 (en) | 1999-06-02 |
JP2000515129A (ja) | 2000-11-14 |
AU3581297A (en) | 1998-01-14 |
NO986107D0 (no) | 1998-12-23 |
KR20000022101A (ko) | 2000-04-25 |
CA2258874A1 (en) | 1997-12-31 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
FC2A | Withdrawal, rejection or dismissal of laid open patent application |