NO900518L - Tolaget oksydfilm samt fremgangsmaate ved fremstilling av denne. - Google Patents

Tolaget oksydfilm samt fremgangsmaate ved fremstilling av denne.

Info

Publication number
NO900518L
NO900518L NO90900518A NO900518A NO900518L NO 900518 L NO900518 L NO 900518L NO 90900518 A NO90900518 A NO 90900518A NO 900518 A NO900518 A NO 900518A NO 900518 L NO900518 L NO 900518L
Authority
NO
Norway
Prior art keywords
procedures
created
manufacturing
oxyde
film
Prior art date
Application number
NO90900518A
Other languages
English (en)
Other versions
NO900518D0 (no
Inventor
Aron Marcus Rosenfeld
Paul Smits
Original Assignee
Alcan Int Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Alcan Int Ltd filed Critical Alcan Int Ltd
Publication of NO900518D0 publication Critical patent/NO900518D0/no
Publication of NO900518L publication Critical patent/NO900518L/no

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62—Record carriers characterised by the selection of the material
    • G11B5/72—Protective coatings, e.g. anti-static or antifriction
    • G11B5/726—Two or more protective coatings
    • G11B5/7262—Inorganic protective coating
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/04—Anodisation of aluminium or alloys based thereon
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/26—Anodisation of refractory metals or alloys based thereon
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/858—Producing a magnetic layer by electro-plating or electroless plating
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/04—Anodisation of aluminium or alloys based thereon
    • C25D11/045—Anodisation of aluminium or alloys based thereon for forming AAO templates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Electrochemistry (AREA)
  • Mechanical Engineering (AREA)
  • Laminated Bodies (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
NO90900518A 1989-02-02 1990-02-02 Tolaget oksydfilm samt fremgangsmaate ved fremstilling av denne. NO900518L (no)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CA589922 1989-02-02

Publications (2)

Publication Number Publication Date
NO900518D0 NO900518D0 (no) 1990-02-02
NO900518L true NO900518L (no) 1990-08-03

Family

ID=4139560

Family Applications (1)

Application Number Title Priority Date Filing Date
NO90900518A NO900518L (no) 1989-02-02 1990-02-02 Tolaget oksydfilm samt fremgangsmaate ved fremstilling av denne.

Country Status (5)

Country Link
EP (1) EP0381512A3 (no)
JP (1) JPH0328397A (no)
AU (1) AU4905790A (no)
BR (1) BR9000472A (no)
NO (1) NO900518L (no)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004087994A1 (en) * 2003-03-31 2004-10-14 Sheffield Hallam University Base for decorative layer
US7780838B2 (en) 2004-02-18 2010-08-24 Chemetall Gmbh Method of anodizing metallic surfaces
US7717271B2 (en) 2005-12-07 2010-05-18 General Electric Company Membrane structure and method of making
US7547393B2 (en) 2005-12-07 2009-06-16 General Electric Company Membrane structure and method of making
WO2012046808A1 (ja) * 2010-10-08 2012-04-12 シャープ株式会社 陽極酸化膜の製造方法
JPWO2016152817A1 (ja) * 2015-03-26 2018-02-01 コニカミノルタ株式会社 封止フィルム及び封止フィルムで封止された機能素子

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3996115A (en) * 1975-08-25 1976-12-07 Joseph W. Aidlin Process for forming an anodic oxide coating on metals
JPS5671821A (en) * 1979-11-14 1981-06-15 Hitachi Ltd Substrate for magnetic disc and its manufacture

Also Published As

Publication number Publication date
JPH0328397A (ja) 1991-02-06
EP0381512A3 (en) 1990-10-10
BR9000472A (pt) 1991-01-15
EP0381512A2 (en) 1990-08-08
NO900518D0 (no) 1990-02-02
AU4905790A (en) 1990-08-09

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