NO844811L - Dietylberyllium-dopemiddel/kilde for mocvd-dyrkede epitaksiale halvlederlag - Google Patents
Dietylberyllium-dopemiddel/kilde for mocvd-dyrkede epitaksiale halvlederlagInfo
- Publication number
- NO844811L NO844811L NO844811A NO844811A NO844811L NO 844811 L NO844811 L NO 844811L NO 844811 A NO844811 A NO 844811A NO 844811 A NO844811 A NO 844811A NO 844811 L NO844811 L NO 844811L
- Authority
- NO
- Norway
- Prior art keywords
- mocvd
- cultivated
- drugs
- leads
- source
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02612—Formation types
- H01L21/02617—Deposition types
- H01L21/0262—Reduction or decomposition of gaseous compounds, e.g. CVD
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/02521—Materials
- H01L21/02538—Group 13/15 materials
- H01L21/02546—Arsenides
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/0257—Doping during depositing
- H01L21/02573—Conductivity type
- H01L21/02579—P-type
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US48209183A | 1983-04-04 | 1983-04-04 | |
PCT/US1984/000399 WO1984003995A1 (en) | 1983-04-04 | 1984-03-15 | Diethylberyllium dopant source for mocvd grown epitaxial semiconductor layers |
Publications (3)
Publication Number | Publication Date |
---|---|
NO844811L true NO844811L (no) | 1984-12-03 |
NO163292B NO163292B (no) | 1990-01-22 |
NO163292C NO163292C (no) | 1990-05-02 |
Family
ID=26770168
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NO844811A NO163292C (no) | 1983-04-04 | 1984-12-03 | Fremgangsm te til avsetning av et epitaksialt lag alvledermateriale p et substrat. |
Country Status (2)
Country | Link |
---|---|
HK (1) | HK99888A (no) |
NO (1) | NO163292C (no) |
-
1984
- 1984-12-03 NO NO844811A patent/NO163292C/no unknown
-
1988
- 1988-12-08 HK HK99888A patent/HK99888A/xx unknown
Also Published As
Publication number | Publication date |
---|---|
NO163292C (no) | 1990-05-02 |
NO163292B (no) | 1990-01-22 |
HK99888A (en) | 1988-12-16 |
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