NO122302B - - Google Patents
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- Publication number
- NO122302B NO122302B NO0182/68A NO18268A NO122302B NO 122302 B NO122302 B NO 122302B NO 0182/68 A NO0182/68 A NO 0182/68A NO 18268 A NO18268 A NO 18268A NO 122302 B NO122302 B NO 122302B
- Authority
- NO
- Norway
- Prior art keywords
- absorption
- chlorosilanes
- gas mixture
- liquid
- sicl
- Prior art date
Links
- 238000010521 absorption reaction Methods 0.000 claims description 34
- 239000007789 gas Substances 0.000 claims description 26
- 238000000034 method Methods 0.000 claims description 25
- 239000000203 mixture Substances 0.000 claims description 25
- 239000007788 liquid Substances 0.000 claims description 20
- 239000005046 Chlorosilane Substances 0.000 claims description 18
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical class Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 claims description 18
- 230000002745 absorbent Effects 0.000 claims description 13
- 239000002250 absorbent Substances 0.000 claims description 13
- FYGHSUNMUKGBRK-UHFFFAOYSA-N 1,2,3-trimethylbenzene Chemical compound CC1=CC=CC(C)=C1C FYGHSUNMUKGBRK-UHFFFAOYSA-N 0.000 claims description 12
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 claims description 8
- 229910052739 hydrogen Inorganic materials 0.000 claims description 8
- 239000001257 hydrogen Substances 0.000 claims description 8
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 7
- 238000003795 desorption Methods 0.000 claims description 7
- UOHMMEJUHBCKEE-UHFFFAOYSA-N prehnitene Chemical compound CC1=CC=C(C)C(C)=C1C UOHMMEJUHBCKEE-UHFFFAOYSA-N 0.000 claims description 6
- -1 chlorosiloxanes Chemical class 0.000 claims description 5
- QHAHOIWVGZZELU-UHFFFAOYSA-N trichloro(trichlorosilyloxy)silane Chemical compound Cl[Si](Cl)(Cl)O[Si](Cl)(Cl)Cl QHAHOIWVGZZELU-UHFFFAOYSA-N 0.000 claims description 4
- 125000003118 aryl group Chemical group 0.000 claims description 3
- 238000009835 boiling Methods 0.000 claims description 3
- 239000003795 chemical substances by application Substances 0.000 claims description 3
- 239000012495 reaction gas Substances 0.000 claims description 2
- 230000001052 transient effect Effects 0.000 claims description 2
- CLXMTJZPFVPWAX-UHFFFAOYSA-N trichloro-[dichloro(trichlorosilyloxy)silyl]oxysilane Chemical compound Cl[Si](Cl)(Cl)O[Si](Cl)(Cl)O[Si](Cl)(Cl)Cl CLXMTJZPFVPWAX-UHFFFAOYSA-N 0.000 claims description 2
- 239000008096 xylene Substances 0.000 claims description 2
- JTJMJGYZQZDUJJ-UHFFFAOYSA-N phencyclidine Chemical class C1CCCCN1C1(C=2C=CC=CC=2)CCCCC1 JTJMJGYZQZDUJJ-UHFFFAOYSA-N 0.000 claims 1
- 239000011541 reaction mixture Substances 0.000 claims 1
- FDNAPBUWERUEDA-UHFFFAOYSA-N silicon tetrachloride Chemical class Cl[Si](Cl)(Cl)Cl FDNAPBUWERUEDA-UHFFFAOYSA-N 0.000 description 9
- 229910003822 SiHCl3 Inorganic materials 0.000 description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 5
- 238000001816 cooling Methods 0.000 description 5
- 238000000926 separation method Methods 0.000 description 4
- 125000001931 aliphatic group Chemical group 0.000 description 2
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 2
- 238000009833 condensation Methods 0.000 description 2
- 230000005494 condensation Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- 229910000519 Ferrosilicon Inorganic materials 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 238000005660 chlorination reaction Methods 0.000 description 1
- SLLGVCUQYRMELA-UHFFFAOYSA-N chlorosilicon Chemical compound Cl[Si] SLLGVCUQYRMELA-UHFFFAOYSA-N 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 239000002826 coolant Substances 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 125000000753 cycloalkyl group Chemical group 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 238000007700 distillative separation Methods 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 230000001698 pyrogenic effect Effects 0.000 description 1
- 238000005057 refrigeration Methods 0.000 description 1
- 239000000741 silica gel Substances 0.000 description 1
- 229910002027 silica gel Inorganic materials 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/08—Compounds containing halogen
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/46—Removing components of defined structure
- B01D53/68—Halogens or halogen compounds
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/04—Hydrides of silicon
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/08—Compounds containing halogen
- C01B33/107—Halogenated silanes
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/08—Compounds containing halogen
- C01B33/107—Halogenated silanes
- C01B33/1071—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Health & Medical Sciences (AREA)
- Biomedical Technology (AREA)
- Environmental & Geological Engineering (AREA)
- Analytical Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Silicon Compounds (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DED0052041 | 1967-01-18 |
Publications (1)
Publication Number | Publication Date |
---|---|
NO122302B true NO122302B (enrdf_load_html_response) | 1971-06-14 |
Family
ID=7053857
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NO0182/68A NO122302B (enrdf_load_html_response) | 1967-01-18 | 1968-01-16 |
Country Status (6)
Country | Link |
---|---|
US (1) | US3490203A (enrdf_load_html_response) |
JP (1) | JPS5030032B1 (enrdf_load_html_response) |
DE (1) | DE1667444C2 (enrdf_load_html_response) |
FR (1) | FR1573903A (enrdf_load_html_response) |
GB (1) | GB1181202A (enrdf_load_html_response) |
NO (1) | NO122302B (enrdf_load_html_response) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3139705C2 (de) * | 1981-10-06 | 1983-11-10 | Wacker-Chemitronic Gesellschaft für Elektronik-Grundstoffe mbH, 8263 Burghausen | Verfahren zur Aufarbeitung der bei der Siliciumabscheidung und der Siliciumtetrachlorid-Konvertierung anfallenden Restgase |
US4941893B1 (en) * | 1989-09-19 | 1996-07-30 | Advanced Silicon Materials Inc | Gas separation by semi-permeable membranes |
CN104016352B (zh) * | 2014-06-12 | 2016-05-18 | 国电内蒙古晶阳能源有限公司 | 处理多晶硅尾气的方法和系统 |
CN104555925A (zh) * | 2014-11-05 | 2015-04-29 | 华文蔚 | 一种三氯氢硅生产过程中尾气的回收利用方法 |
CN115744915B (zh) * | 2022-12-01 | 2024-01-23 | 华陆工程科技有限责任公司 | 一种氯硅烷液体的处理方法及处理装置 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2843458A (en) * | 1955-10-20 | 1958-07-15 | Cabot Godfrey L Inc | Process for producing silicon tetrachloride |
GB866002A (en) * | 1956-05-18 | 1961-04-26 | Laporte Titanium Ltd | Process for treating the residual gases in the manufacture of titanium tetrachloride |
US3021922A (en) * | 1958-07-29 | 1962-02-20 | Dow Chemical Co | Recovery and purification of boron trichloride |
-
1967
- 1967-01-18 DE DE1667444A patent/DE1667444C2/de not_active Expired
-
1968
- 1968-01-15 GB GB2118/68A patent/GB1181202A/en not_active Expired
- 1968-01-16 NO NO0182/68A patent/NO122302B/no unknown
- 1968-01-17 US US698418A patent/US3490203A/en not_active Expired - Lifetime
- 1968-01-18 JP JP43002853A patent/JPS5030032B1/ja active Pending
- 1968-01-19 FR FR1573903D patent/FR1573903A/fr not_active Expired
Also Published As
Publication number | Publication date |
---|---|
JPS5030032B1 (enrdf_load_html_response) | 1975-09-27 |
DE1667444B1 (de) | 1971-05-19 |
DE1667444C2 (de) | 1975-03-13 |
GB1181202A (en) | 1970-02-11 |
FR1573903A (enrdf_load_html_response) | 1969-07-11 |
US3490203A (en) | 1970-01-20 |
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