NO119958B - - Google Patents
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- Publication number
- NO119958B NO119958B NO17062067A NO17062067A NO119958B NO 119958 B NO119958 B NO 119958B NO 17062067 A NO17062067 A NO 17062067A NO 17062067 A NO17062067 A NO 17062067A NO 119958 B NO119958 B NO 119958B
- Authority
- NO
- Norway
- Prior art keywords
- niobium
- solvent
- tantalum
- chlorination
- pentachloride
- Prior art date
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- 239000010955 niobium Substances 0.000 claims description 41
- 229910052758 niobium Inorganic materials 0.000 claims description 38
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims description 38
- 229910052715 tantalum Inorganic materials 0.000 claims description 34
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 30
- 239000000203 mixture Substances 0.000 claims description 24
- 238000000034 method Methods 0.000 claims description 22
- RAHZWNYVWXNFOC-UHFFFAOYSA-N Sulphur dioxide Chemical compound O=S=O RAHZWNYVWXNFOC-UHFFFAOYSA-N 0.000 claims description 20
- 238000005660 chlorination reaction Methods 0.000 claims description 19
- 239000002904 solvent Substances 0.000 claims description 18
- OHZZTXYKLXZFSZ-UHFFFAOYSA-I manganese(3+) 5,10,15-tris(1-methylpyridin-1-ium-4-yl)-20-(1-methylpyridin-4-ylidene)porphyrin-22-ide pentachloride Chemical compound [Cl-].[Cl-].[Cl-].[Cl-].[Cl-].[Mn+3].C1=CN(C)C=CC1=C1C(C=C2)=NC2=C(C=2C=C[N+](C)=CC=2)C([N-]2)=CC=C2C(C=2C=C[N+](C)=CC=2)=C(C=C2)N=C2C(C=2C=C[N+](C)=CC=2)=C2N=C1C=C2 OHZZTXYKLXZFSZ-UHFFFAOYSA-I 0.000 claims description 8
- FYSNRJHAOHDILO-UHFFFAOYSA-N thionyl chloride Chemical compound ClS(Cl)=O FYSNRJHAOHDILO-UHFFFAOYSA-N 0.000 claims description 8
- 238000000605 extraction Methods 0.000 claims description 7
- YBBRCQOCSYXUOC-UHFFFAOYSA-N sulfuryl dichloride Chemical compound ClS(Cl)(=O)=O YBBRCQOCSYXUOC-UHFFFAOYSA-N 0.000 claims description 7
- RCJVRSBWZCNNQT-UHFFFAOYSA-N dichloridooxygen Chemical compound ClOCl RCJVRSBWZCNNQT-UHFFFAOYSA-N 0.000 claims description 6
- 229910052751 metal Inorganic materials 0.000 claims description 5
- 239000002184 metal Substances 0.000 claims description 5
- 150000002739 metals Chemical class 0.000 claims description 5
- 239000003245 coal Substances 0.000 claims description 4
- 239000007789 gas Substances 0.000 claims description 4
- 239000012442 inert solvent Substances 0.000 claims description 4
- 238000000926 separation method Methods 0.000 claims description 4
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims description 3
- 239000003049 inorganic solvent Substances 0.000 claims description 3
- 229910001867 inorganic solvent Inorganic materials 0.000 claims description 3
- 229910052717 sulfur Inorganic materials 0.000 claims description 3
- 239000011593 sulfur Substances 0.000 claims description 3
- 125000001931 aliphatic group Chemical group 0.000 claims description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 2
- 229910052760 oxygen Inorganic materials 0.000 claims description 2
- 239000001301 oxygen Substances 0.000 claims description 2
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 claims description 2
- RDHPKYGYEGBMSE-UHFFFAOYSA-N bromoethane Chemical compound CCBr RDHPKYGYEGBMSE-UHFFFAOYSA-N 0.000 claims 1
- 229910052736 halogen Inorganic materials 0.000 claims 1
- -1 molecular hydrogen halogen Chemical class 0.000 claims 1
- 229910000484 niobium oxide Inorganic materials 0.000 claims 1
- 229910001936 tantalum oxide Inorganic materials 0.000 claims 1
- 239000000284 extract Substances 0.000 description 13
- 150000001805 chlorine compounds Chemical class 0.000 description 10
- ZKATWMILCYLAPD-UHFFFAOYSA-N niobium pentoxide Inorganic materials O=[Nb](=O)O[Nb](=O)=O ZKATWMILCYLAPD-UHFFFAOYSA-N 0.000 description 7
- 239000000047 product Substances 0.000 description 7
- 239000000243 solution Substances 0.000 description 7
- 238000000859 sublimation Methods 0.000 description 7
- 230000008022 sublimation Effects 0.000 description 7
- PBCFLUZVCVVTBY-UHFFFAOYSA-N tantalum pentoxide Inorganic materials O=[Ta](=O)O[Ta](=O)=O PBCFLUZVCVVTBY-UHFFFAOYSA-N 0.000 description 5
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- 238000001704 evaporation Methods 0.000 description 4
- 230000008020 evaporation Effects 0.000 description 4
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 3
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 3
- 239000000460 chlorine Substances 0.000 description 3
- 229910052801 chlorine Inorganic materials 0.000 description 3
- 238000009833 condensation Methods 0.000 description 3
- 230000005494 condensation Effects 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 230000007062 hydrolysis Effects 0.000 description 3
- 238000006460 hydrolysis reaction Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- OEIMLTQPLAGXMX-UHFFFAOYSA-I tantalum(v) chloride Chemical class Cl[Ta](Cl)(Cl)(Cl)Cl OEIMLTQPLAGXMX-UHFFFAOYSA-I 0.000 description 3
- 229910052719 titanium Inorganic materials 0.000 description 3
- 239000010936 titanium Substances 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 2
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- 229910006124 SOCl2 Inorganic materials 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- 238000005119 centrifugation Methods 0.000 description 2
- 239000003638 chemical reducing agent Substances 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000010908 decantation Methods 0.000 description 2
- 230000007717 exclusion Effects 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- RHDUVDHGVHBHCL-UHFFFAOYSA-N niobium tantalum Chemical compound [Nb].[Ta] RHDUVDHGVHBHCL-UHFFFAOYSA-N 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- YHBDIEWMOMLKOO-UHFFFAOYSA-I pentachloroniobium Chemical compound Cl[Nb](Cl)(Cl)(Cl)Cl YHBDIEWMOMLKOO-UHFFFAOYSA-I 0.000 description 2
- 239000007858 starting material Substances 0.000 description 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 2
- 239000011135 tin Substances 0.000 description 2
- 229910052718 tin Inorganic materials 0.000 description 2
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 1
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 1
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 1
- YGYAWVDWMABLBF-UHFFFAOYSA-N Phosgene Chemical compound ClC(Cl)=O YGYAWVDWMABLBF-UHFFFAOYSA-N 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910021627 Tin(IV) chloride Inorganic materials 0.000 description 1
- XITGHTRVSNMXOD-UHFFFAOYSA-N [Nb].ClOCl Chemical compound [Nb].ClOCl XITGHTRVSNMXOD-UHFFFAOYSA-N 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 229910002091 carbon monoxide Inorganic materials 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- HRYZWHHZPQKTII-UHFFFAOYSA-N chloroethane Chemical compound CCCl HRYZWHHZPQKTII-UHFFFAOYSA-N 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 230000029087 digestion Effects 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- 229960003750 ethyl chloride Drugs 0.000 description 1
- 150000002222 fluorine compounds Chemical class 0.000 description 1
- 238000001640 fractional crystallisation Methods 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 230000026030 halogenation Effects 0.000 description 1
- 238000005658 halogenation reaction Methods 0.000 description 1
- 150000004677 hydrates Chemical class 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 239000011572 manganese Substances 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 229930014626 natural product Natural products 0.000 description 1
- VUWVDWMFBFJOCE-UHFFFAOYSA-N niobium(5+);oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Nb+5].[Ta+5] VUWVDWMFBFJOCE-UHFFFAOYSA-N 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- XSHBHNKPJPTEJR-UHFFFAOYSA-N oxoniobium;trihydrochloride Chemical compound Cl.Cl.Cl.[Nb]=O XSHBHNKPJPTEJR-UHFFFAOYSA-N 0.000 description 1
- FAIAAWCVCHQXDN-UHFFFAOYSA-N phosphorus trichloride Chemical compound ClP(Cl)Cl FAIAAWCVCHQXDN-UHFFFAOYSA-N 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 239000012495 reaction gas Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000005049 silicon tetrachloride Substances 0.000 description 1
- 239000002893 slag Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000011877 solvent mixture Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- HPGGPRDJHPYFRM-UHFFFAOYSA-J tin(iv) chloride Chemical compound Cl[Sn](Cl)(Cl)Cl HPGGPRDJHPYFRM-UHFFFAOYSA-J 0.000 description 1
Classifications
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16D—COUPLINGS FOR TRANSMITTING ROTATION; CLUTCHES; BRAKES
- F16D69/00—Friction linings; Attachment thereof; Selection of coacting friction substances or surfaces
- F16D69/02—Composition of linings ; Methods of manufacturing
- F16D69/027—Compositions based on metals or inorganic oxides
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22D—CASTING OF METALS; CASTING OF OTHER SUBSTANCES BY THE SAME PROCESSES OR DEVICES
- B22D25/00—Special casting characterised by the nature of the product
- B22D25/06—Special casting characterised by the nature of the product by its physical properties
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L23/00—Compositions of homopolymers or copolymers of unsaturated aliphatic hydrocarbons having only one carbon-to-carbon double bond; Compositions of derivatives of such polymers
- C08L23/02—Compositions of homopolymers or copolymers of unsaturated aliphatic hydrocarbons having only one carbon-to-carbon double bond; Compositions of derivatives of such polymers not modified by chemical after-treatment
- C08L23/04—Homopolymers or copolymers of ethene
- C08L23/06—Polyethene
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16D—COUPLINGS FOR TRANSMITTING ROTATION; CLUTCHES; BRAKES
- F16D65/00—Parts or details
- F16D65/02—Braking members; Mounting thereof
- F16D65/12—Discs; Drums for disc brakes
- F16D65/125—Discs; Drums for disc brakes characterised by the material used for the disc body
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16D—COUPLINGS FOR TRANSMITTING ROTATION; CLUTCHES; BRAKES
- F16D65/00—Parts or details
- F16D65/02—Braking members; Mounting thereof
- F16D65/12—Discs; Drums for disc brakes
- F16D65/128—Discs; Drums for disc brakes characterised by means for cooling
Landscapes
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Braking Arrangements (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
Description
Fremgangsmåte til adskillelse av niob og tantal. Process for the separation of niobium and tantalum.
Som bekjent er begge de kjemisk beslek-tede metaller tantal og niob (i enkelte land også kalt columbium), som i naturen for det meste forekommer sammen, meget vanskelige å skille fra hverandre. As you know, both the chemically related metals tantalum and niobium (in some countries also called columbium), which in nature mostly occur together, are very difficult to separate from each other.
Såvidt det er kjent arbeider teknikken i det vesentlige ennå ifølge fremgangsmåter som 1 prinsippet tilbakeføres på Marignac (1865). Den Marignac'ske fremgangsmåte beror på fraksjonert krystallisasjon av alkalidobbelfluo-rider, idet det tungt oppløselige K2TaF7 kan skilles fra den K2NbOF6-holdige oppløsning. Hovedulempen ved denne fremgangsmåte består i nødvendigheten av å operere med flussyre. As far as is known, the technique essentially still works according to methods which 1 principle can be traced back to Marignac (1865). The Marignac method is based on fractional crystallization of alkali double fluorides, as the poorly soluble K2TaF7 can be separated from the K2NbOF6-containing solution. The main disadvantage of this method is the necessity to operate with hydrofluoric acid.
Den i det franske patent nr. 973 896 be-skrevne selektive klorering av materialer, som inneholder niob og tantal i oksydert form, arbeider i fravær av reduserende gasser, men ved meget høye temperaturer (ca. 1200°), mens adskillelsen ved nitridbehandling og etter-følgende halogenering ifølge amerikansk patent nr. 2 427 360, samt ifølge det amerikanske patent nr. 2 443 254, som først selektivt redu-serer niobdelen ved 600 til 1200° og deretter klorerer, endog forlanger høytemperaturpro-sesser. The selective chlorination of materials, which contain niobium and tantalum in oxidized form, described in French patent no. 973,896, works in the absence of reducing gases, but at very high temperatures (approx. 1200°), while the separation by nitride treatment and subsequent halogenation according to US Patent No. 2,427,360, as well as according to US Patent No. 2,443,254, which first selectively reduces the niobium portion at 600 to 1200° and then chlorinates, even requiring high temperature processes.
Adskillelsen ifølge amerikansk patent nr. The separation according to US patent no.
2 537 316 beror på reduksjon av ledsagerelementer fra de ved oppslutning av malmer med f. eks. svovelsyre erholdte mer eller mindre kolloidale oppløsninger eller suspensjoner og etterfølgende selektiv hydrolyse, idet de redu-serte ledsagerelementer forblir i oppløsning. Det opereres derfor med meget ustabile oppløsninger, idet det til oppslutningen med svovelsyre er langvarig..f Sluttelig er arbeidsbetingelsene ved kalium- 2 537 316 is due to the reduction of companion elements from those when ores are mixed with e.g. sulfuric acid obtained more or less colloidal solutions or suspensions and subsequent selective hydrolysis, the reduced companion elements remaining in solution. It is therefore operated with very unstable solutions, as the digestion with sulfuric acid takes a long time. Finally, the working conditions for potassium
oksalathydrolyse ifølge det amerikanske patent nr. 2 481 584 meget vanskelige å opprettholde. oxalate hydrolysis according to US Patent No. 2,481,584 very difficult to maintain.
Det ble nå funnet at man fordelaktig kan skille niob og tantal fra hverandre når man overfører materialer som inneholder niob og tantal i oksydert form, f. eks. slagger og særlig konsentrater og malmer, som for anrikning eventuelt ble etterbehandlet, henholdsvis oksyd-blandinger av disse metaller med klorgass og et reduksjonsmiddel til en kloreringsblanding således at denne inneholder niob overveiende eller utelukkende som oksyklorid og tantal som pentaklorid og fjerner pentakloridene fra denne blanding ved ekstraksjon ved hjelp av et inert oppløsningsmiddel under utelukkelse av fuktighet. It was now found that niobium and tantalum can advantageously be separated from each other when transferring materials containing niobium and tantalum in oxidized form, e.g. slag and in particular concentrates and ores, which were possibly post-treated for enrichment, respectively oxide mixtures of these metals with chlorine gas and a reducing agent to a chlorination mixture such that this contains niobium predominantly or exclusively as oxychloride and tantalum as pentachloride and removes the pentachlorides from this mixture by extraction using an inert solvent under the exclusion of moisture.
Som utgangsstoff for den foreliggende fremgangsmåte kan de blandinger som vanlig-vis foreligger i teknikken med innhold av oksyder av niob og tantal eller også naturproduktene som inneholder begge elementer for det meste i form av deres oksyder benyttes. As starting material for the present method, the mixtures which are usually available in the technique containing oxides of niobium and tantalum or also the natural products which contain both elements mostly in the form of their oxides can be used.
Man kommer til de kloreringsblandinger som skal skilles ifølge foreliggende fremgangsmåte og som inneholder tantal, for størstedelen som pentaklorid (TaCl6), og niob for største-delen som oksyklorid etter i og for seg kjente fremgangsmåter, f. eks. ved hjelp av klorering av en blanding av oksydene av niob og tantal med klorgass og et reduksjonsmiddel, slik som kull ved 400 til 1000° i en sjakt- eller rørovn. For å få niob overveiende eller utelukkende som oksyklorid, tantal overveiende eller utelukkende som pentaklorid, må det unngås at det inntrer en etterreaksjon av kloreringspro-duktene. De dampformede kloreringsprodukter lar man derfor i mest mulig kort tid, dvs. høyst noen sekunder ved forhøyet temperatur komme i berøring med hverandre og kloreringsavgas-sene, som kan inneholde kullstoffmonoksyd og klor. Dette oppnås f. eks. ved fortynning med fremmedgasser, f. eks. ved hjelp av kloridfri reaksjonsgass som ledes tilbake eller, idet man velger ledningen mellom klorerer og kondenser kortest mulig, henholdsvis velger dens tverr-snitt minst mulig. One arrives at the chlorination mixtures which are to be separated according to the present method and which contain tantalum, for the most part as pentachloride (TaCl6), and niobium for the most part as oxychloride according to methods known per se, e.g. by chlorination of a mixture of the oxides of niobium and tantalum with chlorine gas and a reducing agent, such as coal at 400 to 1000° in a shaft or tube furnace. In order to obtain niobium predominantly or exclusively as oxychloride, tantalum predominantly or exclusively as pentachloride, it must be avoided that an after-reaction of the chlorination products occurs. The vaporized chlorination products are therefore allowed to come into contact with each other and the chlorination exhaust gases, which may contain carbon monoxide and chlorine, for the shortest possible time, i.e. no more than a few seconds at an elevated temperature. This is achieved e.g. by dilution with foreign gases, e.g. by means of chloride-free reaction gas which is led back or, by choosing the line between chlorinator and condenser as short as possible, respectively choosing its cross-section as small as possible.
På grunn av niobs tendens til dannelse av oksyklorider, kan det ifølge denne fremgangsmåte fås en kloreringsblanding som inneholder niob overveiende eller bare som oksyklorid og tantal som pentaklorid. Due to niobium's tendency to form oxychlorides, according to this method a chlorination mixture containing niobium predominantly or only as oxychloride and tantalum as pentachloride can be obtained.
De ved kloreringen eventuelt dannede klorider av, eventuelt ved siden av niob og tantal i utgangsmaterialene tilstedeværende elementer, hvis forbindelser forøvrig er til stede som forurensninger, slik som f. eks. kloridene av elementene titan, tinn, mangan osv., lar seg fjerne på enkel måte; idet f. eks. temperatur i klorerings- og kondensasjonsrommet for kloridene av niob og tantal er innstilt således at kloridene av ledsagerelementene, hvis koke-, henholdsvis forflyktigelsespunkter for det meste er meget forskjellige fra disse for niob og tantal-klorider vidtgående skilles fra de siste. Således kan f. eks. det tungtflyktige klorid av mangan skilles fra først, mens de lettere flyktige klorider f. eks. slike for silisium, tinn og av titan, slår seg ned først etter at de niob og tantal-holdige kloreringsblandinger som skal skilles ifølge foreliggende fremgangsmåte er kondensert, f. eks. på lavere temperatur liggende kondensasjonsrom. The chlorides possibly formed during the chlorination of elements present next to niobium and tantalum in the starting materials, whose compounds are otherwise present as impurities, such as e.g. the chlorides of the elements titanium, tin, manganese, etc., can be easily removed; since e.g. temperature in the chlorination and condensation room for the chlorides of niobium and tantalum is set so that the chlorides of the companion elements, whose boiling and volatilization points are mostly very different from those for niobium and tantalum chlorides, are widely separated from the latter. Thus, e.g. the highly volatile chloride of manganese is separated from first, while the more volatile chlorides, e.g. those for silicon, tin and titanium, settle down only after the niobium- and tantalum-containing chlorination mixtures to be separated according to the present method have been condensed, e.g. at a lower temperature lying condensation room.
Blandinger av tantalpentaklorid og niob-oksyklorid som skal skilles ifølge oppfinnelsen, kan likeledes fås ved selektiv hydrolyse (f. eks. ved hjelp av vanndamp eller ved hjelp av oksydhydrater) av en niobpentaklorid og tan-talpentakloridholdig blanding, eller også ved selektiv oksydasjon av lettere oksyderbare niobpentaklorid fra en slik pentakloridblanding., Mixtures of tantalum pentachloride and niobium oxychloride to be separated according to the invention can likewise be obtained by selective hydrolysis (e.g. with the help of steam or with the help of oxide hydrates) of a mixture containing niobium pentachloride and tantalum pentachloride, or also by selective oxidation of lighter oxidizable niobium pentachloride from such a pentachloride mixture.,
Ekstraksjonen ifølge oppfinnelsen av de således erholdte blandinger hvori tantal overveiende eller bare inneholdes som pentaklorid og niob som oksyklorid foretas ved hjelp av et inert oppløsningsmiddel under utelukkelse av fuktighet. Derunder er å forstå både ensartede oppløsningsmidler som oppløsningsmiddelbland-inger som er indifferente like overfor kloridene av niob og tantal, dvs. ikke kan reagere med disse klorider. Som sådanne kommer både organiske og anorganiske oppløsningsmidler i betraktning. Som organiske oppløsningsmidler skal nevnes alifatiske eller aromatiske, fortrinns-vis halogenerte forbindelser slik som brom eller kloretan, mens blant de anorganiske oppløs-ningsmidler har titan- og silisiumtetraklorid, tinntetraklorid, fosfortriklorid, fosgen, tetra-klorkullstoff, særlig svovel og surstoffholdige oppløsningsmidler slik som tionylklorid, sulfurylklorid og fremfor alt svoveldioksyd vist seg å være verdifulle. The extraction according to the invention of the thus obtained mixtures in which tantalum is predominantly or only contained as pentachloride and niobium as oxychloride is carried out with the aid of an inert solvent while excluding moisture. This means both uniform solvents and solvent mixtures which are equally indifferent to the chlorides of niobium and tantalum, i.e. cannot react with these chlorides. As such, both organic and inorganic solvents come into consideration. Organic solvents include aliphatic or aromatic, preferably halogenated compounds such as bromine or chloroethane, while inorganic solvents include titanium and silicon tetrachloride, tin tetrachloride, phosphorus trichloride, phosgene, carbon tetrachloride, especially sulfur and oxygen-containing solvents such as thionyl chloride, sulfuryl chloride and, above all, sulfur dioxide have proved valuable.
Ekstraksjonen kan foretas således at man behandler de nevnte kloreringsblandinger i fravær av fuktighet med et inert oppløsnings-middel eller med en blanding av slike oppløs-ningsmidler en eller flere ganger og skiller den hovedsakelig pentakloridholdige oppløsning fra faste stoffer. The extraction can be carried out in such a way that the aforementioned chlorination mixtures are treated in the absence of moisture with an inert solvent or with a mixture of such solvents one or more times and the mainly pentachloride-containing solution is separated from solids.
Behandlingen av de nevnte blandinger av klorforbindelser av niob og tantal med de angitte oppløsningsmidler kan utføres etter i og for seg kjente fremgangsmåter, f. eks. ved normaltrykk og romtemperatur eller ved for-høyet temperatur, f. eks. ved kokepunktet for det anvendte oppløsningsmiddel, porsjonsvis eller kontinuerlig. I disse tilfelle vil det være nødvendig å arbeide under trykk. Således kan man for eksempel behandle den blanding som skal skilles med svoveldioksyd ved romtemperatur og et trykk som tilsvarer damptrykket for S02, f. eks. i et blande- eller male-apparat eller kontinuerlig i motstrøm. The treatment of the aforementioned mixtures of chlorine compounds of niobium and tantalum with the stated solvents can be carried out according to methods known per se, e.g. at normal pressure and room temperature or at elevated temperature, e.g. at the boiling point of the solvent used, batchwise or continuously. In these cases, it will be necessary to work under pressure. Thus, for example, the mixture to be separated can be treated with sulfur dioxide at room temperature and a pressure corresponding to the vapor pressure of SO2, e.g. in a mixing or grinding apparatus or continuously in countercurrent.
Etter foregått ekstraksjon kan de ekstra-herte klorider gjenvinnes og videre forarbeides fra oppløsningsmiddel på kjent måte, f. eks. ved avdestillering av oppløsningsmidlet ved ut-felling og filtrering eller ved avkjøling og ut-krystallisering. Bunnfallet kan f. eks. renses videre ved sublimering. Selvfølgelig kan det regenererte oppløsningsmiddel etter fjernelse av deri oppløste klorider anvendes for videre ekstraksjoner. After extraction, the extra-hardened chlorides can be recovered and further processed from solvent in a known manner, e.g. by distilling off the solvent by precipitation and filtration or by cooling and crystallization. The precipitate can e.g. is further purified by sublimation. Of course, the regenerated solvent after removal of dissolved chlorides can be used for further extractions.
Ifølge foreliggende fremgangsmåte kan blandinger som inneholder niob og tantaler som er vanskelige å skille oppdeles i fraksjoner av hvilke den ene hovedsakelig inneholder tantal og den andre niob. According to the present method, mixtures containing niobium and tantalums which are difficult to separate can be divided into fractions, one of which mainly contains tantalum and the other niobium.
I de følgende eksempler betyr delene, så-fremt intet annet angis, vektsdeler, prosenter, vektsprosenter, og temperaturene er angitt i Celsius-grader. In the following examples, unless otherwise stated, the parts mean parts by weight, percentages, percentages by weight, and the temperatures are given in degrees Celsius.
Eksempel 1. Example 1.
Briketter som består av 30 % sukkerkull og hver 35 % niob- og tantalpentoksyd, ble klorert i klorstrøm ved 1000° og de flyktige kloreringsprodukter ble utskilt ved rask av-kjøling i et luftkjølt kondensasjonsrom. Briquettes consisting of 30% sugar coal and each 35% niobium and tantalum pentoxide were chlorinated in a chlorine stream at 1000° and the volatile chlorination products were separated by rapid cooling in an air-cooled condensation chamber.
2,5 deler av det erholdte kloreringsprodukt, som var finpulverisert under utelukkelse av fuktighet, ekstraheres under et trykk som tilsvarer damptrykket for svoveldioksyd 3 ganger med ca. 30 deler flytende svoveldioksyd, dvs. inntil ekstraktet ikke inneholdt nevneverdige mengder klorid. De tre ekstrakter befris separat for oppløsningsmidlet ved avdampning. 2.5 parts of the obtained chlorination product, which was finely pulverized while excluding moisture, is extracted under a pressure corresponding to the vapor pressure of sulfur dioxide 3 times with approx. 30 parts liquid sulfur dioxide, i.e. until the extract did not contain significant amounts of chloride. The three extracts are freed separately from the solvent by evaporation.
Det første ekstrakt, som inneholdt 90 % av det ekstraherbare stoff (= ca. 1,05 deler), ble analysert på innholdet av niob og tantal. Det inneholdt 22,8 % niob og 77,2 % tantal (beregnet på Nb205 henholdsvis Ta205). The first extract, which contained 90% of the extractable substance (= approx. 1.05 parts), was analyzed for the content of niobium and tantalum. It contained 22.8% niobium and 77.2% tantalum (calculated on Nb205 and Ta205 respectively).
Den i svoveldioksyd uoppløselige rest (1,35 deler) ble oppdelt ved sublimering i vakuum (ved 0,1 mm Hg) i en sublimasjonsrest Rs og et sublimat S, og de to fraksjoner ble igjen analysert på niob og tantal. The sulfur dioxide-insoluble residue (1.35 parts) was divided by sublimation in vacuum (at 0.1 mm Hg) into a sublimation residue Rs and a sublimate S, and the two fractions were again analyzed for niobium and tantalum.
Således får man altså tre fraksjoner, av hvilke to, ekstrakten og sublimasjonsresten, inneholder hovedsakelig tantal, den tredje, sublimatet fra ekstraksjonsresten, inneholder hovedsakelig niob. Thus, three fractions are obtained, of which two, the extract and the sublimation residue, contain mainly tantalum, the third, the sublimate from the extraction residue, contains mainly niobium.
Eksempel 2. Example 2.
En blanding av 25 % sukkerkull og 75 % niob-tantal-pentoksyd med pentoksydet i for-hold 1 : 1 ble klorert ved 550 henholdsvis 600 henholdsvis 1000° i klorstrøm, og de flyktige produkter ble utskilt ved rask avkjøling i en luftkjølt kondensator. 10 deler av det således erholdte produkt ble finpulverisert under utelukkelse av fuktighet og ble ekstrahert tre ganger under et trykk som tilsvarte svoveldioksydets damptrykk med ca. 100 deler flytende S02, . idet ekstraktet tredje gang ikke lenger inneholdt nevneverdige mengder 'oppløst stoff; Ekstraktene ble befridd for oppløsningsmidlet ved avdampning. A mixture of 25% sugar coal and 75% niobium tantalum pentoxide with the pentoxide in a 1:1 ratio was chlorinated at 550, 600, and 1000° in chlorine current, and the volatile products were separated by rapid cooling in an air-cooled condenser. 10 parts of the thus obtained product were finely pulverized while excluding moisture and were extracted three times under a pressure which corresponded to the vapor pressure of the sulfur dioxide by approx. 100 parts liquid S02, . the third time the extract no longer contained significant amounts of 'dissolved matter'; The extracts were freed from the solvent by evaporation.
De forenede ekstrakter som inneholdt X % The combined extracts containing X %
(se tabell 1) av det i opprinnelig kloreringsprodukt inneholdte niob og tantal (beregnet som oksyder), ble analysert på forholdet mellom niob og tantal (beregnet som oksyd). De viste et innhold på a % Nb205 og b % Ta205 (se tabell 1). (see table 1) of the niobium and tantalum contained in the original chlorination product (calculated as oxides), was analyzed for the ratio between niobium and tantalum (calculated as oxide). They showed a content of a% Nb2O5 and b% Ta2O5 (see Table 1).
Den i S02 uoppløselige rest (inneholdende Y og Z % av de i den opprinnelige kloreringsblanding forhåndenværende metaller) ble ved sublimering i vakuum (ved 0,1 mm Hg) oppdelt i en sublimasjonsrest Rs og et sublimat og de to fraksjoner ble igjen analysert på niob og tantal. Sublimatet S, som inneholdt Y % av niob og tantal (beregnet som oksyder) oppviste et innhold av a % Nb205 og b % Ta205, sublimasjonsresten Rs, inneholdende Z % av niob og tantal, et slikt for a % Nb205 og b % Ta205 (se tabell 1). The SO2-insoluble residue (containing Y and Z% of the metals present in the original chlorination mixture) was divided by sublimation in vacuum (at 0.1 mm Hg) into a sublimation residue Rs and a sublimate and the two fractions were again analyzed for niobium and tantalum. The sublimate S, which contained Y% of niobium and tantalum (calculated as oxides) showed a content of a% Nb205 and b% Ta205, the sublimation residue Rs, containing Z% of niobium and tantalum, such for a% Nb205 and b% Ta205 ( see table 1).
Eksempel 3. Example 3.
1 del av en niob-tantal-blanding som er finpulverisert under utelukkelse av fuktighet og som består av ca. 43 % niob (beregnet som Nb205) og ca. 57 % tantal (beregnet som Ta2Or)) og som inneholder niob som NbOCl;j og tantal som TaCl6, ble ekstrahert så lenge med 5 deler sulfurylklorid (S02C12) at ekstraktet ikke inneholdt noen nevneverdige mengder av det ekstra-herte stoff (dvs. 7 ganger med hver gang 5 deler S02C12). Resten ble skilt fra oppløsningen ved sentrifugering og dekantering og ekstraktene befridd for sulfurylklorid ved avdampning. 1 part of a niobium-tantalum mixture which is finely pulverized while excluding moisture and which consists of approx. 43% niobium (calculated as Nb205) and approx. 57% tantalum (calculated as Ta2Or)) and containing niobium as NbOCl;j and tantalum as TaCl6, was extracted with 5 parts of sulphuryl chloride (S02C12) until the extract contained no appreciable amount of the extra-hardened material (i.e. 7 times with each time 5 parts S02C12). The residue was separated from the solution by centrifugation and decantation and the extracts freed from sulphuryl chloride by evaporation.
De således fremstilte ekstrakter inneholdt The extracts thus prepared contained
tilsammen 60 % (beregnet som oksyder) av de metaller som var tilstede i utgangsblandingen, hvorav 93 % Ta og 7 % niob, mens den i S02C12 ikke oppløste rest oppviste 98 % Nb og 2 % Ta. a total of 60% (calculated as oxides) of the metals present in the starting mixture, of which 93% Ta and 7% niobium, while the residue not dissolved in S02C12 showed 98% Nb and 2% Ta.
Eksempel J/. Example J/.
En del av en blanding av NbOCl3 og TaCl6 som var finpulverisert under utelukkelse av fuktighet ble ekstrahert med 10 deler S02, henholdsvis 3 ganger med hver gang 5 deler SOCl2, henholdsvis 3 ganger med 5 deler C2H6Br, resten ble skilt fra oppløsningen (ved filtrering i tilfelle med S02, ved sentrifugering A part of a mixture of NbOCl3 and TaCl6 that was finely powdered under the exclusion of moisture was extracted with 10 parts of SO2, respectively 3 times with each time 5 parts of SOCl2, respectively 3 times with 5 parts of C2H6Br, the residue was separated from the solution (by filtering in case with S02, by centrifugation
Og dekantering ved SOCl2, C2H6Br) og ekstraktene befridd for oppløsningsmiddel ved And decantation by SOCl2, C2H6Br) and the extracts freed from solvent by
avdampning. evaporation.
Både ekstraktet og resten ble deretter Both the extract and the residue were then
analysert på deres innhold av Nb og Ta> (bereg- analyzed for their content of Nb and Ta> (calculated
net som oksyd). Innholdet samt de i ekstraktene og restene inneholdte deler av det opprinnelig anvendte Nb og Ta (beregnet som oksyder) er angitt i tabell 2. net as oxide). The content as well as the parts of the originally used Nb and Ta (calculated as oxides) contained in the extracts and residues are given in table 2.
Claims (8)
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DEB89931A DE1259515B (en) | 1966-11-22 | 1966-11-22 | One-piece brake discs |
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CH (1) | CH481698A (en) |
DE (1) | DE1259515B (en) |
DK (1) | DK116682B (en) |
ES (1) | ES345584A1 (en) |
GB (1) | GB1193323A (en) |
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1967
- 1967-09-04 CH CH1233367A patent/CH481698A/en unknown
- 1967-09-15 GB GB4213867A patent/GB1193323A/en not_active Expired
- 1967-09-29 ES ES345584A patent/ES345584A1/en not_active Expired
- 1967-10-03 AT AT895667A patent/AT285071B/en not_active IP Right Cessation
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DE1259515B (en) | 1968-01-25 |
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SE322022B (en) | 1970-03-23 |
AT285071B (en) | 1970-10-12 |
NL6715003A (en) | 1968-05-24 |
GB1193323A (en) | 1970-05-28 |
BE705489A (en) | 1968-03-01 |
CH481698A (en) | 1969-11-30 |
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