NL96545C - - Google Patents
Info
- Publication number
- NL96545C NL96545C NL96545DA NL96545C NL 96545 C NL96545 C NL 96545C NL 96545D A NL96545D A NL 96545DA NL 96545 C NL96545 C NL 96545C
- Authority
- NL
- Netherlands
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Printing Plates And Materials Therefor (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE330856X | 1954-03-12 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL96545C true NL96545C (US08124317-20120228-C00026.png) | 1900-01-01 |
Family
ID=6193104
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL96545D NL96545C (US08124317-20120228-C00026.png) | 1954-03-12 | ||
| NL195002D NL195002A (US08124317-20120228-C00026.png) | 1954-03-12 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL195002D NL195002A (US08124317-20120228-C00026.png) | 1954-03-12 |
Country Status (7)
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3169868A (en) * | 1962-04-16 | 1965-02-16 | Eastman Kodak Co | Light sensitive photoresist composition |
| DE2718130C2 (de) * | 1977-04-23 | 1979-05-17 | Du Pont De Nemours (Deutschland) Gmbh, 4000 Duesseldorf | lichtempfindliches Aufzeichnungsmaterial |
| JPH0766189B2 (ja) * | 1986-09-26 | 1995-07-19 | 住友化学工業株式会社 | レジスト材料 |
| JP3909818B2 (ja) * | 2001-11-12 | 2007-04-25 | 富士フイルム株式会社 | ポジ型レジスト組成物 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL78723C (US08124317-20120228-C00026.png) * | 1949-07-23 | |||
| DE901129C (de) * | 1951-07-17 | 1954-01-07 | Kalle & Co Ag | Lichtempfindliches Material fuer die photomechanische Bilderzeugung |
| DE901500C (de) * | 1951-08-08 | 1954-01-11 | Kalle & Co Ag | Lichtempfindliche Schichten auf Material zur photomechanischen Reproduktion |
| DE903529C (de) * | 1951-09-01 | 1954-02-08 | Kalle & Co Ag | Lichtempfindliche Schichten |
-
0
- NL NL96545D patent/NL96545C/xx active
- BE BE536014D patent/BE536014A/xx unknown
- NL NL195002D patent/NL195002A/xx unknown
-
1954
- 1954-03-13 DE DEK21457A patent/DE947852C/de not_active Expired
-
1955
- 1955-02-10 CH CH330856D patent/CH330856A/de unknown
- 1955-02-23 FR FR1119536D patent/FR1119536A/fr not_active Expired
- 1955-03-04 GB GB6519/55A patent/GB765020A/en not_active Expired
- 1955-03-10 US US493557A patent/US2859111A/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| BE536014A (US08124317-20120228-C00026.png) | 1900-01-01 |
| GB765020A (en) | 1957-01-02 |
| US2859111A (en) | 1958-11-04 |
| DE947852C (de) | 1956-08-23 |
| NL195002A (US08124317-20120228-C00026.png) | 1900-01-01 |
| CH330856A (de) | 1958-06-30 |
| FR1119536A (fr) | 1956-06-21 |
