NL84273C - - Google Patents
Info
- Publication number
- NL84273C NL84273C NL84273DA NL84273C NL 84273 C NL84273 C NL 84273C NL 84273D A NL84273D A NL 84273DA NL 84273 C NL84273 C NL 84273C
- Authority
- NL
- Netherlands
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F5/00—Screening processes; Screens therefor
- G03F5/20—Screening processes; Screens therefor using screens for gravure printing
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Printing Plates And Materials Therefor (AREA)
- Manufacture Or Reproduction Of Printing Formes (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DEK15835A DE934864C (de) | 1952-10-17 | 1952-10-17 | Verfahren zur Herstellung von Druckformen fuer den Rakeltiefdruck |
| US38560953A | 1953-10-12 | 1953-10-12 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL84273C true NL84273C (cg-RX-API-DMAC7.html) |
Family
ID=25982926
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NLAANVRAGE7408136,A NL182100B (nl) | 1952-10-17 | Inrichting voor het foto-elektrisch bepalen van de plaats van ten minste een scherptevlak van een beeld binnen een optische inrichting. | |
| NL84273D NL84273C (cg-RX-API-DMAC7.html) | 1952-10-17 |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NLAANVRAGE7408136,A NL182100B (nl) | 1952-10-17 | Inrichting voor het foto-elektrisch bepalen van de plaats van ten minste een scherptevlak van een beeld binnen een optische inrichting. |
Country Status (5)
| Country | Link |
|---|---|
| BE (1) | BE523562A (cg-RX-API-DMAC7.html) |
| CH (1) | CH319960A (cg-RX-API-DMAC7.html) |
| DE (1) | DE934864C (cg-RX-API-DMAC7.html) |
| GB (1) | GB744954A (cg-RX-API-DMAC7.html) |
| NL (2) | NL84273C (cg-RX-API-DMAC7.html) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2061287C3 (de) * | 1970-12-12 | 1981-07-23 | Basf Ag, 6700 Ludwigshafen | Verfahren zur Herstellung von tiefenvariablen Tiefdruckformen |
-
0
- NL NLAANVRAGE7408136,A patent/NL182100B/xx unknown
- NL NL84273D patent/NL84273C/xx active
- BE BE523562D patent/BE523562A/xx unknown
-
1952
- 1952-10-17 DE DEK15835A patent/DE934864C/de not_active Expired
-
1953
- 1953-10-14 GB GB2832353A patent/GB744954A/en not_active Expired
-
1954
- 1954-03-18 CH CH319960D patent/CH319960A/de unknown
Also Published As
| Publication number | Publication date |
|---|---|
| NL182100B (nl) | |
| BE523562A (cg-RX-API-DMAC7.html) | |
| GB744954A (en) | 1956-02-15 |
| CH319960A (de) | 1957-03-15 |
| DE934864C (de) | 1955-11-03 |