NL8102149A - Werkwijze en inrichting voor de inwendige bedekking van een buis door reactieve afscheiding uit een gasmengsel onder invloed van een plasma. - Google Patents

Werkwijze en inrichting voor de inwendige bedekking van een buis door reactieve afscheiding uit een gasmengsel onder invloed van een plasma. Download PDF

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Publication number
NL8102149A
NL8102149A NL8102149A NL8102149A NL8102149A NL 8102149 A NL8102149 A NL 8102149A NL 8102149 A NL8102149 A NL 8102149A NL 8102149 A NL8102149 A NL 8102149A NL 8102149 A NL8102149 A NL 8102149A
Authority
NL
Netherlands
Prior art keywords
tube
plasma
burners
gas
flames
Prior art date
Application number
NL8102149A
Other languages
English (en)
Dutch (nl)
Original Assignee
Philips Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Nv filed Critical Philips Nv
Priority to NL8102149A priority Critical patent/NL8102149A/nl
Priority to DE8282200486T priority patent/DE3263356D1/de
Priority to US06/371,093 priority patent/US4405655A/en
Priority to EP82200486A priority patent/EP0064785B1/de
Priority to CA000401982A priority patent/CA1178553A/en
Priority to JP57071604A priority patent/JPS57190667A/ja
Publication of NL8102149A publication Critical patent/NL8102149A/nl

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
    • C23C16/507—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using external electrodes, e.g. in tunnel type reactors
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01—Manufacture of glass fibres or filaments
    • C03B37/012—Manufacture of preforms for drawing fibres or filaments
    • C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
    • C03B37/018—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD] by glass deposition on a glass substrate, e.g. by inside-, modified-, plasma-, or plasma modified- chemical vapour deposition [ICVD, MCVD, PCVD, PMCVD], i.e. by thin layer coating on the inside or outside of a glass tube or on a glass rod
    • C03B37/01807—Reactant delivery systems, e.g. reactant deposition burners
    • C03B37/01815—Reactant deposition burners or deposition heating means
    • C03B37/01823—Plasma deposition burners or heating means
    • C03B37/0183—Plasma deposition burners or heating means for plasma within a tube substrate
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/04—Coating on selected surface areas, e.g. using masks
    • C23C16/045—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Plasma & Fusion (AREA)
  • Physics & Mathematics (AREA)
  • Metallurgy (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Manufacturing & Machinery (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Manufacture, Treatment Of Glass Fibers (AREA)
  • Chemical Vapour Deposition (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Coating Apparatus (AREA)
NL8102149A 1981-05-01 1981-05-01 Werkwijze en inrichting voor de inwendige bedekking van een buis door reactieve afscheiding uit een gasmengsel onder invloed van een plasma. NL8102149A (nl)

Priority Applications (6)

Application Number Priority Date Filing Date Title
NL8102149A NL8102149A (nl) 1981-05-01 1981-05-01 Werkwijze en inrichting voor de inwendige bedekking van een buis door reactieve afscheiding uit een gasmengsel onder invloed van een plasma.
DE8282200486T DE3263356D1 (en) 1981-05-01 1982-04-23 Method and arrangement for internally coating a tube by reactive deposition from a gas mixture activated by a plasma
US06/371,093 US4405655A (en) 1981-05-01 1982-04-23 Method and arrangement for internally coating a tube by reactive deposition from a gas mixture activated by a plasma
EP82200486A EP0064785B1 (de) 1981-05-01 1982-04-23 Verfahren und Vorrichtung zur Innenbeschichtung eines Rohres durch reaktive Abscheidung aus einer Gasmischung, die durch ein Plasma aktiviert wurde
CA000401982A CA1178553A (en) 1981-05-01 1982-04-29 Method and arrangement for internally coating a tube by reactive deposition from a gas mixture activated by a plasma
JP57071604A JPS57190667A (en) 1981-05-01 1982-04-30 Method and device for coating inside of pipe

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
NL8102149 1981-05-01
NL8102149A NL8102149A (nl) 1981-05-01 1981-05-01 Werkwijze en inrichting voor de inwendige bedekking van een buis door reactieve afscheiding uit een gasmengsel onder invloed van een plasma.

Publications (1)

Publication Number Publication Date
NL8102149A true NL8102149A (nl) 1982-12-01

Family

ID=19837429

Family Applications (1)

Application Number Title Priority Date Filing Date
NL8102149A NL8102149A (nl) 1981-05-01 1981-05-01 Werkwijze en inrichting voor de inwendige bedekking van een buis door reactieve afscheiding uit een gasmengsel onder invloed van een plasma.

Country Status (6)

Country Link
US (1) US4405655A (de)
EP (1) EP0064785B1 (de)
JP (1) JPS57190667A (de)
CA (1) CA1178553A (de)
DE (1) DE3263356D1 (de)
NL (1) NL8102149A (de)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL8302127A (nl) * 1983-06-15 1985-01-02 Philips Nv Werkwijze en inrichting voor de vervaardiging van optische vezels.
EP0173659B1 (de) * 1984-07-03 1989-03-08 Stiftelsen Institutet För Mikrovägsteknik Vid Tekniska Högskolan I Stockholm Verfahren und Vorrichtung zum Erhitzen von dickwandigen Glasrohren
US4761170A (en) * 1985-06-20 1988-08-02 Polaroid Corporation Method for employing plasma in dehydration and consolidation of preforms
US5188648A (en) * 1985-07-20 1993-02-23 U.S. Philips Corp. Method of manufacturing optical fibres
US4990372A (en) * 1987-09-03 1991-02-05 Air Products And Chemicals, Inc. Method for producing wear resistant internal surfaces of structures
DE4212602A1 (de) * 1992-04-15 1993-10-21 Sel Alcatel Ag Lichtwellenleiter sowie Verfahren und Vorrichtung zu seiner Herstellung
US6215092B1 (en) * 1999-06-08 2001-04-10 Alcatel Plasma overcladding process and apparatus having multiple plasma torches
US6460379B2 (en) * 1999-10-25 2002-10-08 Fitel Usa Corp. MCVD apparatus having two opposing motors to eliminate backlash in burner motion
EP1126504A1 (de) * 2000-02-18 2001-08-22 European Community Verfahren und Gerät zur induktivgekoppelter Plasmabehandlung
CN1539090A (zh) 2001-04-12 2004-10-20 �ź㴫 高折射率差纤维波导及其应用
US6901775B2 (en) * 2001-09-21 2005-06-07 Corning Incorporated Method and apparatus for providing a uniform coating thickness along an axial direction within a substrate tube
AU2003295929A1 (en) * 2002-11-22 2004-06-18 Omniguide, Inc. Dielectric waveguide and method of making the same
US20050022561A1 (en) * 2003-08-01 2005-02-03 Guskov Michael I. Ring plasma jet method and apparatus for making an optical fiber preform
US8252387B2 (en) * 2007-12-10 2012-08-28 Ofs Fitel, Llc Method of fabricating optical fiber using an isothermal, low pressure plasma deposition technique
NL2007831C2 (en) * 2011-11-21 2013-05-23 Draka Comteq Bv Apparatus and method for carrying out a pcvd deposition process.
CN103204635A (zh) * 2013-04-25 2013-07-17 江福兴 管件内腔镀膜工艺
DE102014019238A1 (de) * 2014-12-19 2016-06-23 Hochschule München Beschichtung der Innenwandung von schlauchförmigen Substraten

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR91083E (fr) * 1964-05-08 1968-04-05 Int Standard Electric Corp Perfectionnements aux méthodes de formation de couches
GB1134133A (en) * 1965-02-24 1968-11-20 Quartz And Silice Drawing quartz fibres and coating with carbon
US4145456A (en) * 1974-09-14 1979-03-20 Dieter Kuppers Method of producing internally coated glass tubes for the drawing of fibre optic light conductors
GB1603949A (en) * 1978-05-30 1981-12-02 Standard Telephones Cables Ltd Plasma deposit

Also Published As

Publication number Publication date
DE3263356D1 (en) 1985-06-05
EP0064785A1 (de) 1982-11-17
JPS6411713B2 (de) 1989-02-27
CA1178553A (en) 1984-11-27
US4405655A (en) 1983-09-20
JPS57190667A (en) 1982-11-24
EP0064785B1 (de) 1985-05-02

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BT A document has been added to the application laid open to public inspection
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