NL7810155A - Negatief werkende lithografische drukplaat die ontwik- kelbaar is met een waterige alkalische oplossing. - Google Patents

Negatief werkende lithografische drukplaat die ontwik- kelbaar is met een waterige alkalische oplossing.

Info

Publication number
NL7810155A
NL7810155A NL7810155A NL7810155A NL7810155A NL 7810155 A NL7810155 A NL 7810155A NL 7810155 A NL7810155 A NL 7810155A NL 7810155 A NL7810155 A NL 7810155A NL 7810155 A NL7810155 A NL 7810155A
Authority
NL
Netherlands
Prior art keywords
pressure plate
alkaline solution
negatively acting
lithographic pressure
watery alkaline
Prior art date
Application number
NL7810155A
Other languages
English (en)
Dutch (nl)
Original Assignee
Polychrome Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Polychrome Corp filed Critical Polychrome Corp
Publication of NL7810155A publication Critical patent/NL7810155A/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Epoxy Resins (AREA)
NL7810155A 1978-02-15 1978-10-09 Negatief werkende lithografische drukplaat die ontwik- kelbaar is met een waterige alkalische oplossing. NL7810155A (nl)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/878,110 US4171974A (en) 1978-02-15 1978-02-15 Aqueous alkali developable negative working lithographic printing plates

Publications (1)

Publication Number Publication Date
NL7810155A true NL7810155A (nl) 1979-08-17

Family

ID=25371404

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7810155A NL7810155A (nl) 1978-02-15 1978-10-09 Negatief werkende lithografische drukplaat die ontwik- kelbaar is met een waterige alkalische oplossing.

Country Status (8)

Country Link
US (1) US4171974A (de)
JP (1) JPS54117202A (de)
AU (1) AU521646B2 (de)
DE (1) DE2903270A1 (de)
FR (1) FR2417794A1 (de)
GB (1) GB2006453B (de)
NL (1) NL7810155A (de)
SE (1) SE7810324L (de)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4390615A (en) * 1979-11-05 1983-06-28 Courtney Robert W Coating compositions
US4483758A (en) * 1982-01-25 1984-11-20 Polychrome Corporation Method for making a negative working lithographic printing plate
US4447512A (en) * 1982-01-25 1984-05-08 Polychrome Corporation Method for making a negative working lithographic printing plate
GB8307220D0 (en) * 1983-03-16 1983-04-20 Ciba Geigy Ag Production of images
IE55632B1 (en) * 1983-05-09 1990-12-05 Vickers Plc Improvements in or relating to radiation sensitive plates
US4511757A (en) * 1983-07-13 1985-04-16 At&T Technologies, Inc. Circuit board fabrication leading to increased capacity
US4628022A (en) * 1983-07-13 1986-12-09 At&T Technologies, Inc. Multilayer circuit board fabrication process and polymer insulator used therein
US4795693A (en) * 1983-07-13 1989-01-03 American Telephone And Telegraph Company, At&T Technologies, Inc. Multilayer circuit board fabrication process
DE3425328A1 (de) * 1984-07-10 1986-01-16 Hoechst Ag, 6230 Frankfurt Lichtempfindliches gemisch und damit hergestelltes lichtempfindliches aufzeichnungsmaterial
DE3567294D1 (en) * 1984-12-06 1989-02-09 Hoechst Celanese Corp Light-sensitive composition
DE3528309A1 (de) * 1985-08-07 1987-02-12 Hoechst Ag Lichtempfindliches gemisch und damit hergestelltes lichtempfindliches aufzeichnungsmaterial
US4877711A (en) * 1986-05-19 1989-10-31 Fuji Photo Film Co., Ltd. Light-sensitive diazo photopolymerizable composition with polyurethane having carbon-carbon unsaturated and a carboxyl group
DE3644160A1 (de) * 1986-12-23 1988-07-14 Hoechst Ag Lichtempfindliches aufzeichnungsmaterial mit einer lichtempfindlichen zwischenschicht
US5178988A (en) * 1988-09-13 1993-01-12 Amp-Akzo Corporation Photoimageable permanent resist
US5070002A (en) * 1988-09-13 1991-12-03 Amp-Akzo Corporation Photoimageable permanent resist
DE3903001A1 (de) * 1989-02-02 1990-08-16 Hoechst Ag Lichtempfindliches gemisch und damit hergestelltes lichtempfindliches aufzeichnungsmaterial
US5035982A (en) * 1989-07-14 1991-07-30 Eastman Kodak Company Aqueous developer composition for developing negative working lithographic printing plate
US5820932A (en) 1995-11-30 1998-10-13 Sun Chemical Corporation Process for the production of lithographic printing plates
JP4585299B2 (ja) * 2004-12-09 2010-11-24 東京応化工業株式会社 リソグラフィー用リンス液及びそれを用いたレジストパターン形成方法
EP2194429A1 (de) 2008-12-02 2010-06-09 Eastman Kodak Company Gummierzusammensetzungen mit Nanoteilchen zur Verbesserung der Kratzempfindlichkeit in Bild- und Nicht-Bild-Bereichen von lithografischen Druckplatten
EP2196851A1 (de) 2008-12-12 2010-06-16 Eastman Kodak Company Negativkopier-Lithographiedruckplattenvorläufer, die ein reaktives Bindemittel umfassen, das aliphatische bi- oder polycyclische Teile enthält
EP2284005B1 (de) 2009-08-10 2012-05-02 Eastman Kodak Company Lithografische Druckplattenvorläufer mit Betahydroxy-Alkylamid-Vernetzern
EP2293144B1 (de) 2009-09-04 2012-11-07 Eastman Kodak Company Verfahren zum Trocknen von Lithographiedruckplatten nach einer Einstufenverarbeitung

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3230087A (en) * 1959-02-26 1966-01-18 Azoplate Corp Light-sensitive polymeric diazonium and azidoacrylamido reproduction materials and process for making plates therefrom
US3387976A (en) * 1964-07-22 1968-06-11 Harris Intertype Corp Photopolymer and lithographic plates
US3679419A (en) * 1969-05-20 1972-07-25 Azoplate Corp Light-sensitive diazo condensate containing reproduction material
US3652272A (en) * 1969-10-31 1972-03-28 Lithoplate Inc Phenoxy photopolymer having no epoxy groups, and article made therefrom
US3600290A (en) * 1970-01-15 1971-08-17 Continental Can Co Furan-stabilized beta-hydroxy ester coating compositions
US3661576A (en) * 1970-02-09 1972-05-09 Brady Co W H Photopolymerizable compositions and articles
NL7109179A (de) * 1970-07-13 1972-01-17
US3861917A (en) * 1972-02-22 1975-01-21 Grace W R & Co Continuous tone lithographic plate and method of making
US3876432A (en) * 1972-09-11 1975-04-08 Sun Chemical Corp Fatty ester modified epoxy resin photopolymerizable compositions
US3997344A (en) * 1974-07-05 1976-12-14 American Can Company Dry positive photopolymer imaging process involving heating and application of toner
JPS51116893A (en) * 1975-04-08 1976-10-14 Ube Ind Ltd Photo-setting compositions
GB1512814A (en) * 1975-08-13 1978-06-01 Ciba Geigy Ag Epoxide resins

Also Published As

Publication number Publication date
GB2006453A (en) 1979-05-02
DE2903270A1 (de) 1979-08-23
AU521646B2 (en) 1982-04-22
US4171974A (en) 1979-10-23
SE7810324L (sv) 1979-08-16
AU4179078A (en) 1979-08-23
GB2006453B (en) 1982-06-16
FR2417794A1 (fr) 1979-09-14
JPS54117202A (en) 1979-09-12
FR2417794B1 (de) 1983-06-03

Similar Documents

Publication Publication Date Title
NL7810155A (nl) Negatief werkende lithografische drukplaat die ontwik- kelbaar is met een waterige alkalische oplossing.
NL7801625A (nl) Met water ontwikkelbare lithografische druk- plaat met een dubbele lichtgevoelige laag.
BE821907A (fr) Dispositif intra-uterin a action chimique
NL7810069A (nl) Lithografische drukplaat met dubbele lichtgevoelige laag.
SE421035B (sv) Tryckhallningstank for en tryckvattenreaktor
BE819781A (fr) Presse poinconneuse ou grignoteuse a tourelle
IT7921580A0 (it) Meccanismo a verricello.
DK344279A (da) Vaeskefyldt trykmaaleapparat
FR2291269A1 (fr) Procede perfectionne pour fabriquer un savon translucide
FR2338791A1 (fr) Presse a commande fluidique
NL178295C (nl) Vormpers met een aantal persfasen.
AT357239B (de) Druckwasserreaktoranlage
IT7920861A0 (it) Convertirore di pressione.
ES199238Y (es) Dispositivo de conexion de un punzon.
IT1129884B (it) Serbatoio a pressione
AR197244A1 (es) Un reforzador hidraulicos
NL7711203A (nl) Lithografische drukplaat.
NL7510061A (nl) Drukplaat die is voorgesensibiliseerd met een o-naftochinondiazideverbinding.
NL7801624A (nl) Met water ontwikkelbare lithografische druk- plaat.
NO790982L (no) Vaeskelaas for et dekk.
IT7825585A0 (it) Microfono a condensatore.
IT1127711B (it) Regolatore di pressione di freni, avente un bipasso
BE876317A (fr) Soupape de retenue a membrane
SE7907056L (sv) Hydraulisk, snabbgaende press
NL7705512A (nl) Vlakdrukplaat.

Legal Events

Date Code Title Description
A85 Still pending on 85-01-01
BV The patent application has lapsed