NL7802646A - Werkwijze en apparaat voor het met plasma be- handelen van halfgeleidermaterialen. - Google Patents
Werkwijze en apparaat voor het met plasma be- handelen van halfgeleidermaterialen.Info
- Publication number
- NL7802646A NL7802646A NL7802646A NL7802646A NL7802646A NL 7802646 A NL7802646 A NL 7802646A NL 7802646 A NL7802646 A NL 7802646A NL 7802646 A NL7802646 A NL 7802646A NL 7802646 A NL7802646 A NL 7802646A
- Authority
- NL
- Netherlands
- Prior art keywords
- plasma
- treating
- semiconductive materials
- semiconductive
- materials
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
- C23C16/509—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using internal electrodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Drying Of Semiconductors (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2686277A JPS53112066A (en) | 1977-03-11 | 1977-03-11 | Plasma treatment apparatus |
Publications (1)
Publication Number | Publication Date |
---|---|
NL7802646A true NL7802646A (nl) | 1978-09-13 |
Family
ID=12205088
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NL7802646A NL7802646A (nl) | 1977-03-11 | 1978-03-10 | Werkwijze en apparaat voor het met plasma be- handelen van halfgeleidermaterialen. |
Country Status (5)
Country | Link |
---|---|
US (1) | US4178877A (ja) |
JP (1) | JPS53112066A (ja) |
DE (1) | DE2810554C3 (ja) |
GB (1) | GB1598146A (ja) |
NL (1) | NL7802646A (ja) |
Families Citing this family (55)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4233109A (en) * | 1976-01-16 | 1980-11-11 | Zaidan Hojin Handotai Kenkyu Shinkokai | Dry etching method |
US4183780A (en) * | 1978-08-21 | 1980-01-15 | International Business Machines Corporation | Photon enhanced reactive ion etching |
JPS5846057B2 (ja) * | 1979-03-19 | 1983-10-14 | 富士通株式会社 | プラズマ処理方法 |
JPS5664441A (en) * | 1979-10-30 | 1981-06-01 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Manufacture of semiconductor device |
JPS5687323A (en) * | 1979-12-19 | 1981-07-15 | Pioneer Electronic Corp | Substrate supporting device of plasma reaction tube |
JPS5691437A (en) * | 1979-12-26 | 1981-07-24 | Nippon Hoso Kyokai <Nhk> | Preparation of metallized element |
DD150318A3 (de) * | 1980-02-08 | 1981-08-26 | Rainer Moeller | Verfahren und rohrreaktor zur plasmachemischen dampfphasenabscheidung und zum plasmaaetzen |
DD153497A3 (de) * | 1980-02-08 | 1982-01-13 | Georg Rudakoff | Verfahren und vorrichtung zum plasmaaetzen oder zur plasma cvd |
US4289598A (en) * | 1980-05-03 | 1981-09-15 | Technics, Inc. | Plasma reactor and method therefor |
US4399014A (en) * | 1980-05-03 | 1983-08-16 | Engle Frank W | Plasma reactor and method therefor |
US4323589A (en) * | 1980-05-07 | 1982-04-06 | International Business Machines Corporation | Plasma oxidation |
US4282077A (en) * | 1980-07-03 | 1981-08-04 | General Dynamics, Pomona Division | Uniform plasma etching system |
US4380488A (en) * | 1980-10-14 | 1983-04-19 | Branson International Plasma Corporation | Process and gas mixture for etching aluminum |
US4379181A (en) * | 1981-03-16 | 1983-04-05 | Energy Conversion Devices, Inc. | Method for plasma deposition of amorphous materials |
JPS6037188B2 (ja) * | 1981-08-27 | 1985-08-24 | 三菱マテリアル株式会社 | スパツタリング装置 |
JPS5843508A (ja) * | 1981-09-09 | 1983-03-14 | Fuji Electric Corp Res & Dev Ltd | 量産型成膜装置 |
JPS5848416A (ja) * | 1981-09-16 | 1983-03-22 | Fuji Electric Corp Res & Dev Ltd | 量産型薄膜生成装置 |
US4381965A (en) * | 1982-01-06 | 1983-05-03 | Drytek, Inc. | Multi-planar electrode plasma etching |
US4423701A (en) * | 1982-03-29 | 1984-01-03 | Energy Conversion Devices, Inc. | Glow discharge deposition apparatus including a non-horizontally disposed cathode |
DE3227714C1 (de) * | 1982-07-24 | 1984-01-26 | Triumph-Adler Aktiengesellschaft für Büro- und Informationstechnik, 8500 Nürnberg | Vorrichtung fuer Farb- und Korrekturband in Schreibmaschinen |
NL8303602A (nl) * | 1983-10-19 | 1985-05-17 | Johannes Hendrikus Leonardus H | Plasma-gestimuleerde chemische opdampinrichting en in het bijzonder een substratenondersteunings- en elektrodeopstelling daarvoor en de betreffende onderdelen. |
US4686370A (en) * | 1984-02-13 | 1987-08-11 | Biomed-Electronic Gmbh & Co. Medizinischer Geratebau Kg | Ionizing chamber for gaseous oxygen |
US4510172A (en) * | 1984-05-29 | 1985-04-09 | International Business Machines Corporation | Technique for thin insulator growth |
US4610748A (en) * | 1984-12-10 | 1986-09-09 | Advanced Semiconductor Materials Of America, Inc. | Apparatus for processing semiconductor wafers or the like |
GB8431422D0 (en) * | 1984-12-13 | 1985-01-23 | Standard Telephones Cables Ltd | Plasma reactor vessel |
JPS632330A (ja) * | 1986-06-23 | 1988-01-07 | Fujitsu Ltd | 化学気相成長方法 |
US4799451A (en) * | 1987-02-20 | 1989-01-24 | Asm America, Inc. | Electrode boat apparatus for processing semiconductor wafers or the like |
DE3708717A1 (de) * | 1987-03-18 | 1988-09-29 | Hans Prof Dr Rer Nat Oechsner | Verfahren und vorrichtung zur bearbeitung von festkoerperoberflaechen durch teilchenbeschuss |
GB2213836B (en) * | 1987-12-18 | 1992-08-26 | Gen Electric Co Plc | Vacuum deposition process |
US4873942A (en) * | 1988-06-08 | 1989-10-17 | The Stackpole Corporation | Plasma enhanced chemical vapor deposition wafer holding fixture |
JP2726436B2 (ja) * | 1988-07-15 | 1998-03-11 | 東京エレクトロン株式会社 | プラズム処理装置 |
US5316639A (en) * | 1989-06-05 | 1994-05-31 | Sachiko Okazaki | Dielectric material used for an ozone generator and a method of forming a film to the dielectric material |
GB9010000D0 (en) * | 1990-05-03 | 1990-06-27 | Stc Plc | Phosphide films |
US5522937A (en) * | 1994-05-03 | 1996-06-04 | Applied Materials, Inc. | Welded susceptor assembly |
AU1745695A (en) * | 1994-06-03 | 1996-01-04 | Materials Research Corporation | A method of nitridization of titanium thin films |
US5665640A (en) * | 1994-06-03 | 1997-09-09 | Sony Corporation | Method for producing titanium-containing thin films by low temperature plasma-enhanced chemical vapor deposition using a rotating susceptor reactor |
US5975912A (en) * | 1994-06-03 | 1999-11-02 | Materials Research Corporation | Low temperature plasma-enhanced formation of integrated circuits |
US5628829A (en) * | 1994-06-03 | 1997-05-13 | Materials Research Corporation | Method and apparatus for low temperature deposition of CVD and PECVD films |
US5698168A (en) * | 1995-11-01 | 1997-12-16 | Chorus Corporation | Unibody gas plasma source technology |
US6013584A (en) * | 1997-02-19 | 2000-01-11 | Applied Materials, Inc. | Methods and apparatus for forming HDP-CVD PSG film used for advanced pre-metal dielectric layer applications |
US7393561B2 (en) * | 1997-08-11 | 2008-07-01 | Applied Materials, Inc. | Method and apparatus for layer by layer deposition of thin films |
US6352593B1 (en) * | 1997-08-11 | 2002-03-05 | Torrex Equipment Corp. | Mini-batch process chamber |
US6352594B2 (en) * | 1997-08-11 | 2002-03-05 | Torrex | Method and apparatus for improved chemical vapor deposition processes using tunable temperature controlled gas injectors |
US6321680B2 (en) * | 1997-08-11 | 2001-11-27 | Torrex Equipment Corporation | Vertical plasma enhanced process apparatus and method |
US6780464B2 (en) | 1997-08-11 | 2004-08-24 | Torrex Equipment | Thermal gradient enhanced CVD deposition at low pressure |
US20030049372A1 (en) * | 1997-08-11 | 2003-03-13 | Cook Robert C. | High rate deposition at low pressures in a small batch reactor |
US6073576A (en) | 1997-11-25 | 2000-06-13 | Cvc Products, Inc. | Substrate edge seal and clamp for low-pressure processing equipment |
US6156154A (en) * | 1998-06-24 | 2000-12-05 | Seagate Technology, Inc. | Apparatus for etching discs and pallets prior to sputter deposition |
KR20020037995A (ko) * | 2000-11-16 | 2002-05-23 | 구자홍 | 플라즈마 중합 처리장치의 전극 구조 |
US7298092B2 (en) * | 2004-09-28 | 2007-11-20 | Old Dominion University Research Foundation | Device and method for gas treatment using pulsed corona discharges |
US7855513B2 (en) * | 2004-09-28 | 2010-12-21 | Old Dominion University Research Foundation | Device and method for gas treatment using pulsed corona discharges |
TW200737533A (en) * | 2005-12-21 | 2007-10-01 | Nat Science And Technology Dev Agency | Low-cost and high performance solar cell manufacturing machine |
KR20090087190A (ko) * | 2008-02-12 | 2009-08-17 | 삼성전자주식회사 | 반도체 제조설비 그를 이용한 반도체 제조방법 |
HUP1100436A2 (en) * | 2011-08-15 | 2013-02-28 | Ecosolifer Ag | Gas flow system for using in reaction chamber |
DE102015004419A1 (de) * | 2015-04-02 | 2016-10-06 | Centrotherm Photovoltaics Ag | Waferboot und Plasma-Behandlungsvorrichtung für Wafer |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3450617A (en) * | 1966-08-22 | 1969-06-17 | Hooker Chemical Corp | Method of conducting chemical reactions in a glow discharge |
US3875068A (en) * | 1973-02-20 | 1975-04-01 | Tegal Corp | Gaseous plasma reaction apparatus |
US3984301A (en) * | 1973-08-11 | 1976-10-05 | Nippon Electric Varian, Ltd. | Sputter-etching method employing fluorohalogenohydrocarbon etching gas and a planar electrode for a glow discharge |
US3971684A (en) * | 1973-12-03 | 1976-07-27 | Hewlett-Packard Company | Etching thin film circuits and semiconductor chips |
-
1977
- 1977-03-11 JP JP2686277A patent/JPS53112066A/ja active Granted
-
1978
- 1978-03-01 GB GB8175/78A patent/GB1598146A/en not_active Expired
- 1978-03-10 DE DE2810554A patent/DE2810554C3/de not_active Expired
- 1978-03-10 NL NL7802646A patent/NL7802646A/xx not_active Application Discontinuation
- 1978-03-13 US US05/885,996 patent/US4178877A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
DE2810554A1 (de) | 1978-09-14 |
GB1598146A (en) | 1981-09-16 |
DE2810554B2 (de) | 1980-01-03 |
JPS53112066A (en) | 1978-09-30 |
US4178877A (en) | 1979-12-18 |
JPS5427710B2 (ja) | 1979-09-11 |
DE2810554C3 (de) | 1980-09-04 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
BC | A request for examination has been filed | ||
A85 | Still pending on 85-01-01 | ||
BV | The patent application has lapsed |