NL7713549A - PHOTO ELECTRONIC IMAGE PROJEKTOR. - Google Patents

PHOTO ELECTRONIC IMAGE PROJEKTOR.

Info

Publication number
NL7713549A
NL7713549A NL7713549A NL7713549A NL7713549A NL 7713549 A NL7713549 A NL 7713549A NL 7713549 A NL7713549 A NL 7713549A NL 7713549 A NL7713549 A NL 7713549A NL 7713549 A NL7713549 A NL 7713549A
Authority
NL
Netherlands
Prior art keywords
projektor
electronic image
photo electronic
photo
image
Prior art date
Application number
NL7713549A
Other languages
Dutch (nl)
Original Assignee
Siemens Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens Ag filed Critical Siemens Ag
Publication of NL7713549A publication Critical patent/NL7713549A/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2037—Exposure with X-ray radiation or corpuscular radiation, through a mask with a pattern opaque to that radiation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002—Details
    • H01J37/3007—Electron or ion-optical systems
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
    • H01J37/3175—Projection methods, i.e. transfer substantially complete pattern to substrate
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04—Means for controlling the discharge
    • H01J2237/047—Changing particle velocity
    • H01J2237/0473—Changing particle velocity accelerating
    • H01J2237/04735—Changing particle velocity accelerating with electrostatic means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3175—Lithography
    • H01J2237/31777—Lithography by projection
    • H01J2237/31779—Lithography by projection from patterned photocathode

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Electron Beam Exposure (AREA)
  • Image-Pickup Tubes, Image-Amplification Tubes, And Storage Tubes (AREA)
NL7713549A 1977-01-04 1977-12-07 PHOTO ELECTRONIC IMAGE PROJEKTOR. NL7713549A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19772700357 DE2700357A1 (en) 1977-01-04 1977-01-04 PHOTOELECTRONIC IMAGE PROJECTOR

Publications (1)

Publication Number Publication Date
NL7713549A true NL7713549A (en) 1978-07-06

Family

ID=5998186

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7713549A NL7713549A (en) 1977-01-04 1977-12-07 PHOTO ELECTRONIC IMAGE PROJEKTOR.

Country Status (4)

Country Link
JP (1) JPS5385176A (en)
DE (1) DE2700357A1 (en)
FR (1) FR2376510A1 (en)
NL (1) NL7713549A (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5558528A (en) * 1978-10-25 1980-05-01 Nippon Telegr & Teleph Corp <Ntt> Electron beam projecting/imaging device
GB2146168A (en) * 1983-09-05 1985-04-11 Philips Electronic Associated Electron image projector
GB2147141A (en) * 1983-09-26 1985-05-01 Philips Electronic Associated Electron image projector
GB2157069A (en) * 1984-04-02 1985-10-16 Philips Electronic Associated Step and repeat electron image projector
GB2159322A (en) * 1984-05-18 1985-11-27 Philips Electronic Associated Electron image projector
EP0334334B1 (en) * 1988-03-23 1995-06-07 Fujitsu Limited Photo-cathode image projection apparatus for patterning a semiconductor device
US5154733A (en) * 1990-03-06 1992-10-13 Ebara Research Co., Ltd. Photoelectron emitting member and method of electrically charging fine particles with photoelectrons

Also Published As

Publication number Publication date
FR2376510A1 (en) 1978-07-28
DE2700357A1 (en) 1978-07-13
JPS5385176A (en) 1978-07-27

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Legal Events

Date Code Title Description
BV The patent application has lapsed