JPS5385176A - Photoelectric picture projector - Google Patents

Photoelectric picture projector

Info

Publication number
JPS5385176A
JPS5385176A JP16096377A JP16096377A JPS5385176A JP S5385176 A JPS5385176 A JP S5385176A JP 16096377 A JP16096377 A JP 16096377A JP 16096377 A JP16096377 A JP 16096377A JP S5385176 A JPS5385176 A JP S5385176A
Authority
JP
Japan
Prior art keywords
picture projector
photoelectric
photoelectric picture
projector
picture
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16096377A
Other languages
Japanese (ja)
Inventor
Rishiyuke Burukuharuto
Shiyupaideru Ruumoruto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siemens AG
Original Assignee
Siemens AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens AG filed Critical Siemens AG
Publication of JPS5385176A publication Critical patent/JPS5385176A/en
Pending legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2037—Exposure with X-ray radiation or corpuscular radiation, through a mask with a pattern opaque to that radiation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002—Details
    • H01J37/3007—Electron or ion-optical systems
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
    • H01J37/3175—Projection methods, i.e. transfer substantially complete pattern to substrate
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04—Means for controlling the discharge
    • H01J2237/047—Changing particle velocity
    • H01J2237/0473—Changing particle velocity accelerating
    • H01J2237/04735—Changing particle velocity accelerating with electrostatic means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3175—Lithography
    • H01J2237/31777—Lithography by projection
    • H01J2237/31779—Lithography by projection from patterned photocathode
JP16096377A 1977-01-04 1977-12-27 Photoelectric picture projector Pending JPS5385176A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19772700357 DE2700357A1 (en) 1977-01-04 1977-01-04 PHOTOELECTRONIC IMAGE PROJECTOR

Publications (1)

Publication Number Publication Date
JPS5385176A true JPS5385176A (en) 1978-07-27

Family

ID=5998186

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16096377A Pending JPS5385176A (en) 1977-01-04 1977-12-27 Photoelectric picture projector

Country Status (4)

Country Link
JP (1) JPS5385176A (en)
DE (1) DE2700357A1 (en)
FR (1) FR2376510A1 (en)
NL (1) NL7713549A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5558528A (en) * 1978-10-25 1980-05-01 Nippon Telegr & Teleph Corp <Ntt> Electron beam projecting/imaging device
JPS60224220A (en) * 1984-04-02 1985-11-08 フィリップス　エレクトロニクス　ネムローゼ　フェンノートシャップ Electron image projecting device

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2146168A (en) * 1983-09-05 1985-04-11 Philips Electronic Associated Electron image projector
GB2147141A (en) * 1983-09-26 1985-05-01 Philips Electronic Associated Electron image projector
GB2159322A (en) * 1984-05-18 1985-11-27 Philips Electronic Associated Electron image projector
EP0334334B1 (en) * 1988-03-23 1995-06-07 Fujitsu Limited Photo-cathode image projection apparatus for patterning a semiconductor device
US5154733A (en) * 1990-03-06 1992-10-13 Ebara Research Co., Ltd. Photoelectron emitting member and method of electrically charging fine particles with photoelectrons

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5558528A (en) * 1978-10-25 1980-05-01 Nippon Telegr & Teleph Corp <Ntt> Electron beam projecting/imaging device
JPS5653847B2 (en) * 1978-10-25 1981-12-22
JPS60224220A (en) * 1984-04-02 1985-11-08 フィリップス　エレクトロニクス　ネムローゼ　フェンノートシャップ Electron image projecting device

Also Published As

Publication number Publication date
DE2700357A1 (en) 1978-07-13
FR2376510A1 (en) 1978-07-28
NL7713549A (en) 1978-07-06

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