NL7614008A - Aftastende electroneninrichting. - Google Patents

Aftastende electroneninrichting.

Info

Publication number
NL7614008A
NL7614008A NL7614008A NL7614008A NL7614008A NL 7614008 A NL7614008 A NL 7614008A NL 7614008 A NL7614008 A NL 7614008A NL 7614008 A NL7614008 A NL 7614008A NL 7614008 A NL7614008 A NL 7614008A
Authority
NL
Netherlands
Prior art keywords
scanning electron
electron device
scanning
electron
Prior art date
Application number
NL7614008A
Other languages
English (en)
Dutch (nl)
Original Assignee
Jeol Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd filed Critical Jeol Ltd
Publication of NL7614008A publication Critical patent/NL7614008A/xx

Links

Classifications

    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N3/00—Scanning details of television systems; Combination thereof with generation of supply voltages
    • H04N3/10—Scanning details of television systems; Combination thereof with generation of supply voltages by means not exclusively optical-mechanical
    • H04N3/16—Scanning details of television systems; Combination thereof with generation of supply voltages by means not exclusively optical-mechanical by deflecting electron beam in cathode-ray tube, e.g. scanning corrections
    • H04N3/22—Circuits for controlling dimensions, shape or centering of picture on screen
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams

Landscapes

  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Signal Processing (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
NL7614008A 1975-12-19 1976-12-17 Aftastende electroneninrichting. NL7614008A (nl)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP50152073A JPS5275261A (en) 1975-12-19 1975-12-19 Test piece image dispaly unit

Publications (1)

Publication Number Publication Date
NL7614008A true NL7614008A (nl) 1977-06-21

Family

ID=15532451

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7614008A NL7614008A (nl) 1975-12-19 1976-12-17 Aftastende electroneninrichting.

Country Status (6)

Country Link
US (1) US4071759A (xx)
JP (1) JPS5275261A (xx)
DE (1) DE2657331A1 (xx)
FR (1) FR2335945A1 (xx)
GB (1) GB1559133A (xx)
NL (1) NL7614008A (xx)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5773573A (en) * 1980-10-24 1982-05-08 Jeol Ltd Electronic beam scanning circuit
DE3235727A1 (de) * 1982-09-27 1984-03-29 Siemens AG, 1000 Berlin und 8000 München Verfahren zum hervorheben eines objektbereichs in einem rastermikroskop
EP0200893A1 (de) * 1985-03-22 1986-11-12 Siemens Aktiengesellschaft Verfahren zur Hervorhebung eines Objektbereichs auf einer vom Primärstrahl eines Rastermikroskops abgetasteten Probenfläche und Anordnungen zur Durchführung desselben
DE3538857A1 (de) * 1985-11-02 1987-05-07 Leybold Heraeus Gmbh & Co Kg Einrichtung fuer die eingabe eines sollwerts fuer den auftreffpunkt eines elektronenstrahls auf ein medium
JPH0766770B2 (ja) * 1989-03-10 1995-07-19 株式会社日立製作所 電子線照射装置
CA1308203C (en) * 1989-06-01 1992-09-29 Nanoquest (Canada) Inc. Magnification compensation apparatus
EP0810629B1 (en) * 1991-11-27 2000-06-28 Hitachi, Ltd. Electron beam apparatus
JP3373585B2 (ja) * 1993-04-07 2003-02-04 株式会社日立製作所 走査型プローブ加工観察装置
US5834774A (en) * 1996-07-24 1998-11-10 Jeol Ltd. Scanning electron microscope
US6404906B2 (en) * 1997-03-03 2002-06-11 Bacus Research Laboratories,Inc. Method and apparatus for acquiring and reconstructing magnified specimen images from a computer-controlled microscope
JPH10172490A (ja) 1996-12-10 1998-06-26 Hitachi Ltd 走査電子顕微鏡
CN101010436B (zh) * 2004-07-14 2012-12-05 Zs遗传学有限公司 分析核酸聚合物的系统和方法以及相关组件
US7940972B2 (en) * 2007-05-16 2011-05-10 General Electric Company System and method of extended field of view image acquisition of an imaged subject

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3502870A (en) * 1967-07-05 1970-03-24 Hitachi Ltd Apparatus for simultaneously displaying a plurality of images of an object being analyzed in an electron beam device
US3614311A (en) * 1968-02-28 1971-10-19 Hitachi Ltd Apparatus for simultaneously displaying a plurality of images of an object being analyzed in an electron beam device
US3654386A (en) * 1970-04-06 1972-04-04 Farrand Optical Co Inc Dual raster television system
GB1398513A (en) * 1971-05-18 1975-06-25 Drayton W B D Electron probe instruments
DE2204654C3 (de) * 1972-01-28 1974-10-10 Siemens Ag, 1000 Berlin Und 8000 Muenchen Korpuskularstrahlgerät mit einem Leuchtschirm und einer Fernsehkamera
GB1560722A (en) * 1975-04-23 1980-02-06 Jeol Ltd Scanning electron microscope

Also Published As

Publication number Publication date
DE2657331A1 (de) 1977-08-04
US4071759A (en) 1978-01-31
FR2335945A1 (fr) 1977-07-15
JPS5275261A (en) 1977-06-24
FR2335945B1 (xx) 1980-10-10
GB1559133A (en) 1980-01-16

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Legal Events

Date Code Title Description
BV The patent application has lapsed