NL7515181A - Dampbron voor een materiaal met een hoge verdam- pingstemperatuur. - Google Patents

Dampbron voor een materiaal met een hoge verdam- pingstemperatuur.

Info

Publication number
NL7515181A
NL7515181A NL7515181A NL7515181A NL7515181A NL 7515181 A NL7515181 A NL 7515181A NL 7515181 A NL7515181 A NL 7515181A NL 7515181 A NL7515181 A NL 7515181A NL 7515181 A NL7515181 A NL 7515181A
Authority
NL
Netherlands
Prior art keywords
evaporation temperature
vapor source
high evaporation
vapor
source
Prior art date
Application number
NL7515181A
Other languages
English (en)
Dutch (nl)
Original Assignee
Jersey Nuclear Avco Isotopes
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jersey Nuclear Avco Isotopes filed Critical Jersey Nuclear Avco Isotopes
Publication of NL7515181A publication Critical patent/NL7515181A/xx

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching for evaporating or etching
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D59/00—Separation of different isotopes of the same chemical element
    • B01D59/34—Separation by photochemical methods
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E30/00—Energy generation of nuclear origin
    • Y02E30/10—Nuclear fusion reactors

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Toxicology (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biophysics (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Manufacture And Refinement Of Metals (AREA)
NL7515181A 1975-01-06 1975-12-30 Dampbron voor een materiaal met een hoge verdam- pingstemperatuur. NL7515181A (nl)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/538,881 US3996469A (en) 1975-01-06 1975-01-06 Floating convection barrier for evaporation source

Publications (1)

Publication Number Publication Date
NL7515181A true NL7515181A (nl) 1976-07-08

Family

ID=24148815

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7515181A NL7515181A (nl) 1975-01-06 1975-12-30 Dampbron voor een materiaal met een hoge verdam- pingstemperatuur.

Country Status (14)

Country Link
US (1) US3996469A (US07655688-20100202-C00086.png)
JP (1) JPS5193781A (US07655688-20100202-C00086.png)
AU (1) AU508034B2 (US07655688-20100202-C00086.png)
BE (1) BE837327A (US07655688-20100202-C00086.png)
CA (1) CA1043874A (US07655688-20100202-C00086.png)
CH (1) CH603225A5 (US07655688-20100202-C00086.png)
DE (1) DE2559065A1 (US07655688-20100202-C00086.png)
ES (1) ES444100A1 (US07655688-20100202-C00086.png)
FR (1) FR2296457A1 (US07655688-20100202-C00086.png)
GB (1) GB1534140A (US07655688-20100202-C00086.png)
IL (1) IL48720A (US07655688-20100202-C00086.png)
IT (1) IT1052892B (US07655688-20100202-C00086.png)
NL (1) NL7515181A (US07655688-20100202-C00086.png)
SE (1) SE7514744L (US07655688-20100202-C00086.png)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4124801A (en) * 1976-09-24 1978-11-07 Phrasor Technology Incorporated Apparatus and process for separating materials
US4251725A (en) * 1979-08-06 1981-02-17 Honeywell Inc. Programmed sample pyrolysis for mass spectrometer
US4472453A (en) * 1983-07-01 1984-09-18 Rca Corporation Process for radiation free electron beam deposition
JPS6270576A (ja) * 1985-09-21 1987-04-01 Kawasaki Steel Corp 大量蒸気流発生用蒸発源装置
CA2023044A1 (en) * 1990-08-09 1992-02-10 Naoum Araj Vessel for evaporation of low-temperature melting material
DE102021129537A1 (de) 2021-11-12 2023-05-17 VON ARDENNE Asset GmbH & Co. KG Verfahren, Verdampfungsanordnung und Verwendung einer Konvektionsbarriere

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3329524A (en) * 1963-06-12 1967-07-04 Temescal Metallurgical Corp Centrifugal-type vapor source
CH452313A (de) * 1965-12-18 1968-05-31 Balzers Patent Beteilig Ag Vorrichtung zur Verdampfung von Stoffen im Vakuum
US3414655A (en) * 1966-01-26 1968-12-03 Nat Res Corp Apparatus for evaporation of low temperature semiconductor material by electron beam impingement on the material and comprising means for draining electric charge from the material
SE345881B (US07655688-20100202-C00086.png) * 1969-06-13 1972-06-12 Aga Ab
US3772519A (en) * 1970-03-25 1973-11-13 Jersey Nuclear Avco Isotopes Method of and apparatus for the separation of isotopes

Also Published As

Publication number Publication date
IL48720A0 (en) 1976-03-31
AU8788475A (en) 1977-06-30
CH603225A5 (US07655688-20100202-C00086.png) 1978-08-15
FR2296457B1 (US07655688-20100202-C00086.png) 1979-07-20
FR2296457A1 (fr) 1976-07-30
GB1534140A (en) 1978-11-29
CA1043874A (en) 1978-12-05
SE7514744L (sv) 1976-07-07
DE2559065A1 (de) 1976-07-08
US3996469A (en) 1976-12-07
BE837327A (fr) 1976-05-03
IL48720A (en) 1979-01-31
JPS5193781A (US07655688-20100202-C00086.png) 1976-08-17
ES444100A1 (es) 1977-08-16
AU508034B2 (en) 1980-03-06
IT1052892B (it) 1981-07-20

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Legal Events

Date Code Title Description
BV The patent application has lapsed