NL7315331A - - Google Patents

Info

Publication number
NL7315331A
NL7315331A NL7315331A NL7315331A NL7315331A NL 7315331 A NL7315331 A NL 7315331A NL 7315331 A NL7315331 A NL 7315331A NL 7315331 A NL7315331 A NL 7315331A NL 7315331 A NL7315331 A NL 7315331A
Authority
NL
Netherlands
Application number
NL7315331A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of NL7315331A publication Critical patent/NL7315331A/xx

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/20—Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Particle Accelerators (AREA)
  • Electron Beam Exposure (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Electron Sources, Ion Sources (AREA)
NL7315331A 1973-02-27 1973-11-08 NL7315331A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2310355A DE2310355C3 (en) 1973-02-27 1973-02-27 Adjustment device for particle beam devices, in particular electron microscopes

Publications (1)

Publication Number Publication Date
NL7315331A true NL7315331A (en) 1974-08-29

Family

ID=5873563

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7315331A NL7315331A (en) 1973-02-27 1973-11-08

Country Status (5)

Country Link
US (1) US3909611A (en)
JP (1) JPS502458A (en)
DE (1) DE2310355C3 (en)
GB (1) GB1459932A (en)
NL (1) NL7315331A (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55165628A (en) * 1979-06-12 1980-12-24 Fujitsu Ltd Apparatus for electron-beam irradiation
DE3128814A1 (en) * 1981-07-21 1983-02-10 Siemens AG, 1000 Berlin und 8000 München ELECTRICALLY CONDUCTIVE SAMPLE HOLDER FOR THE ANALYSIS TECHNOLOGY OF SECONDARY ION MASS SPECTROMETRY
GB8603473D0 (en) * 1986-02-12 1986-03-19 Marconi Co Ltd Mooring tether
US4996433A (en) * 1989-11-06 1991-02-26 Gatan, Inc. Specimen heating holder for electron microscopes
US5153434A (en) * 1990-05-18 1992-10-06 Hitachi, Ltd. Electron microscope and method for observing microscopic image
WO1996000978A1 (en) * 1994-06-28 1996-01-11 Leica Cambridge Ltd. Electron beam lithography machine
JP4429783B2 (en) * 2004-04-13 2010-03-10 日本電子株式会社 Aperture plate support mechanism and charged particle beam apparatus including the same

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1052542A (en) * 1964-01-21
US3628013A (en) * 1969-08-29 1971-12-14 Max Planck Gesellschaft Adjusting device for corpuscular-beam apparatus

Also Published As

Publication number Publication date
DE2310355A1 (en) 1974-09-05
JPS502458A (en) 1975-01-11
DE2310355B2 (en) 1975-04-03
US3909611A (en) 1975-09-30
DE2310355C3 (en) 1975-11-13
GB1459932A (en) 1976-12-31

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Legal Events

Date Code Title Description
BV The patent application has lapsed