NL7303610A - - Google Patents
Info
- Publication number
- NL7303610A NL7303610A NL7303610A NL7303610A NL7303610A NL 7303610 A NL7303610 A NL 7303610A NL 7303610 A NL7303610 A NL 7303610A NL 7303610 A NL7303610 A NL 7303610A NL 7303610 A NL7303610 A NL 7303610A
- Authority
- NL
- Netherlands
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W20/00—Interconnections in chips, wafers or substrates
- H10W20/40—Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D99/00—Subject matter not provided for in other groups of this subclass
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P50/00—Etching of wafers, substrates or parts of devices
- H10P50/20—Dry etching; Plasma etching; Reactive-ion etching
- H10P50/28—Dry etching; Plasma etching; Reactive-ion etching of insulating materials
- H10P50/282—Dry etching; Plasma etching; Reactive-ion etching of insulating materials of inorganic materials
- H10P50/283—Dry etching; Plasma etching; Reactive-ion etching of insulating materials of inorganic materials by chemical means
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
- H10P76/40—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising inorganic materials
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US24128472A | 1972-04-05 | 1972-04-05 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL7303610A true NL7303610A (https=) | 1973-10-09 |
Family
ID=22910046
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL7303610A NL7303610A (https=) | 1972-04-05 | 1973-03-15 |
Country Status (7)
| Country | Link |
|---|---|
| JP (1) | JPS4910673A (https=) |
| CA (1) | CA959383A (https=) |
| DE (1) | DE2302264A1 (https=) |
| FR (1) | FR2178859B3 (https=) |
| GB (1) | GB1361357A (https=) |
| IT (1) | IT976934B (https=) |
| NL (1) | NL7303610A (https=) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5128755A (en) * | 1974-09-04 | 1976-03-11 | Nippon Electric Co | Handotaisochi no seizohoho |
| JPH03198327A (ja) * | 1989-12-26 | 1991-08-29 | Fujitsu Ltd | 半導体装置の製造方法 |
| CN113307224B (zh) * | 2021-05-24 | 2024-09-17 | 上海芯物科技有限公司 | 一种旋转结构的制备方法 |
-
1972
- 1972-12-07 CA CA158,352A patent/CA959383A/en not_active Expired
- 1972-12-11 GB GB5703772A patent/GB1361357A/en not_active Expired
-
1973
- 1973-01-17 IT IT47744/73A patent/IT976934B/it active
- 1973-01-18 DE DE2302264A patent/DE2302264A1/de active Pending
- 1973-02-06 FR FR7304074A patent/FR2178859B3/fr not_active Expired
- 1973-03-15 NL NL7303610A patent/NL7303610A/xx unknown
- 1973-03-20 JP JP48032559A patent/JPS4910673A/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| CA959383A (en) | 1974-12-17 |
| DE2302264A1 (de) | 1973-10-25 |
| FR2178859A1 (https=) | 1973-11-16 |
| JPS4910673A (https=) | 1974-01-30 |
| IT976934B (it) | 1974-09-10 |
| GB1361357A (en) | 1974-07-24 |
| FR2178859B3 (https=) | 1976-01-30 |