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Priority to NL7213331ApriorityCriticalpatent/NL7213331A/xx
Priority to DE19732349203prioritypatent/DE2349203A1/de
Priority to GB4593973Aprioritypatent/GB1413610A/en
Priority to FR7335341Aprioritypatent/FR2209128B1/fr
Publication of NL7213331ApublicationCriticalpatent/NL7213331A/xx
G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor