NL7211510A - - Google Patents
Info
- Publication number
- NL7211510A NL7211510A NL7211510A NL7211510A NL7211510A NL 7211510 A NL7211510 A NL 7211510A NL 7211510 A NL7211510 A NL 7211510A NL 7211510 A NL7211510 A NL 7211510A NL 7211510 A NL7211510 A NL 7211510A
- Authority
- NL
- Netherlands
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
- B41N3/00—Preparing for use and conserving printing surfaces
- B41N3/03—Chemical or electrical pretreatment
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
- G03F7/0043—Chalcogenides; Silicon, germanium, arsenic or derivatives thereof; Metals, oxides or alloys thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/06—Silver salts
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Metallurgy (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Printing Plates And Materials Therefor (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US17410271A | 1971-08-23 | 1971-08-23 |
Publications (1)
Publication Number | Publication Date |
---|---|
NL7211510A true NL7211510A (pt) | 1973-02-27 |
Family
ID=22634825
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NL7211510A NL7211510A (pt) | 1971-08-23 | 1972-08-23 |
Country Status (11)
Country | Link |
---|---|
JP (1) | JPS4830502A (pt) |
AR (1) | AR195074A1 (pt) |
AU (1) | AU4581172A (pt) |
BE (1) | BE787828A (pt) |
BR (1) | BR7205738D0 (pt) |
DD (1) | DD106719A5 (pt) |
DE (1) | DE2241474A1 (pt) |
FR (1) | FR2150464A1 (pt) |
GB (1) | GB1371125A (pt) |
IT (1) | IT964191B (pt) |
NL (1) | NL7211510A (pt) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1981002547A1 (en) * | 1980-03-11 | 1981-09-17 | Teich Ag Folienwalzwerk | Method for manufacturing a base material for an offset printing plate,base material produced according to such method and implementation of said method for manufacturing an offset printing plate |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5926480B2 (ja) * | 1978-03-27 | 1984-06-27 | 富士写真フイルム株式会社 | 平版印刷版用支持体 |
JPS5748733A (en) * | 1980-09-08 | 1982-03-20 | Fuji Photo Film Co Ltd | Photosensitive lithographic plate |
JPS5931192A (ja) * | 1982-06-30 | 1984-02-20 | Konishiroku Photo Ind Co Ltd | 平版印刷版用支持体 |
JPS5948867U (ja) * | 1982-09-22 | 1984-03-31 | 磯部 「峰」生 | 手彫に適する染色用型紙材料 |
JP2813747B2 (ja) * | 1989-05-22 | 1998-10-22 | 富士写真フイルム株式会社 | 画像形成法 |
JPH0359653A (ja) * | 1989-07-28 | 1991-03-14 | Fuji Photo Film Co Ltd | 画像形成方法 |
-
0
- BE BE787828D patent/BE787828A/xx unknown
-
1972
- 1972-08-09 GB GB3710172A patent/GB1371125A/en not_active Expired
- 1972-08-22 DD DD16518172A patent/DD106719A5/xx unknown
- 1972-08-22 BR BR573872A patent/BR7205738D0/pt unknown
- 1972-08-22 AU AU45811/72A patent/AU4581172A/en not_active Expired
- 1972-08-23 AR AR24371272A patent/AR195074A1/es active
- 1972-08-23 DE DE19722241474 patent/DE2241474A1/de active Pending
- 1972-08-23 FR FR7230061A patent/FR2150464A1/fr not_active Withdrawn
- 1972-08-23 JP JP8381272A patent/JPS4830502A/ja active Pending
- 1972-08-23 NL NL7211510A patent/NL7211510A/xx unknown
- 1972-08-23 IT IT2842772A patent/IT964191B/it active
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1981002547A1 (en) * | 1980-03-11 | 1981-09-17 | Teich Ag Folienwalzwerk | Method for manufacturing a base material for an offset printing plate,base material produced according to such method and implementation of said method for manufacturing an offset printing plate |
Also Published As
Publication number | Publication date |
---|---|
AR195074A1 (es) | 1973-09-10 |
AU4581172A (en) | 1974-02-28 |
IT964191B (it) | 1974-01-21 |
DE2241474A1 (de) | 1973-03-08 |
DD106719A5 (pt) | 1974-06-20 |
JPS4830502A (pt) | 1973-04-21 |
GB1371125A (en) | 1974-10-23 |
BE787828A (fr) | 1973-02-22 |
BR7205738D0 (pt) | 1973-09-25 |
FR2150464A1 (pt) | 1973-04-06 |