NL7211510A - - Google Patents

Info

Publication number
NL7211510A
NL7211510A NL7211510A NL7211510A NL7211510A NL 7211510 A NL7211510 A NL 7211510A NL 7211510 A NL7211510 A NL 7211510A NL 7211510 A NL7211510 A NL 7211510A NL 7211510 A NL7211510 A NL 7211510A
Authority
NL
Netherlands
Application number
NL7211510A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of NL7211510A publication Critical patent/NL7211510A/xx

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41NPRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N3/00Preparing for use and conserving printing surfaces
    • B41N3/03Chemical or electrical pretreatment
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/0042Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
    • G03F7/0043Chalcogenides; Silicon, germanium, arsenic or derivatives thereof; Metals, oxides or alloys thereof
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/06Silver salts

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
NL7211510A 1971-08-23 1972-08-23 NL7211510A (pt)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US17410271A 1971-08-23 1971-08-23

Publications (1)

Publication Number Publication Date
NL7211510A true NL7211510A (pt) 1973-02-27

Family

ID=22634825

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7211510A NL7211510A (pt) 1971-08-23 1972-08-23

Country Status (11)

Country Link
JP (1) JPS4830502A (pt)
AR (1) AR195074A1 (pt)
AU (1) AU4581172A (pt)
BE (1) BE787828A (pt)
BR (1) BR7205738D0 (pt)
DD (1) DD106719A5 (pt)
DE (1) DE2241474A1 (pt)
FR (1) FR2150464A1 (pt)
GB (1) GB1371125A (pt)
IT (1) IT964191B (pt)
NL (1) NL7211510A (pt)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1981002547A1 (en) * 1980-03-11 1981-09-17 Teich Ag Folienwalzwerk Method for manufacturing a base material for an offset printing plate,base material produced according to such method and implementation of said method for manufacturing an offset printing plate

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5926480B2 (ja) * 1978-03-27 1984-06-27 富士写真フイルム株式会社 平版印刷版用支持体
JPS5748733A (en) * 1980-09-08 1982-03-20 Fuji Photo Film Co Ltd Photosensitive lithographic plate
JPS5931192A (ja) * 1982-06-30 1984-02-20 Konishiroku Photo Ind Co Ltd 平版印刷版用支持体
JPS5948867U (ja) * 1982-09-22 1984-03-31 磯部 「峰」生 手彫に適する染色用型紙材料
JP2813747B2 (ja) * 1989-05-22 1998-10-22 富士写真フイルム株式会社 画像形成法
JPH0359653A (ja) * 1989-07-28 1991-03-14 Fuji Photo Film Co Ltd 画像形成方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1981002547A1 (en) * 1980-03-11 1981-09-17 Teich Ag Folienwalzwerk Method for manufacturing a base material for an offset printing plate,base material produced according to such method and implementation of said method for manufacturing an offset printing plate

Also Published As

Publication number Publication date
AR195074A1 (es) 1973-09-10
AU4581172A (en) 1974-02-28
IT964191B (it) 1974-01-21
DE2241474A1 (de) 1973-03-08
DD106719A5 (pt) 1974-06-20
JPS4830502A (pt) 1973-04-21
GB1371125A (en) 1974-10-23
BE787828A (fr) 1973-02-22
BR7205738D0 (pt) 1973-09-25
FR2150464A1 (pt) 1973-04-06

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