NL7114436A - - Google Patents
Info
- Publication number
- NL7114436A NL7114436A NL7114436A NL7114436A NL7114436A NL 7114436 A NL7114436 A NL 7114436A NL 7114436 A NL7114436 A NL 7114436A NL 7114436 A NL7114436 A NL 7114436A NL 7114436 A NL7114436 A NL 7114436A
- Authority
- NL
- Netherlands
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/035—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyurethanes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F8/00—Chemical modification by after-treatment
- C08F8/34—Introducing sulfur atoms or sulfur-containing groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/70—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
- C08G18/71—Monoisocyanates or monoisothiocyanates
- C08G18/715—Monoisocyanates or monoisothiocyanates containing sulfur in addition to isothiocyanate sulfur
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
- Y10S430/107—Polyamide or polyurethane
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
- Y10S430/11—Vinyl alcohol polymer or derivative
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
- Y10S430/112—Cellulosic
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/116—Redox or dye sensitizer
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Physics & Mathematics (AREA)
- General Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Printing Plates And Materials Therefor (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE2053363A DE2053363C3 (de) | 1970-10-30 | 1970-10-30 | Lichtempfindliches Gemisch |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL7114436A true NL7114436A (enExample) | 1972-05-03 |
Family
ID=5786658
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL7114436A NL7114436A (enExample) | 1970-10-30 | 1971-10-20 |
Country Status (10)
| Country | Link |
|---|---|
| US (1) | US3732105A (enExample) |
| JP (1) | JPS5419773B1 (enExample) |
| AT (1) | AT319034B (enExample) |
| BE (1) | BE774577A (enExample) |
| CA (1) | CA960076A (enExample) |
| DE (1) | DE2053363C3 (enExample) |
| FR (1) | FR2110113A5 (enExample) |
| GB (1) | GB1370316A (enExample) |
| IT (1) | IT939677B (enExample) |
| NL (1) | NL7114436A (enExample) |
Families Citing this family (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3884702A (en) * | 1972-12-14 | 1975-05-20 | Unitika Ltd | Photosensitive polyamide composition |
| US4289838A (en) * | 1972-12-14 | 1981-09-15 | Polychrome Corporation | Diazo-unsaturated monomer light sensitive compositions |
| JPS527364B2 (enExample) * | 1973-07-23 | 1977-03-02 | ||
| US4123276A (en) * | 1974-02-28 | 1978-10-31 | Fuji Photo Film Co., Ltd. | Photosensitive composition |
| GB1507704A (en) * | 1974-04-23 | 1978-04-19 | Du Pont | Photopolymerisable compositions |
| US4189320A (en) * | 1975-04-29 | 1980-02-19 | American Hoechst Corporation | Light-sensitive o-quinone diazide compositions and photographic reproduction processes and structures |
| DE2617088A1 (de) * | 1975-04-29 | 1976-11-11 | Hoechst Co American | Lichtempfindliche kopiermasse |
| US4093461A (en) * | 1975-07-18 | 1978-06-06 | Gaf Corporation | Positive working thermally stable photoresist composition, article and method of using |
| LU75749A1 (enExample) * | 1976-09-08 | 1978-04-27 | ||
| US4268634A (en) * | 1977-01-17 | 1981-05-19 | Mitsubishi Paper Mills, Ltd. | Desensitizer for no-carbon copy paper |
| JPS5488403A (en) * | 1977-12-21 | 1979-07-13 | Okamoto Kagaku Kogyo Kk | Block sensitive layer for printing |
| DE3036077A1 (de) * | 1980-09-25 | 1982-05-06 | Hoechst Ag, 6000 Frankfurt | Lichthaertbares gemisch und damit hergestelltes lichtempfindliches kopiermaterial |
| DE3445276A1 (de) * | 1984-12-12 | 1986-06-19 | Hoechst Ag, 6230 Frankfurt | Strahlungsempfindliches gemisch, daraus hergestelltes lichtempfindliches aufzeichnungsmaterial und verfahren zur herstellung einer flachdruckform |
| JPS61217036A (ja) * | 1985-03-22 | 1986-09-26 | Kuraray Co Ltd | 水溶性感光性組成物 |
| JPH0693116B2 (ja) * | 1986-01-21 | 1994-11-16 | 富士写真フイルム株式会社 | 感光性組成物 |
| DE3615613A1 (de) * | 1986-05-09 | 1987-11-12 | Hoechst Ag | Lichtempfindliches gemisch und daraus hergestelltes lichtempfindliches aufzeichnungsmaterial |
| JPH0727208B2 (ja) * | 1987-04-20 | 1995-03-29 | 富士写真フイルム株式会社 | 感光性組成物 |
| US5238772A (en) * | 1989-06-21 | 1993-08-24 | Hoechst Aktiengesellschaft | Photopolymerizable mixture and recording material containing free-radically polymerizable compound, photosensitive polymerization initiator and polyurethane binder grafted with vinyl alcohol and vinyl acetal units |
| DE19847616C2 (de) * | 1998-10-15 | 2001-05-10 | Kodak Polychrome Graphics Gmbh | Polyvinylacetale mit Imidogruppen sowie die Verwendung derselben in lichtempfindlichen Zusammensetzungen |
| DE10011096A1 (de) | 2000-03-09 | 2001-10-11 | Clariant Gmbh | Verwendung von carboxylgruppenhaltigen Acetalpolymeren in lichtempfindlichen Zusammensetzungen und lithographischen Druckplatten |
| US6270938B1 (en) | 2000-06-09 | 2001-08-07 | Kodak Polychrome Graphics Llc | Acetal copolymers and use thereof in photosensitive compositions |
| US6743273B2 (en) * | 2000-09-05 | 2004-06-01 | Donaldson Company, Inc. | Polymer, polymer microfiber, polymer nanofiber and applications including filter structures |
| US20100175555A1 (en) * | 2008-09-12 | 2010-07-15 | Ismael Ferrer | Polyamide Fine Fibers |
| EP2233288A1 (en) * | 2009-03-23 | 2010-09-29 | Founder Fine Chemical Industry Co., Ltd. | Radiation sensitive composition and method for preparing radiation sensitive composition |
-
1970
- 1970-10-30 DE DE2053363A patent/DE2053363C3/de not_active Expired
-
1971
- 1971-10-20 NL NL7114436A patent/NL7114436A/xx unknown
- 1971-10-27 BE BE774577A patent/BE774577A/xx not_active IP Right Cessation
- 1971-10-27 US US00193139A patent/US3732105A/en not_active Expired - Lifetime
- 1971-10-27 AT AT927271A patent/AT319034B/de not_active IP Right Cessation
- 1971-10-27 CA CA126,207A patent/CA960076A/en not_active Expired
- 1971-10-28 IT IT53753/71A patent/IT939677B/it active
- 1971-10-28 GB GB5020371A patent/GB1370316A/en not_active Expired
- 1971-10-29 FR FR7138901A patent/FR2110113A5/fr not_active Expired
- 1971-10-30 JP JP8669371A patent/JPS5419773B1/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| CA960076A (en) | 1974-12-31 |
| BE774577A (fr) | 1972-04-27 |
| IT939677B (it) | 1973-02-10 |
| DE2053363C3 (de) | 1980-09-18 |
| JPS5419773B1 (enExample) | 1979-07-18 |
| FR2110113A5 (enExample) | 1972-05-26 |
| AT319034B (de) | 1974-11-25 |
| US3732105A (en) | 1973-05-08 |
| DE2053363B2 (de) | 1980-01-24 |
| DE2053363A1 (de) | 1972-05-04 |
| GB1370316A (en) | 1974-10-16 |