NL7110157A - - Google Patents

Info

Publication number
NL7110157A
NL7110157A NL7110157A NL7110157A NL7110157A NL 7110157 A NL7110157 A NL 7110157A NL 7110157 A NL7110157 A NL 7110157A NL 7110157 A NL7110157 A NL 7110157A NL 7110157 A NL7110157 A NL 7110157A
Authority
NL
Netherlands
Application number
NL7110157A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of NL7110157A publication Critical patent/NL7110157A/xx

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • GPHYSICS
    • G05CONTROLLING; REGULATING
    • G05DSYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D3/00Control of position or direction
    • G05D3/12Control of position or direction using feedback
    • G05D3/14Control of position or direction using feedback using an analogue comparing device
    • GPHYSICS
    • G05CONTROLLING; REGULATING
    • G05DSYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D3/00Control of position or direction
    • G05D3/12Control of position or direction using feedback
    • G05D3/20Control of position or direction using feedback using a digital comparing device
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • H01L21/681Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment using optical controlling means

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Automation & Control Theory (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Control Of Position Or Direction (AREA)
  • Optical Transform (AREA)
  • Machine Tool Positioning Apparatuses (AREA)
  • Processing Or Creating Images (AREA)
NL7110157A 1970-08-24 1971-07-23 NL7110157A (enExample)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US6621170A 1970-08-24 1970-08-24

Publications (1)

Publication Number Publication Date
NL7110157A true NL7110157A (enExample) 1972-02-28

Family

ID=22067996

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7110157A NL7110157A (enExample) 1970-08-24 1971-07-23

Country Status (5)

Country Link
US (1) US3671748A (enExample)
JP (1) JPS5128465B1 (enExample)
FR (1) FR2107046A5 (enExample)
GB (1) GB1334128A (enExample)
NL (1) NL7110157A (enExample)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3723745A (en) * 1971-12-28 1973-03-27 Nasa Radiant source tracker independent of non-constant irradiance
US3814845A (en) * 1973-03-01 1974-06-04 Bell Telephone Labor Inc Object positioning
US4021711A (en) * 1975-06-27 1977-05-03 International Business Machines Corporation Article positioner with zero position sensing means
JPS52121144A (en) * 1976-04-03 1977-10-12 Nippon Gakki Seizo Kk High potential switch
US4199816A (en) * 1978-06-28 1980-04-22 Humphrey Instruments, Inc. Optical calibration apparatus and procedure
DD158824A1 (de) * 1980-11-03 1983-02-02 Adelbrecht Schorcht Anordnung zur automatischen justierung mindestens eines gegenstandes
GB2131162B (en) * 1982-11-27 1986-04-30 Ferranti Plc Aligning objects
FR2540666B1 (fr) * 1983-02-04 1986-10-10 Telemecanique Electrique Interrupteur limiteur
US4713784A (en) * 1983-07-04 1987-12-15 Canon Kabushiki Kaisha Alignment apparatus
DE3927890A1 (de) * 1989-08-24 1991-02-28 Thomson Brandt Gmbh Verfahren zum justieren einer positioniervorrichtung
JPH0724278B2 (ja) * 1991-01-10 1995-03-15 信越半導体株式会社 パターンシフト測定方法
JP4171953B2 (ja) * 2000-01-18 2008-10-29 ソニー株式会社 ディスク搬送装置及びディスク搬送方法
US6677602B1 (en) * 2000-08-18 2004-01-13 Sensys Instruments Corporation Notch and flat sensor for wafer alignment
JP3982270B2 (ja) * 2002-01-29 2007-09-26 信越半導体株式会社 半導体ウエーハの製造方法および半導体ウエーハ製造の受注方法ならびに半導体ウエーハ製造の受注システム
CN101140894A (zh) * 2003-03-26 2008-03-12 阿森姆布里昂股份有限公司 用于校准装置的方法、用于校准多个并排放置的装置的方法以及适于实施这种方法的物体
US7492449B2 (en) * 2004-04-12 2009-02-17 Georgia Tech Research Corporation Inspection systems and methods
US8860456B2 (en) 2011-08-02 2014-10-14 Medtronic, Inc. Non-destructive tilt data measurement to detect defective bumps
CN109029315B (zh) * 2018-06-04 2024-04-09 深圳先进技术研究院 感应器的刻度系统及其刻度方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2969707A (en) * 1955-05-07 1961-01-31 Zeiss Carl Method and means for automatically adjusting a measuring or observation instrument

Also Published As

Publication number Publication date
DE2136439B2 (de) 1976-03-11
JPS5128465B1 (enExample) 1976-08-19
DE2136439A1 (de) 1972-03-02
US3671748A (en) 1972-06-20
FR2107046A5 (enExample) 1972-05-05
GB1334128A (en) 1973-10-17

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Legal Events

Date Code Title Description
BB A search report has been drawn up
BC A request for examination has been filed
CNR Transfer of rights (patent application after its laying open for public inspection)

Free format text: APPLIED MATERIALS, INC.

A85 Still pending on 85-01-01
BV The patent application has lapsed