NL7103379A - - Google Patents

Info

Publication number
NL7103379A
NL7103379A NL7103379A NL7103379A NL7103379A NL 7103379 A NL7103379 A NL 7103379A NL 7103379 A NL7103379 A NL 7103379A NL 7103379 A NL7103379 A NL 7103379A NL 7103379 A NL7103379 A NL 7103379A
Authority
NL
Netherlands
Application number
NL7103379A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to NL7103379A priority Critical patent/NL7103379A/xx
Priority to DE19722208421 priority patent/DE2208421A1/de
Priority to CA136,774A priority patent/CA978013A/en
Priority to GB1130772A priority patent/GB1334811A/en
Priority to IT6776972A priority patent/IT952955B/it
Priority to JP2403872A priority patent/JPS5423572B1/ja
Priority to BE780621A priority patent/BE780621A/xx
Priority to FR7208631A priority patent/FR2130167B1/fr
Publication of NL7103379A publication Critical patent/NL7103379A/xx
Priority to US422585A priority patent/US3890153A/en

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/022Quinonediazides
    • G03F7/023Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Epoxy Resins (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
NL7103379A 1971-03-13 1971-03-13 NL7103379A (cg-RX-API-DMAC10.html)

Priority Applications (9)

Application Number Priority Date Filing Date Title
NL7103379A NL7103379A (cg-RX-API-DMAC10.html) 1971-03-13 1971-03-13
DE19722208421 DE2208421A1 (de) 1971-03-13 1972-02-23 Positiv arbeitende lichtempfindliche Masse
CA136,774A CA978013A (en) 1971-03-13 1972-03-10 Positive-acting photosensitive composition
GB1130772A GB1334811A (en) 1971-03-13 1972-03-10 Photosensitive compositions
IT6776972A IT952955B (it) 1971-03-13 1972-03-10 Composizione fotosensibile ad azione positiva
JP2403872A JPS5423572B1 (cg-RX-API-DMAC10.html) 1971-03-13 1972-03-10
BE780621A BE780621A (fr) 1971-03-13 1972-03-13 Composition photosensible positive
FR7208631A FR2130167B1 (cg-RX-API-DMAC10.html) 1971-03-13 1972-03-13
US422585A US3890153A (en) 1971-03-13 1973-12-06 Positive-acting napthoquinone diazide photosensitive composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL7103379A NL7103379A (cg-RX-API-DMAC10.html) 1971-03-13 1971-03-13

Publications (1)

Publication Number Publication Date
NL7103379A true NL7103379A (cg-RX-API-DMAC10.html) 1972-09-15

Family

ID=19812677

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7103379A NL7103379A (cg-RX-API-DMAC10.html) 1971-03-13 1971-03-13

Country Status (8)

Country Link
JP (1) JPS5423572B1 (cg-RX-API-DMAC10.html)
BE (1) BE780621A (cg-RX-API-DMAC10.html)
CA (1) CA978013A (cg-RX-API-DMAC10.html)
DE (1) DE2208421A1 (cg-RX-API-DMAC10.html)
FR (1) FR2130167B1 (cg-RX-API-DMAC10.html)
GB (1) GB1334811A (cg-RX-API-DMAC10.html)
IT (1) IT952955B (cg-RX-API-DMAC10.html)
NL (1) NL7103379A (cg-RX-API-DMAC10.html)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0302941B1 (en) * 1987-02-02 1993-12-29 Nippon Paint Co., Ltd. Positive photosensitive resin composition and process for its production
US12393115B2 (en) 2018-09-05 2025-08-19 Merck Patent Gmbh Positive working photosensitive material

Also Published As

Publication number Publication date
CA978013A (en) 1975-11-18
GB1334811A (en) 1973-10-24
DE2208421A1 (de) 1972-09-21
IT952955B (it) 1973-07-30
FR2130167B1 (cg-RX-API-DMAC10.html) 1977-01-14
FR2130167A1 (cg-RX-API-DMAC10.html) 1972-11-03
BE780621A (fr) 1972-09-13
JPS5423572B1 (cg-RX-API-DMAC10.html) 1979-08-15

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