GB1334811A - Photosensitive compositions - Google Patents

Photosensitive compositions

Info

Publication number
GB1334811A
GB1334811A GB1130772A GB1130772A GB1334811A GB 1334811 A GB1334811 A GB 1334811A GB 1130772 A GB1130772 A GB 1130772A GB 1130772 A GB1130772 A GB 1130772A GB 1334811 A GB1334811 A GB 1334811A
Authority
GB
United Kingdom
Prior art keywords
cyclohexanone
optionally
valeric acid
dihydroxybenzoic
march
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB1130772A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koninklijke Philips NV
Original Assignee
Philips Gloeilampenfabrieken NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Gloeilampenfabrieken NV filed Critical Philips Gloeilampenfabrieken NV
Publication of GB1334811A publication Critical patent/GB1334811A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Epoxy Resins (AREA)
  • Materials For Photolithography (AREA)

Abstract

1334811 Epoxy resins PHILIPS GLOEILAMPENFABRIEKEN NV 10 March 1972 [13 March 1971] 11307/72 Heading C3B [Also in Division G2] The following partial esters are prepared from polyepoxides:-diglycidyl ether of 2,2-di-(phydroxyphenyl)propane was heated with gamma, gamma - di - (p - hydroxyphenyl)valeric acid in a nitrogen or argon atmosphere optionally using cyclohexanone as solvent to produce a resin melting between 75‹ and 95‹ C. The valeric acid may be replaced by gallic, 3,5-dihydroxybenzoic, 2,4-dihydroxybenzoic or 3,5- dimethyl-4-hydroxybenzoic acid using cyclohexanone as solvent and optionally triethylamine. The diglycidyl ether may be replaced by 1,2 - epoxyvinyl - 2 - (3<SP>1</SP>,4<SP>1</SP> - epoxycyclohexene) or 3,4 - epoxycyclohexylmethyl - 3<SP>1</SP>,4<SP>1</SP>- cyclohexane-carboxylate and be heated with the above specified valeric acid in cyclohexanone optionally in the presence of triethylamine. The resins may be used in photoresists (see Division G2).
GB1130772A 1971-03-13 1972-03-10 Photosensitive compositions Expired GB1334811A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL7103379A NL7103379A (en) 1971-03-13 1971-03-13

Publications (1)

Publication Number Publication Date
GB1334811A true GB1334811A (en) 1973-10-24

Family

ID=19812677

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1130772A Expired GB1334811A (en) 1971-03-13 1972-03-10 Photosensitive compositions

Country Status (8)

Country Link
JP (1) JPS5423572B1 (en)
BE (1) BE780621A (en)
CA (1) CA978013A (en)
DE (1) DE2208421A1 (en)
FR (1) FR2130167B1 (en)
GB (1) GB1334811A (en)
IT (1) IT952955B (en)
NL (1) NL7103379A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112654928A (en) * 2018-09-05 2021-04-13 默克专利股份有限公司 Positive photosensitive material

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1988005928A1 (en) * 1987-02-02 1988-08-11 Nippon Paint Co., Ltd. Positive photosensitive resin composition and process for its production

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112654928A (en) * 2018-09-05 2021-04-13 默克专利股份有限公司 Positive photosensitive material

Also Published As

Publication number Publication date
CA978013A (en) 1975-11-18
IT952955B (en) 1973-07-30
FR2130167B1 (en) 1977-01-14
BE780621A (en) 1972-09-13
NL7103379A (en) 1972-09-15
DE2208421A1 (en) 1972-09-21
FR2130167A1 (en) 1972-11-03
JPS5423572B1 (en) 1979-08-15

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Legal Events

Date Code Title Description
PS Patent sealed
PCNP Patent ceased through non-payment of renewal fee