FR2130167A1 - - Google Patents

Info

Publication number
FR2130167A1
FR2130167A1 FR7208631A FR7208631A FR2130167A1 FR 2130167 A1 FR2130167 A1 FR 2130167A1 FR 7208631 A FR7208631 A FR 7208631A FR 7208631 A FR7208631 A FR 7208631A FR 2130167 A1 FR2130167 A1 FR 2130167A1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7208631A
Other languages
French (fr)
Other versions
FR2130167B1 (cg-RX-API-DMAC10.html
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koninklijke Philips NV
Original Assignee
Philips Gloeilampenfabrieken NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Gloeilampenfabrieken NV filed Critical Philips Gloeilampenfabrieken NV
Publication of FR2130167A1 publication Critical patent/FR2130167A1/fr
Application granted granted Critical
Publication of FR2130167B1 publication Critical patent/FR2130167B1/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Epoxy Resins (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
FR7208631A 1971-03-13 1972-03-13 Expired FR2130167B1 (cg-RX-API-DMAC10.html)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL7103379A NL7103379A (cg-RX-API-DMAC10.html) 1971-03-13 1971-03-13

Publications (2)

Publication Number Publication Date
FR2130167A1 true FR2130167A1 (cg-RX-API-DMAC10.html) 1972-11-03
FR2130167B1 FR2130167B1 (cg-RX-API-DMAC10.html) 1977-01-14

Family

ID=19812677

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7208631A Expired FR2130167B1 (cg-RX-API-DMAC10.html) 1971-03-13 1972-03-13

Country Status (8)

Country Link
JP (1) JPS5423572B1 (cg-RX-API-DMAC10.html)
BE (1) BE780621A (cg-RX-API-DMAC10.html)
CA (1) CA978013A (cg-RX-API-DMAC10.html)
DE (1) DE2208421A1 (cg-RX-API-DMAC10.html)
FR (1) FR2130167B1 (cg-RX-API-DMAC10.html)
GB (1) GB1334811A (cg-RX-API-DMAC10.html)
IT (1) IT952955B (cg-RX-API-DMAC10.html)
NL (1) NL7103379A (cg-RX-API-DMAC10.html)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0302941A4 (en) * 1987-02-02 1990-02-22 Nippon Paint Co Ltd Positive photosensitive resin composition and process for its production.

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US12393115B2 (en) 2018-09-05 2025-08-19 Merck Patent Gmbh Positive working photosensitive material

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
NEANT *

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0302941A4 (en) * 1987-02-02 1990-02-22 Nippon Paint Co Ltd Positive photosensitive resin composition and process for its production.

Also Published As

Publication number Publication date
CA978013A (en) 1975-11-18
GB1334811A (en) 1973-10-24
DE2208421A1 (de) 1972-09-21
IT952955B (it) 1973-07-30
FR2130167B1 (cg-RX-API-DMAC10.html) 1977-01-14
NL7103379A (cg-RX-API-DMAC10.html) 1972-09-15
BE780621A (fr) 1972-09-13
JPS5423572B1 (cg-RX-API-DMAC10.html) 1979-08-15

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Legal Events

Date Code Title Description
ST Notification of lapse