NL7102170A - - Google Patents
Info
- Publication number
- NL7102170A NL7102170A NL7102170A NL7102170A NL7102170A NL 7102170 A NL7102170 A NL 7102170A NL 7102170 A NL7102170 A NL 7102170A NL 7102170 A NL7102170 A NL 7102170A NL 7102170 A NL7102170 A NL 7102170A
- Authority
- NL
- Netherlands
Links
Classifications
-
- H10P50/73—
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G03F7/422—Stripping or agents therefor using liquids only
- G03F7/426—Stripping or agents therefor using liquids only containing organic halogen compounds; containing organic sulfonic acids or salts thereof; containing sulfoxides
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- H10P50/283—
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- H10W74/47—
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Weting (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19702007693 DE2007693B2 (de) | 1970-02-19 | 1970-02-19 | Verfahren zum lokalen abaetzen einer auf einem halbleiterkoerper aufgebrachten siliciumnitridschicht |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL7102170A true NL7102170A (Direct) | 1971-08-23 |
Family
ID=5762752
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL7102170A NL7102170A (Direct) | 1970-02-19 | 1971-02-18 |
Country Status (9)
| Country | Link |
|---|---|
| JP (1) | JPS5514078B1 (Direct) |
| AT (1) | AT310256B (Direct) |
| CA (1) | CA949800A (Direct) |
| CH (1) | CH547867A (Direct) |
| DE (1) | DE2007693B2 (Direct) |
| FR (1) | FR2081014B1 (Direct) |
| GB (1) | GB1310188A (Direct) |
| NL (1) | NL7102170A (Direct) |
| SE (1) | SE359232B (Direct) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2454399C2 (de) * | 1974-11-16 | 1981-09-24 | Merck Patent Gmbh, 6100 Darmstadt | Ablösemittel für Fotolacke |
| US6022751A (en) * | 1996-10-24 | 2000-02-08 | Canon Kabushiki Kaisha | Production of electronic device |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2149269C3 (de) * | 1971-10-02 | 1981-04-09 | Daimler-Benz Ag, 7000 Stuttgart | Pneumatisch arbeitende Regelvorrichtung zur selbsttätigen Ausrichtung von Kraftfahrzeugscheinwerfern |
-
1970
- 1970-02-19 DE DE19702007693 patent/DE2007693B2/de active Granted
- 1970-12-10 CH CH1829570A patent/CH547867A/xx not_active IP Right Cessation
-
1971
- 1971-01-14 AT AT30071A patent/AT310256B/de not_active IP Right Cessation
- 1971-02-12 CA CA105,190A patent/CA949800A/en not_active Expired
- 1971-02-15 FR FR7104972A patent/FR2081014B1/fr not_active Expired
- 1971-02-18 NL NL7102170A patent/NL7102170A/xx unknown
- 1971-02-19 JP JP790371A patent/JPS5514078B1/ja active Pending
- 1971-02-19 SE SE02165/71A patent/SE359232B/xx unknown
- 1971-04-19 GB GB2166871A patent/GB1310188A/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| SE359232B (Direct) | 1973-08-27 |
| CA949800A (en) | 1974-06-25 |
| GB1310188A (en) | 1973-03-14 |
| FR2081014A1 (Direct) | 1971-11-26 |
| CH547867A (de) | 1974-04-11 |
| JPS5514078B1 (Direct) | 1980-04-14 |
| DE2007693B2 (de) | 1976-12-16 |
| AT310256B (de) | 1973-09-25 |
| FR2081014B1 (Direct) | 1977-06-17 |
| DE2007693A1 (de) | 1971-09-02 |