CA949800A - Pattern silicon nitride masking layers - Google Patents
Pattern silicon nitride masking layersInfo
- Publication number
- CA949800A CA949800A CA105,190A CA105190A CA949800A CA 949800 A CA949800 A CA 949800A CA 105190 A CA105190 A CA 105190A CA 949800 A CA949800 A CA 949800A
- Authority
- CA
- Canada
- Prior art keywords
- silicon nitride
- masking layers
- nitride masking
- pattern silicon
- pattern
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 229910052581 Si3N4 Inorganic materials 0.000 title 1
- 230000000873 masking effect Effects 0.000 title 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3105—After-treatment
- H01L21/311—Etching the insulating layers by chemical or physical means
- H01L21/31144—Etching the insulating layers by chemical or physical means using masks
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G03F7/422—Stripping or agents therefor using liquids only
- G03F7/426—Stripping or agents therefor using liquids only containing organic halogen compounds; containing organic sulfonic acids or salts thereof; containing sulfoxides
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3105—After-treatment
- H01L21/311—Etching the insulating layers by chemical or physical means
- H01L21/31105—Etching inorganic layers
- H01L21/31111—Etching inorganic layers by chemical means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
- H01L23/293—Organic, e.g. plastic
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Landscapes
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Weting (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19702007693 DE2007693B2 (en) | 1970-02-19 | 1970-02-19 | PROCESS FOR THE LOCAL DEPOSITION OF A SILICON NITRIDE LAYER APPLIED TO A SEMICONDUCTOR BODY |
Publications (1)
Publication Number | Publication Date |
---|---|
CA949800A true CA949800A (en) | 1974-06-25 |
Family
ID=5762752
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CA105,190A Expired CA949800A (en) | 1970-02-19 | 1971-02-12 | Pattern silicon nitride masking layers |
Country Status (9)
Country | Link |
---|---|
JP (1) | JPS5514078B1 (en) |
AT (1) | AT310256B (en) |
CA (1) | CA949800A (en) |
CH (1) | CH547867A (en) |
DE (1) | DE2007693B2 (en) |
FR (1) | FR2081014B1 (en) |
GB (1) | GB1310188A (en) |
NL (1) | NL7102170A (en) |
SE (1) | SE359232B (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2454399C2 (en) * | 1974-11-16 | 1981-09-24 | Merck Patent Gmbh, 6100 Darmstadt | Release agents for photoresists |
US6022751A (en) * | 1996-10-24 | 2000-02-08 | Canon Kabushiki Kaisha | Production of electronic device |
CN1319506C (en) * | 2003-11-19 | 2007-06-06 | 曾凯 | Interment method utilizing biodegradation |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2149269C3 (en) * | 1971-10-02 | 1981-04-09 | Daimler-Benz Ag, 7000 Stuttgart | Pneumatically operating control device for the automatic alignment of motor vehicle headlights |
-
1970
- 1970-02-19 DE DE19702007693 patent/DE2007693B2/en active Granted
- 1970-12-10 CH CH1829570A patent/CH547867A/en not_active IP Right Cessation
-
1971
- 1971-01-14 AT AT30071A patent/AT310256B/en not_active IP Right Cessation
- 1971-02-12 CA CA105,190A patent/CA949800A/en not_active Expired
- 1971-02-15 FR FR7104972A patent/FR2081014B1/fr not_active Expired
- 1971-02-18 NL NL7102170A patent/NL7102170A/xx unknown
- 1971-02-19 SE SE216571A patent/SE359232B/xx unknown
- 1971-02-19 JP JP790371A patent/JPS5514078B1/ja active Pending
- 1971-04-19 GB GB2166871A patent/GB1310188A/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
FR2081014A1 (en) | 1971-11-26 |
AT310256B (en) | 1973-09-25 |
FR2081014B1 (en) | 1977-06-17 |
JPS5514078B1 (en) | 1980-04-14 |
DE2007693B2 (en) | 1976-12-16 |
NL7102170A (en) | 1971-08-23 |
GB1310188A (en) | 1973-03-14 |
CH547867A (en) | 1974-04-11 |
SE359232B (en) | 1973-08-27 |
DE2007693A1 (en) | 1971-09-02 |
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