NL7100748A - - Google Patents
Info
- Publication number
- NL7100748A NL7100748A NL7100748A NL7100748A NL7100748A NL 7100748 A NL7100748 A NL 7100748A NL 7100748 A NL7100748 A NL 7100748A NL 7100748 A NL7100748 A NL 7100748A NL 7100748 A NL7100748 A NL 7100748A
- Authority
- NL
- Netherlands
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
- H01J29/46—Arrangements of electrodes and associated parts for generating or controlling the ray or beam, e.g. electron-optical arrangement
- H01J29/80—Arrangements for controlling the ray or beam after passing the main deflection system, e.g. for post-acceleration or post-concentration, for colour switching
- H01J29/803—Arrangements for controlling the ray or beam after passing the main deflection system, e.g. for post-acceleration or post-concentration, for colour switching for post-acceleration or post-deflection, e.g. for colour switching
- H01J29/806—Electron lens mosaics, e.g. fly's eye lenses, colour selection lenses
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/10—Lenses
- H01J37/12—Lenses electrostatic
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Beam Exposure (AREA)
- Electron Tubes For Measurement (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR7001862A FR2076567A5 (cs) | 1970-01-20 | 1970-01-20 | |
| FR7101748A FR2122684A6 (cs) | 1970-01-20 | 1971-01-20 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL7100748A true NL7100748A (cs) | 1971-07-22 |
Family
ID=26215496
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL7100748A NL7100748A (cs) | 1970-01-20 | 1971-01-20 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US3717785A (cs) |
| DE (1) | DE2102608A1 (cs) |
| FR (2) | FR2076567A5 (cs) |
| GB (1) | GB1305523A (cs) |
| NL (1) | NL7100748A (cs) |
Families Citing this family (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2326279A1 (de) * | 1973-05-23 | 1974-12-19 | Siemens Ag | Ionenstrahlschnellschaltung zur erzielung definierter festkoerperdotierungen durch ionenimplantation |
| GB1443215A (en) * | 1973-11-07 | 1976-07-21 | Mullard Ltd | Electrostatically clamping a semiconductor wafer during device manufacture |
| JPS52119178A (en) * | 1976-03-31 | 1977-10-06 | Toshiba Corp | Electron beam exposure device |
| US4194123A (en) * | 1978-05-12 | 1980-03-18 | Rockwell International Corporation | Lithographic apparatus |
| US4338548A (en) * | 1980-01-30 | 1982-07-06 | Control Data Corporation | Unipotential lens assembly for charged particle beam tubes and method for applying correction potentials thereto |
| WO1982002623A1 (en) * | 1981-01-23 | 1982-08-05 | Veeco Instr Inc | Parallel charged particle beam exposure system |
| US4465934A (en) * | 1981-01-23 | 1984-08-14 | Veeco Instruments Inc. | Parallel charged particle beam exposure system |
| JPS57163955A (en) * | 1981-02-25 | 1982-10-08 | Toshiba Corp | Mask focusing type color picture tube |
| US4354111A (en) * | 1981-03-10 | 1982-10-12 | Veeco Instruments Incorporated | Screen lens array system |
| DE3138744A1 (de) * | 1981-09-29 | 1983-04-07 | Siemens AG, 1000 Berlin und 8000 München | Verfahren zum herstellen von halbleitervorrichtungen |
| US4667108A (en) * | 1985-06-28 | 1987-05-19 | Control Data Corporation | Impedance matched and thermally cooled deflection amplifiers for charged particle beam apparatus employing deflectors |
| US5023458A (en) * | 1989-01-04 | 1991-06-11 | Eaton Corporation | Ion beam control system |
| JPH05205695A (ja) * | 1992-01-28 | 1993-08-13 | Hitachi Ltd | 多段多重電極及び質量分析装置 |
| JP5322363B2 (ja) * | 2000-02-09 | 2013-10-23 | エフ イー アイ カンパニ | 微小二次加工処理用マルチカラムｆｉｂ |
| DE10237297A1 (de) * | 2002-08-14 | 2004-03-11 | Leo Elektronenmikroskopie Gmbh | Teilchenoptische Vorrichtung, Elektronenmikroskopiesystem und Lithogrphiesystem |
| EP1389797B1 (en) * | 2002-08-13 | 2008-10-08 | Carl Zeiss NTS GmbH | Particle-optical apparatus and its use as an electron microscopy system |
| RU2249241C1 (ru) * | 2003-11-04 | 2005-03-27 | Гурович Борис Аронович | Устройство для создания изображений |
| DE102004048892A1 (de) * | 2004-10-06 | 2006-04-20 | Leica Microsystems Lithography Gmbh | Beleuchtungssystem für eine Korpuskularstrahleinrichtung und Verfahren zur Beleuchtung mit einem Korpuskularstrahl |
| JP2007287365A (ja) * | 2006-04-13 | 2007-11-01 | Jeol Ltd | 多極子レンズ及び多極子レンズの製造方法 |
| GB0700754D0 (en) * | 2007-01-15 | 2007-02-21 | Oxford Instr Analytical Ltd | Charged particle analyser and method |
| US8389950B2 (en) * | 2007-01-31 | 2013-03-05 | Microsaic Systems Plc | High performance micro-fabricated quadrupole lens |
| GB2446184B (en) * | 2007-01-31 | 2011-07-27 | Microsaic Systems Ltd | High performance micro-fabricated quadrupole lens |
| CN112041965B (zh) | 2018-05-01 | 2025-01-14 | Asml荷兰有限公司 | 多束检查装置 |
| CN110534385A (zh) * | 2019-09-09 | 2019-12-03 | 中国科学院合肥物质科学研究院 | 一种具有整体膜电极棒的电四极透镜组 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2919381A (en) * | 1956-07-25 | 1959-12-29 | Farrand Optical Co Inc | Electron lens |
| US2941114A (en) * | 1958-01-09 | 1960-06-14 | Bell Telephone Labor Inc | Slalom focusing structures |
| NL155980B (nl) * | 1966-08-11 | 1978-02-15 | Philips Nv | Kathodestraalbuis met een vierpoollens voor de correctie van orthogonaliteitsfouten. |
| US3612946A (en) * | 1967-08-01 | 1971-10-12 | Murata Manufacturing Co | Electron multiplier device using semiconductor ceramic |
-
1970
- 1970-01-20 FR FR7001862A patent/FR2076567A5/fr not_active Expired
-
1971
- 1971-01-19 GB GB251771A patent/GB1305523A/en not_active Expired
- 1971-01-19 US US00107720A patent/US3717785A/en not_active Expired - Lifetime
- 1971-01-20 FR FR7101748A patent/FR2122684A6/fr not_active Expired
- 1971-01-20 NL NL7100748A patent/NL7100748A/xx unknown
- 1971-01-20 DE DE19712102608 patent/DE2102608A1/de active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| DE2102608A1 (de) | 1971-07-29 |
| FR2122684A6 (cs) | 1972-09-01 |
| GB1305523A (cs) | 1973-02-07 |
| US3717785A (en) | 1973-02-20 |
| FR2076567A5 (cs) | 1971-10-15 |